Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | BCL2L1 | Q07817 | 2/20 | 0.41 |
| ▸ | POLB | P06746 | 2/20 | 0.41 |
| ▸ | SRD5A2 | P31213 | 2/20 | 0.41 |
| ▸ | PDE7A | Q13946 | 2/20 | 0.41 |
| ▸ | VCAM1 | P19320 | 1/20 | 0.41 |
| ▸ | ATM | Q13315 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.37 |
| ▸ | PDK1 | Q15118 | 2/20 | 0.37 |
| ▸ | PDK2 | Q15119 | 2/20 | 0.37 |
| ▸ | PDK3 | Q15120 | 2/20 | 0.37 |
| ▸ | PDK4 | Q16654 | 2/20 | 0.37 |
| ▸ | DHODH | Q02127 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29547380 | 1.00 | BCL2L1 (0.41) | BCL2L1POLBSRD5A2PDE7AVCAM1 | |
| SCHEMBL2533011 | 0.95 | POLB (0.41) | BCL2L1POLBSRD5A2PDE7AVCAM1 | |
| Perchlorate SCHEMBL2531596 | 0.95 | BCL2L1 (0.41) | BCL2L1POLBSRD5A2PDE7AVCAM1 | |
| Perchlorate SCHEMBL30043491 | 0.95 | BCL2L1 (0.41) | BCL2L1POLBSRD5A2PDE7AVCAM1 | |
| SCHEMBL30044499 | 0.95 | BCL2L1 (0.39) | BCL2L1POLBSRD5A2PDE7AVCAM1 | |
| SCHEMBL30044789 | 0.95 | POLB (0.41) | BCL2L1POLBSRD5A2PDE7AVCAM1 | |
| SCHEMBL30043707 | 0.95 | BCL2L1 (0.39) | BCL2L1POLBSRD5A2PDE7AVCAM1 | |
| SCHEMBL8736852 | 0.94 | MEN1 (0.43) | BCL2L1POLBSRD5A2PDE7AVCAM1 | |
| SCHEMBL1127635 | 0.93 | ALDH1A1 (0.41) | BCL2L1POLBSRD5A2PDE7AVCAM1 | |
| SCHEMBL29447152 | 0.93 | ALDH1A1 (0.41) | BCL2L1POLBSRD5A2PDE7AVCAM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4696511-A1 | INK-JET RECORDING HEAD | Canon Kabushiki Kaisha (JP) | 2026-02-18 | — | — | EP | disclosed |
| US-20260042294-A1 | INK-JET RECORDING HEAD | CANON KK (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692937-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, HOLLOW STRUCTURE, ELECTRONIC COMPONENT, AND ELASTIC WAVE FILTER | Toray Industries, Inc. (JP) | 2026-02-11 | — | — | EP | disclosed |
| WO-2025074871-A1 | RESIN, PHOTOSENSITIVE RESIN COMPOSITION AND CURED PRODUCTS OF SAME, AND ELECTRONIC COMPONENT AND DISPLAY DEVICE EACH USING SAID CURED PRODUCT | 東レ株式会社 | 2025-04-10 | — | — | WO | disclosed |
| US-20250115705-A1 | RESIN COMPOSITION FOR LENS, CURED SUBSTANCE FOR LENS, AND LENS | MITSUI CHEMICALS, INC. (JP) | 2025-04-10 | — | — | US | disclosed |
| WO-2025070154-A1 | POLYAMIDE RESIN, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, AND ELECTRONIC COMPONENT | 東レ株式会社 | 2025-04-03 | — | — | WO | disclosed |
| WO-2025023159-A1 | PHOTOCURABLE RESIN COMPOSITION, ADHESIVE, SEALING MATERIAL, COATING AGENT, CURED PRODUCT, SEMICONDUCTOR DEVICE, ELECTRONIC COMPONENT, AND CURING, BONDING, SEALING, AND COATING METHODS USING PHOTOCURABLE RESIN COMPOSITION | ナミックス株式会社 | 2025-01-30 | — | — | WO | disclosed |
| EP-4462162-A1 | RESIN COMPOSITION FOR LENS, CURED PRODUCT FOR LENS, AND LENS | Mitsui Chemicals, Inc. (JP) | 2024-11-13 | — | — | EP | disclosed |
| US-20240288772-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-08-29 | — | — | US | disclosed |
| WO-2024176757-A1 | PROTECTIVE FILM FORMING COMPOSITION, SEMICONDUCTOR SUBSTRATE, AND ELECTRONIC COMPONENT | 日産化学株式会社 | 2024-08-29 | — | — | WO | disclosed |
| EP-2485290-A1 | MATERIAL FOR ORGANIC ELECTRONICS, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY ELEMENT USING ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATING DEVICE, AND DISPLAY DEVICE | Hitachi Chemical Company, Ltd. (JP) | 2012-08-08 | — | — | EP | disclosed |
| US-20120181530-A1 | MATERIAL FOR ORGANIC ELECTRONICS, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY ELEMENT USING ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATING DEVICE, AND DISPLAY DEVICE | RESONAC CORPORATION (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120115089-A1 | PROCESS FOR FORMING A HYDROPHILIC COATING AND HYDROPHILIC COATING, AND PROCESS FOR FORMING AN INK JET RECORDING HEAD AND INK JET RECORDING HEAD | CANON KABUSHIKI KAISHA (JP) | 2012-05-10 | — | — | US | disclosed |
| US-20120115985-A1 | PROCESS FOR FORMING A HYDROPHILIC COATING AND HYDROPHILIC COATING, AND PROCESS FOR FORMING AN INK JET RECORDING HEAD AND INK JET RECORDING HEAD | CANON KABUSHIKI KAISHA (JP) | 2012-05-10 | — | — | US | disclosed |
| US-20110039205-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF | SAN-APRO LIMITED (JP) | 2011-02-17 | — | — | US | disclosed |
| EP-2284165-A1 | PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION | San-Apro Limited (JP) | 2011-02-16 | — | — | EP | disclosed |
| US-20100267857-A1 | SALT COMPOUND, CATIONIC POLYMERIZATION INITIATOR AND CATIONICALLY POLYMERIZABLE COMPOSITION | ADEKA CORPORATION (JP) | 2010-10-21 | — | — | US | disclosed |
| US-7709598-B2 | Fluorinated alkyl fluorophoshoric acid salts of onium and transition metal complex | SAN-APRO LIMITED (JP) | 2010-05-04 | — | — | US | disclosed |
| US-20070225458-A1 | Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex | SAN-APRO LIMITED (JP) | 2007-09-27 | — | — | US | disclosed |
| EP-1752463-A1 | NOVEL FLUORINATED ALKYLFLUOROPHOSPHORIC ACID SALT OF ONIUM AND TRANSITION METAL COMPLEX | San-Apro Limited (JP) | 2007-02-14 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100267857-A1 | SALT COMPOUND, CATIONIC POLYMERIZATION INITIATOR AND CATIONICALLY POLYMERIZABLE COMPOSITION | RFC5, RER1, ARF5 | BCL2L1 4530/4885POLB 909/4885SRD5A2 2690/4885 |
| US-20110039205-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF | ARSA, ASIC1, TST | BCL2L1 3994/4885POLB 1211/4885SRD5A2 1856/4885 |
| US-20260042294-A1 | INK-JET RECORDING HEAD | SEM1, ASIC1, C9 | BCL2L1 2220/4885POLB 2980/4885SRD5A2 3846/4885 |
| US-20070225458-A1 | Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex | AS3MT, TTR, PFAS | BCL2L1 4394/4885POLB 724/4885SRD5A2 4434/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.