SCHEMBL1128046

SCHEMBL1128046

CCC1(COc2ccc(F)cc2)COC1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.39
CYP2D6 P10635 1/20 0.39
CYP2C19 P33261 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
TSHR P16473 2/20 0.38
FKBP1A P62942 1/20 0.37
USP2 O75604 1/20 0.36
ALDH1A1 P00352 1/20 0.36
HPGD P15428 1/20 0.36
PLA2G7 Q13093 2/20 0.35
POLB P06746 1/20 0.34
HSD17B10 Q99714 1/20 0.34
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
CNR2 P34972 1/20 0.34
MAOB P27338 2/20 0.34
APP P05067 1/20 0.34
DRD2 P14416 1/20 0.34
DRD4 P21917 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL36226 0.91 TSHR (0.40) CYP1A2TDP1TSHRFKBP1AUSP2
SCHEMBL21089712 0.86 LTA4H (0.40) CYP1A2TSHRUSP2ALDH1A1POLB
SCHEMBL36335 0.86 TSHR (0.37) CYP1A2CYP2D6CYP2C19TSHRFKBP1A
SCHEMBL1127852 0.85 TSHR (0.39) CYP1A2CYP2C19L3MBTL1TSHRFKBP1A
SCHEMBL12227651 0.83 FKBP1A (0.41) TDP1L3MBTL1TSHRFKBP1AALDH1A1
SCHEMBL25959959 0.83 TSHR (0.36) CYP1A2TSHRALDH1A1POLBHSD17B10
SCHEMBL240811 0.83 TDP1 (0.48) TDP1L3MBTL1TSHRALDH1A1MAOB
SCHEMBL21074919 0.83 APP (0.41) TSHRPOLBHSD17B10MEN1KMT2A
SCHEMBL15334058 0.83 LTA4H (0.38) CYP1A2CYP2D6CYP2C19L3MBTL1TSHR
SCHEMBL10071618 0.83 TSHR (0.37) TDP1L3MBTL1TSHRUSP2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4667537-A1 PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE TOKYO OHKA KOGYO CO., LTD. (JP) 2025-12-24 EP disclosed
US-20250382500-A1 PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE TOKYO OHKA KOGYO CO LTD (JP) 2025-12-18 US disclosed
US-11667804-B2 Photocurable transparent ink composition for three-dimensional molding and preparation method and application thereof ZHUHAI SAILNER 3D TECHNOLOGY CO., LTD. (CN) 2023-06-06 US disclosed
EP-3626789-B1 PHOTOCURABLE TRANSPARENT INK COMPOSITION FOR THREE-DIMENSIONAL MOLDING AND PREPARATION METHOD AND APPLICATION THEREOF ZHUHAI SAILNER 3D TECH CO LTD (CN) 2023-04-26 EP disclosed
US-20220372318-A1 PHOTOCURABLE TRANSPARENT INK COMPOSITION FOR THREE-DIMENSIONAL MOLDING AND PREPARATION METHOD AND APPLICATION THEREOF ZHUHAI SAILNER 3D TECHNOLOGY CO., LTD. (CN) 2022-11-24 US disclosed
CN-111690308-B Energy-curable composition and use thereof in the field of energy curing 常州强力先端电子材料有限公司 2022-02-01 CN disclosed
US-20200115578-A1 PHOTOCURABLE TRANSPARENT INK COMPOSITION FOR THREE-DIMENSIONAL MOLDING AND PREPARATION METHOD AND APPLICATION THEREOF ZHUHAI SAILNER 3D TECHNOLOGY CO., LTD. (CN) 2020-04-16 US disclosed
EP-3626789-A1 PHOTOCURABLE TRANSPARENT INK COMPOSITION FOR THREE-DIMENSIONAL MOLDING AND PREPARATION METHOD AND APPLICATION THEREOF ZHUHAI SAILNER 3D TECHNOLOGY CO., LTD. (CN) 2020-03-25 EP disclosed
EP-3199520-B1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION TOKYO OHKA KOGYO CO LTD (JP) 2019-12-25 EP disclosed
US-10059662-B2 Sulfonium salt, photoacid generator, and photosensitive composition TOKYO OHKA KOGYO CO., LTD. (JP) 2018-08-28 US disclosed
US-20170305848-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2017-10-26 US disclosed
EP-3199520-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION Tokyo Ohka Kogyo Co., Ltd. (JP) 2017-08-02 EP disclosed
EP-2284165-B1 SULFONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION SAN APRO LTD (JP) 2013-02-20 EP disclosed
US-8278030-B2 Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof SAN-APRO LIMITED (JP) 2012-10-02 US disclosed
US-20110039205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF SAN-APRO LIMITED (JP) 2011-02-17 US disclosed
EP-2284165-A1 PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION San-Apro Limited (JP) 2011-02-16 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170305848-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION ARSA, SPIN1, ASIC1 CYP1A2 1693/4885CYP2D6 2764/4885CYP2C19 3129/4885
US-10059662-B2 Sulfonium salt, photoacid generator, and photosensitive composition ARSA, SPIN1, ASIC1 CYP1A2 1693/4885CYP2D6 2764/4885CYP2C19 3129/4885
US-20110039205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF ARSA, ASIC1, TST CYP1A2 2434/4885CYP2D6 3074/4885CYP2C19 1690/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.