Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 3/20 | 0.54 |
| ▸ | CA2 | P00918 | 3/20 | 0.54 |
| ▸ | CA9 | Q16790 | 3/20 | 0.54 |
| ▸ | KIF11 | P52732 | 2/20 | 0.46 |
| ▸ | MAPT | P10636 | 2/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.45 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.45 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.44 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.44 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | HSD17B2 | P37059 | 1/20 | 0.41 |
| ▸ | CXCR2 | P25025 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | RECQL | P46063 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | TP53 | P04637 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Biphenyl SCHEMBL4512369 | 0.98 | CA1 (0.53) | CA1CA2CA9KIF11MAPT | |
| Biphenyl SCHEMBL710425 | 0.98 | CA1 (0.53) | CA1CA2CA9KIF11MAPT | |
| SCHEMBL2832043 | 0.91 | CA1 (0.63) | CA1CA2CA9KIF11MAPT | |
| Hydrogen Sulfide SCHEMBL16581552 | 0.90 | CA1 (0.61) | CA1CA2CA9KIF11MAPT | |
| Diphenylsulfane SCHEMBL2191112 | 0.86 | CA1 (0.50) | CA1CA2CA9KIF11MAPT | |
| SCHEMBL24360466 | 0.86 | CA2 (0.62) | CA1CA2CA9KIF11MEN1 | |
| SCHEMBL5532552 | 0.86 | CA2 (0.62) | CA1CA2CA9KIF11MEN1 | |
| Biphenyl SCHEMBL28551760 | 0.84 | CA1 (0.53) | CA1CA2CA9KIF11LMNA | |
| SCHEMBL869739 | 0.83 | NR3C2 (0.49) | CA1CA2CA9KIF11MEN1 | |
| Biphenyl SCHEMBL114434 | 0.83 | CA2 (0.50) | CA1CA2CA9KIF11CXCR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 470 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7611823-B1 | Photosensitive polymeric material for WORM optical data storage with two-photon fluorescent readout | UNIVERSITY OF CENTRAL FLORIDA RESEARCH FOUNDATION, INC. (US) | 2009-11-03 | — | — | US | claimed |
| US-7524611-B2 | Photosensitive polymeric material for worm optical data storage with two-photon fluorescent readout | UNIVERSITY OF CENTRAL FLORIDA RESEARCH FOUNDATION, INC. (US) | 2009-04-28 | — | — | US | claimed |
| US-20080187862-A1 | New photosensitive polymeric material for worm optical data storage with two-photon fluorescent readout | UNIVERSITY OF CENTRAL FLORIDA RESEARCH FOUNDATION INC. | 2008-08-07 | — | — | US | claimed |
| US-7208260-B2 | Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the same | HYNIX SEMICONDUCTOR INC. (KR) | 2007-04-24 | — | — | US | claimed |
| US-7157755-B2 | Polymer sacrificial light absorbing structure and method | INTEL CORPORATION (US) | 2007-01-02 | — | — | US | claimed |
| US-7150961-B2 | Additive for photoresist composition for resist flow process | HYNIX SEMICONDUCTOR INC. (KR) | 2006-12-19 | — | — | US | claimed |
| US-6987155-B2 | Polymers for photoresist and photoresist compositions using the same | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2006-01-17 | — | — | US | claimed |
| US-20050145890-A1 | Polymer sacrificial light absorbing structure and method | GOODNER MICHAEL D (US) | 2005-07-07 | — | — | US | claimed |
| US-6876017-B2 | Polymer sacrificial light absorbing structure and method | INTEL CORPORATION (US) | 2005-04-05 | — | — | US | claimed |
| US-6824951-B2 | CROSSLINKING AGENT PREVENTS EXCESSIVE PHOTORESIST RESIN FLOW WHICH MAY RESULT IN A BENT OR COLLAPSED CONTACT HOLE PATTERN PROFILE; SEMICONDUCTORS | HYNIX SEMICONDUCTOR INC. (KR) | 2004-11-30 | — | — | US | claimed |
| US-20020015912-A1 | Photoresist monomers, polymers thereof and photoresist compositions containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2002-02-07 | — | — | US | claimed |
| US-20020015917-A1 | Multi-oxygen containing compound for preventing acid diffusion, and photoresist composition containing the same | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD (KR) | 2002-02-07 | — | — | US | claimed |
| US-20020012873-A1 | Photoresist composition containing photo radical generator with photoacid generator | HYNIX SEMICONDUCTOR INC. (KR) | 2002-01-31 | — | — | US | claimed |
| US-20020012879-A1 | Novel photoresist monomers, polymers thereof, and photoresist compositions containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2002-01-31 | — | — | US | claimed |
| US-6322948-B1 | INTERPOLYMERS CONTAINING UNITS OF ACETALS OF FUSED RINGS SUCH AS NORBORNANE AND UNITS FROM MALEIC ANHYDRIDE AND, OPTIONALLY, (METH)ACRYLIC ACID | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-11-27 | — | — | US | claimed |
| US-6312868-B1 | Photoresist cross-linker and photoresist composition comprising the same | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-11-06 | — | — | US | claimed |
| US-20010031420-A1 | Partially crosslinked polymer for bilayer photoresist | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-10-18 | — | — | US | claimed |
| US-6235447-B1 | FORMING PATTERN; SEMICONDUCTOR | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-05-22 | — | — | US | claimed |
| US-6235448-B1 | EXPOSURE TO LIGHT SOURCE; DEVELOPMENT; SEMICONDUCTORS | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-05-22 | — | — | US | claimed |
| US-6225020-B1 | SUCH AS USED IN 4 G OR 16 G DRAM SEMICONDUCTOR DEVICES USING A LIGHT SOURCE SUCH AS ARF, AN E-BEAM, EUV, OR AN ION BEAM, PHOTORESIST FOR THE TOP SURFACE IMAGE (TSI) PROCESS USING SILYLATION, MALEIMIDE ANDNORBONENE CARBOXYLATE COMONOMERS, | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-05-01 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20010031420-A1 | Partially crosslinked polymer for bilayer photoresist | LCP1, ARPC4, PARP14 | CA1 4041/4885CA2 3673/4885CA9 3877/4885 |
| US-20020012879-A1 | Novel photoresist monomers, polymers thereof, and photoresist compositions containing the same | CDH1, DDAH1, DPEP1 | CA1 2013/4885CA2 3257/4885CA9 2808/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.