SCHEMBL1127615

SCHEMBL1127615

CCSc1c2ccccc2cc2ccccc12

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.58
KMT2A Q03164 4/20 0.58
HTR2A P28223 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
ALDH1A1 P00352 3/20 0.39
HSD17B10 Q99714 3/20 0.39
HIF1A Q16665 1/20 0.39
CYP1B1 Q16678 1/20 0.39
ELANE P08246 2/20 0.39
NR1I2 O75469 1/20 0.39
CYP1A2 P05177 4/20 0.39
CYP2A6 P11509 1/20 0.39
HPGD P15428 2/20 0.38
RAB9A P51151 1/20 0.38
ATM Q13315 1/20 0.38
MAPT P10636 3/20 0.38
KDM4E B2RXH2 2/20 0.38
CYP2C19 P33261 2/20 0.38
GLA P06280 1/20 0.38
CYP2C9 P11712 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29754212 1.00 MEN1 (0.58) MEN1KMT2AHTR2AL3MBTL1ALDH1A1
Pyrene SCHEMBL14694259 0.91 CYP1A2 (0.52) MEN1KMT2AHTR2AL3MBTL1ALDH1A1
SCHEMBL8007364 0.82 MEN1 (0.53) MEN1KMT2AHTR2AL3MBTL1ALDH1A1
SCHEMBL10692363 0.79 MEN1 (0.43) MEN1KMT2AL3MBTL1ALDH1A1ELANE
SCHEMBL29114638 0.75 MEN1 (0.59) MEN1KMT2AHTR2AL3MBTL1ALDH1A1
SCHEMBL12627638 0.75 TRPM4 (0.42) MEN1KMT2AHTR2AL3MBTL1ALDH1A1
SCHEMBL1076950 0.75 MEN1 (0.53) MEN1KMT2AHTR2AL3MBTL1ALDH1A1
SCHEMBL11759729 0.74 MEN1 (0.52) MEN1KMT2AHTR2AL3MBTL1ALDH1A1
SCHEMBL8383104 0.74 USP2 (0.54) MEN1KMT2AHTR2AL3MBTL1ALDH1A1
SCHEMBL25054694 0.74 ALDH1A1 (0.50) ALDH1A1HSD17B10HIF1ACYP1B1ELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12624392-B2 Molecular array generation using photoresist 10X GENOMICS, INC. (US) 2026-05-12 US disclosed
EP-4516394-A2 HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST 10x Genomics, Inc. (US) 2025-03-05 EP disclosed
EP-4481059-A2 MOLECULAR ARRAY GENERATION USING PHOTORESIST 10x Genomics, Inc. (US) 2024-12-25 EP disclosed
EP-4405094-B1 HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST 10X GENOMICS INC (US) 2024-12-18 EP disclosed
EP-4271511-B1 MOLECULAR ARRAY GENERATION USING PHOTORESIST 10X GENOMICS INC (US) 2024-10-09 EP disclosed
US-20240167077-A1 COVALENT ATTACHMENT OF SPLINT OLIGONUCLEOTIDES FOR MOLECULAR ARRAY GENERATION USING LIGATION 10X GENOMICS, INC. (US) 2024-05-23 US disclosed
US-20240076656-A1 HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST 10X GENOMICS, INC. (US) 2024-03-07 US disclosed
US-20240060127-A1 METHODS AND SYSTEMS FOR LIGHT-CONTROLLED SURFACE PATTERNING USING PHOTOMASKS 10X GENOMICS, INC. 2024-02-22 US disclosed
WO-2024006799-A1 COVALENT ATTACHMENT OF SPLINT OLIGONUCLEOTIDES FOR MOLECULAR ARRAY GENERATION USING LIGATION 10X GENOMICS, INC. (US) 2024-01-04 WO disclosed
WO-2024006827-A1 METHODS AND SYSTEMS FOR LIGHT-CONTROLLED SURFACE PATTERNING USING PHOTOMASKS 10X GENOMICS, INC. (US) 2024-01-04 WO disclosed
CN-105409037-A Process for producing active cathode material comprising mixture of metal oxide and metal sulfide and use of active cathode material in rechargeable electrochemical cells BASF SE 2016-03-16 CN disclosed
EP-1752463-B1 NOVEL FLUORINATED ALKYLFLUOROPHOSPHORIC ACID SALT OF ONIUM AND TRANSITION METAL COMPLEX SAN APRO LTD (JP) 2013-07-17 EP disclosed
US-8278030-B2 Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof SAN-APRO LIMITED (JP) 2012-10-02 US disclosed
US-20110039205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF SAN-APRO LIMITED (JP) 2011-02-17 US disclosed
EP-2284165-A1 PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION San-Apro Limited (JP) 2011-02-16 EP disclosed
US-7709598-B2 Fluorinated alkyl fluorophoshoric acid salts of onium and transition metal complex SAN-APRO LIMITED (JP) 2010-05-04 US disclosed
US-20090163723-A1 METHOD FOR PRODUCING SULFONIUM FLUORINATED ALKYLFLUOROPHOSPHATE SAN-APRO LIMITED (JP) 2009-06-25 US disclosed
EP-1953139-A1 METHOD FOR PRODUCING FLUORINATED SULFONIUM ALKYLFLUOROPHOSPHATE San-Apro Ltd. (JP) 2008-08-06 EP disclosed
US-20070225458-A1 Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex SAN-APRO LIMITED (JP) 2007-09-27 US disclosed
EP-1752463-A1 NOVEL FLUORINATED ALKYLFLUOROPHOSPHORIC ACID SALT OF ONIUM AND TRANSITION METAL COMPLEX San-Apro Limited (JP) 2007-02-14 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12624392-B2 Molecular array generation using photoresist POLL, LIG4, LIG3 MEN1 4778/4885KMT2A 619/4885HTR2A 1677/4885
US-20090163723-A1 METHOD FOR PRODUCING SULFONIUM FLUORINATED ALKYLFLUOROPHOSPHATE ARSA, SCO2, DOHH MEN1 3673/4885KMT2A 4271/4885HTR2A 3761/4885
US-20110039205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF ARSA, ASIC1, TST MEN1 2080/4885KMT2A 1227/4885HTR2A 4513/4885
US-20070225458-A1 Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex AS3MT, TTR, PFAS MEN1 697/4885KMT2A 3324/4885HTR2A 4167/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.