SCHEMBL1128327

SCHEMBL1128327

ClC1c2ccccc2Oc2ccccc21

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOA P21397 2/20 0.58
MAOB P27338 2/20 0.58
ATM Q13315 1/20 0.48
HDAC3 O15379 1/20 0.45
HDAC4 P56524 1/20 0.45
HDAC1 Q13547 1/20 0.45
HDAC7 Q8WUI4 1/20 0.45
HDAC2 Q92769 1/20 0.45
HDAC10 Q969S8 1/20 0.45
HDAC11 Q96DB2 1/20 0.45
HDAC8 Q9BY41 1/20 0.45
HDAC6 Q9UBN7 1/20 0.45
HDAC9 Q9UKV0 1/20 0.45
HDAC5 Q9UQL6 1/20 0.45
CYP2C9 P11712 1/20 0.44
MEN1 O00255 3/20 0.42
KMT2A Q03164 3/20 0.42
MAPT P10636 2/20 0.42
LMNA P02545 1/20 0.42
USP2 O75604 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6659423 0.82 MAOA (0.42) MAOAMAOBATMHDAC3HDAC4
Water SCHEMBL7564377 0.80 MAOA (0.43) MAOAMAOBATMHDAC3HDAC4
SCHEMBL7997285 0.80 MAOA (0.43) MAOAMAOBATMHDAC3HDAC4
SCHEMBL9124381 0.80 AHR (0.50) MAOAMAOBATMHDAC3HDAC4
SCHEMBL19458502 0.78 MAOA (0.64) MAOAMAOBATMHDAC3HDAC4
SCHEMBL29056534 0.76 MAOA (0.61) MAOAMAOBATMHDAC3HDAC4
SCHEMBL16835547 0.76 MAOA (0.61) MAOAMAOBATMHDAC3HDAC4
SCHEMBL5400526 0.75 HTR2A (0.44) MAOAMAOBKMT2ALMNADRD2
SCHEMBL5273179 0.74 MAOA (0.38) MAOAMAOBATMHDAC3HDAC4
SCHEMBL7189875 0.74 NTSR1 (0.40) MAOAMAOBATMHDAC3HDAC4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-121270527-A Novel dimeric xanthene dye for blue photoresist color paste and synthesis method thereof 浙江材华科技有限公司 2026-01-06 CN disclosed
US-20240045330-A1 NEGATIVE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMATION METHOD TOKYO OHKA KOGYO CO., LTD. (JP) 2024-02-08 US disclosed
CN-117467432-A Spherical host-guest type metal organic hybrid material for monochromatic multimode laser output and preparation method thereof 浙江大学 2024-01-30 CN disclosed
CN-117420731-A Negative photosensitive composition and pattern forming method 东京应化工业株式会社 2024-01-19 CN disclosed
CN-113286781-B Sulfonium salt, photoacid generator, curable composition, and resist composition 三亚普罗股份有限公司 2023-08-08 CN disclosed
CN-113698349-B Aqueous phase photocatalysis preparation method of 2- (2-phenyl-2H-indazole-3-yl) acetate compound 河南师范大学 2023-08-01 CN disclosed
US-20230236505-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND LAMINATED FILM SAN-APRO LTD. (JP) 2023-07-27 US disclosed
CN-116283867-A Aza-substituted xanthine or chloro xanthine derivatives and application thereof 山西农业大学 2023-06-23 CN disclosed
CN-116018558-A Negative photosensitive resin composition, pattern forming method and laminated film 三亚普罗股份有限公司 2023-04-25 CN disclosed
EP-3909943-A1 SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION AND RESIST COMPOSITION San-Apro Ltd. (JP) 2021-11-17 EP disclosed
EP-2284165-B1 SULFONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION SAN APRO LTD (JP) 2013-02-20 EP disclosed
US-8278030-B2 Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof SAN-APRO LIMITED (JP) 2012-10-02 US disclosed
US-20110039205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF SAN-APRO LIMITED (JP) 2011-02-17 US disclosed
EP-2284165-A1 PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION San-Apro Limited (JP) 2011-02-16 EP disclosed
CN-1191501-C Photosensitive material employing micro capsules CYCOLOR INC (US) 2005-03-02 CN disclosed
CN-1352762-A Photosensitive material employing micro capsules CYCOLOR INC (US) 2002-06-05 CN disclosed
EP-0082506-B1 PHOTOSENSITIVE ELEMENT, FILM UNIT, PHOTOGRAPHIC PROCESS AND DYES POLAROID CORPORATION (US) 1988-06-29 EP disclosed
US-4598158-A CHROMAGEN HAVING A DIFFUSION CONTROL MOIETY;SELF-DEVELOP COLOR FILMS POLAROID CORPORATION, PATENT DEPT. (US) 1986-07-01 US disclosed
EP-0082506-A2 Photosensitive element, film unit, photographic process and dyes POLAROID CORPORATION (US) 1983-06-29 EP disclosed
US-4386150-A CHROMAGENS HAVING A DYE MOIETY, A NITROGEN-NITROGEN MOIETY, AND A DIFFUSION-CONJTROLLING HYDROQUINONYL MOIETY; COLOR FILMS POLAROID CORPORATION (US) 1983-05-31 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110039205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF ARSA, ASIC1, TST MAOA 4685/4885MAOB 4143/4885ATM 928/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.