SCHEMBL11077665

SCHEMBL11077665

CNc1ccc[c]c1S(=O)(=O)O

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR6 P50406 1/20 0.37
ALDH1A1 P00352 3/20 0.34
RECQL P46063 3/20 0.34
SMN1; SMN2 Q16637 3/20 0.34
KDM4E B2RXH2 2/20 0.34
POLB P06746 2/20 0.34
ATM Q13315 1/20 0.34
MAPT P10636 2/20 0.33
TDP1 Q9NUW8 2/20 0.33
L3MBTL1 Q9Y468 2/20 0.33
HPGD P15428 2/20 0.33
HSD17B10 Q99714 2/20 0.33
EGFR P00533 1/20 0.33
PABPC1 P11940 1/20 0.33
MAPK1 P28482 1/20 0.33
RAB9A P51151 1/20 0.33
TP53 P04637 1/20 0.33
CYP3A4 P08684 1/20 0.33
THRB P10828 1/20 0.33
ALOX15 P16050 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL696313 0.79 TSHR (0.33) ALDH1A1SMN1; SMN2ACHETSHR
SCHEMBL8665415 0.76 ADRA2C (0.34) HTR6ALDH1A1SMN1; SMN2KDM4EMAPT
SCHEMBL8666688 0.74 HTR6 (0.32) HTR6ALDH1A1KDM4EPOLBMAPT
SCHEMBL483018 0.72 SMN1; SMN2 (0.34) ALDH1A1RECQLSMN1; SMN2KDM4EPOLB
SCHEMBL692167 0.72 TTR (0.38) SMN1; SMN2TSHR
SCHEMBL691617 0.72 ALDH1A1 (0.35) ALDH1A1RECQLSMN1; SMN2TDP1HPGD
SCHEMBL5152547 0.72 GABRA1 (0.39) ALDH1A1SMN1; SMN2POLBMAPTTHRB
SCHEMBL458583 0.71 TTR (0.41) HTR6ALDH1A1RECQLSMN1; SMN2KDM4E
Sulfuric Acid SCHEMBL30385174 0.71 HTR6 (0.52) HTR6ALDH1A1RECQLSMN1; SMN2KDM4E
SCHEMBL4602519 0.70 CA1 (0.38) HTR6ALDH1A1SMN1; SMN2KDM4EPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11834532-B2 Photoinitiators IGH RESINS ITALIA S.R.L. (IT) 2023-12-05 US claimed
EP-3902878-A1 PHOTOINITIATORS IGM Resins Italia S.r.l. (IT) 2021-11-03 EP claimed
WO-2020136522-A1 PHOTOINITIATORS IGM RESINS ITALIA S.R.L. (IT) 2020-07-02 WO claimed
US-4321118-A Bis benzoyl sensitizers for photopolymerization or photo cross linking process and composition CIBA-GEIGY CORPORATION (US) 1982-03-23 US claimed
US-11834532-B2 Photoinitiators IGH RESINS ITALIA S.R.L. (IT) 2023-12-05 US disclosed
CN-113518805-B Photoinitiator 意大利艾坚蒙树脂有限公司 2023-08-08 CN disclosed
EP-3902878-A1 PHOTOINITIATORS IGM Resins Italia S.r.l. (IT) 2021-11-03 EP disclosed
WO-2020136522-A1 PHOTOINITIATORS IGM RESINS ITALIA S.R.L. (IT) 2020-07-02 WO disclosed
EP-0003002-B1 USE OF AROMATIC-ALIPHATIC KETONES AS PHOTOINITIATORS, PHOTOPOLYMERISABLE SYSTEMS CONTAINING SUCH KETONES AND AROMATIC-ALIPHATIC KETONES CIBA-GEIGY AG (CH) 1984-06-13 EP disclosed
US-4321118-A Bis benzoyl sensitizers for photopolymerization or photo cross linking process and composition CIBA-GEIGY CORPORATION (US) 1982-03-23 US disclosed
US-4318791-A PHOTOPOLYMERIZABLE SYSTEM FOR INKS CIBA-GEIGY CORPORATION (US) 1982-03-09 US disclosed
US-4315807-A Sensitizers for photopolymerization CIBA-GEIGY CORPORATION (US) 1982-02-16 US disclosed
US-4308400-A AROMATIC HYDROXY KETONES CIBA-GEIGY A.G. (CH) 1981-12-29 US disclosed
EP-0003002-A2 Use of aromatic-aliphatic ketones as photoinitiators, photopolymerisable systems containing such ketones and aromatic-aliphatic ketones CIBA-GEIGY AG (CH) 1979-07-11 EP disclosed