SCHEMBL11235160

SCHEMBL11235160

CCOC(=O)CCC(F)(F)C(F)(F)Br

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.43
TRPA1 O75762 1/20 0.43
CYP1A2 P05177 1/20 0.42
GAA P10253 2/20 0.41
MGAM O43451 1/20 0.41
SI P14410 1/20 0.41
MGAM2 Q2M2H8 1/20 0.41
CYP4F2 P78329 3/20 0.40
CYP4A11 Q02928 3/20 0.40
NR1I2 O75469 1/20 0.39
PGR P06401 1/20 0.39
ADORA3 P0DMS8 1/20 0.39
PTGS2 P35354 1/20 0.39
PDE4D Q08499 1/20 0.39
CYP3A4 P08684 1/20 0.37
ALOX15 P16050 1/20 0.37
TSHR P16473 1/20 0.37
HSD17B10 Q99714 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
POLB P06746 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL543726 0.89 CYP1A2 (0.48) ALDH1A1TRPA1CYP1A2GAAMGAM
SCHEMBL9438171 0.88 CYP1A2 (0.48) ALDH1A1TRPA1CYP1A2GAAMGAM
SCHEMBL9438339 0.84 ALDH1A1 (0.46) ALDH1A1TRPA1CYP1A2GAAMGAM
SCHEMBL9438259 0.82 ALDH1A1 (0.45) ALDH1A1TRPA1CYP1A2GAAMGAM
SCHEMBL30440042 0.80 TSHR (0.48) ALDH1A1GAAMGAMSIMGAM2
SCHEMBL11147080 0.79 ALDH1A1 (0.50) ALDH1A1TRPA1CYP1A2GAAMGAM
SCHEMBL1700886 0.79 CYP1A2 (0.48) ALDH1A1TRPA1CYP1A2GAAMGAM
SCHEMBL196812 0.79 CYP1A2 (0.48) ALDH1A1TRPA1CYP1A2GAAMGAM
SCHEMBL17626380 0.79 TRPA1 (0.42) ALDH1A1TRPA1CYP1A2GAAMGAM
SCHEMBL9854447 0.78 TRPA1 (0.41) ALDH1A1TRPA1CYP1A2GAAMGAM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11947258-B2 Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition Rohm and Hass Electronic Materials LLC (US) 2024-04-02 US disclosed
US-20230212112-A1 PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIST COMPOSITION INCLUDING THE POLYMER, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE USING THE PHOTORESIST COMPOSITION U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-07-06 US disclosed
US-11613519-B2 Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2023-03-28 US disclosed
US-11448960-B2 Salts and photoresists comprising same ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2022-09-20 US disclosed
CN-107129448-B Photoacid generating monomer, polymer derived therefrom, and photoresist composition including the same 罗门哈斯电子材料有限责任公司 2022-04-26 CN disclosed
CN-109856911-A Salt and photoresist comprising it 罗门哈斯电子材料有限责任公司 2019-06-07 CN disclosed
US-20190163055-A1 SALTS AND PHOTORESISTS COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-05-30 US disclosed
US-20170248844-A1 PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIST COMPOSITION INCLUDING THE POLYMER, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE USING THE PHOTORESIST COMPOSITION U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2017-08-31 US disclosed
EP-0074903-A2 Derivatives of 2-amino-1,2,3,4-tetrahydronaphthalene, their preparation and their therapeutic use SYNTHELABO (FR) 1983-03-23 EP disclosed
US-4351954-A INSECTICIDES, HERBICIDES, FUNGICIDE, ENZYME INHIBITORS AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY (JP) 1982-09-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11448960-B2 Salts and photoresists comprising same SLC6A6, TST, SLC6A12 ALDH1A1 3323/4885TRPA1 88/4885CYP1A2 4317/4885
US-11613519-B2 Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition WASF2, FRG1, WEE2 ALDH1A1 4239/4885TRPA1 2463/4885CYP1A2 3824/4885
US-11947258-B2 Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition WASF2, FRG1, WEE2 ALDH1A1 4239/4885TRPA1 2463/4885CYP1A2 3824/4885
US-20170248844-A1 PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIST COMPOSITION INCLUDING THE POLYMER, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE USING THE PHOTORESIST COMPOSITION WASF2, FRG1, WEE2 ALDH1A1 4239/4885TRPA1 2463/4885CYP1A2 3824/4885
US-20190163055-A1 SALTS AND PHOTORESISTS COMPRISING SAME SLC6A6, TST, SLC6A12 ALDH1A1 3323/4885TRPA1 88/4885CYP1A2 4317/4885
US-20230212112-A1 PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIST COMPOSITION INCLUDING THE POLYMER, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE USING THE PHOTORESIST COMPOSITION WASF2, FRG1, WEE2 ALDH1A1 4239/4885TRPA1 2463/4885CYP1A2 3824/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.