SCHEMBL1132033

SCHEMBL1132033

C=C(C)C(=O)OCC(COC(=O)C(=C)C)N=C=O

nearest known ligand 0.55

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.55
THRB P10828 1/20 0.39
ALDH1A1 P00352 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9063433 0.91 TSHR (0.50) TSHRTHRBALDH1A1
SCHEMBL1852500 0.91 TSHR (0.50) TSHRTHRBALDH1A1
SCHEMBL20719918 0.89 TSHR (0.47) TSHRTHRBALDH1A1
SCHEMBL2479915 0.89 TSHR (0.47) TSHRTHRBALDH1A1
SCHEMBL20719915 0.86 TSHR (0.45) TSHRTHRBALDH1A1
SCHEMBL7130277 0.85 TSHR (0.55) TSHRTHRBALDH1A1
SCHEMBL20719908 0.85 TSHR (0.47) TSHRTHRBALDH1A1
SCHEMBL31059955 0.84 TSHR (0.53) TSHRTHRBALDH1A1
SCHEMBL28471483 0.84 TSHR (0.53) TSHRTHRBALDH1A1
SCHEMBL20183974 0.84 TSHR (0.53) TSHRTHRBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260044080-A1 COPOLYMER, PHOTOSENSITIVE RESIN COMPOSITION, RESIN CURED FILM, AND IMAGE DISPLAY ELEMENT RESONAC CORPORATION (JP) 2026-02-12 US disclosed
WO-2025121031-A1 COPOLYMER 株式会社レゾナック 2025-06-12 WO disclosed
WO-2025120878-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE COLORING COMPOSITION, AND COLOR FILTER 株式会社レゾナック 2025-06-12 WO disclosed
WO-2025121033-A1 METHOD FOR PRODUCING COPOLYMER 株式会社レゾナック 2025-06-12 WO disclosed
WO-2025121034-A1 RESIN COMPOSITION, MODIFIED RESIN COMPOSITION, AND METHOD FOR PRODUCING MODIFIED RESIN COMPOSITION 株式会社レゾナック 2025-06-12 WO disclosed
WO-2025121032-A1 RESIN COMPOSITION, MODIFIED RESIN COMPOSITION, AND METHOD FOR PRODUCING MODIFIED RESIN COMPOSITION 株式会社レゾナック 2025-06-12 WO disclosed
CN-119836443-A Copolymer, photosensitive resin composition, resin cured film, and image display element 株式会社力森诺科 2025-04-15 CN disclosed
WO-2025013366-A1 RESIN COMPOSITION, MODIFIED RESIN COMPOSITION, AND METHOD FOR PRODUCING MODIFIED RESIN COMPOSITION 株式会社レゾナック 2025-01-16 WO disclosed
WO-2025013355-A1 RESIN COMPOSITION, MODIFIED RESIN COMPOSITION, AND METHOD FOR PRODUCING MODIFIED RESIN COMPOSITION 株式会社レゾナック 2025-01-16 WO disclosed
WO-2024134926-A1 COPOLYMER, PHOTOSENSITIVE RESIN COMPOSITION, RESIN CURED FILM, AND IMAGE DISPLAY ELEMENT 株式会社レゾナック 2024-06-27 WO disclosed
US-20120264963-A1 PHOTOCURABLE COMPOUND SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-10-18 US disclosed
US-20120205234-A1 POLYMERIZABLE MONOMER COMPOSITION AND METHOD FOR PREVENTING POLYMERIZATION SHOWA DENKO K.K. (JP) 2012-08-16 US disclosed
US-8217195-B2 Photocurable compound SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-07-10 US disclosed
US-20110137066-A1 PROCESS OF INHIBITING POLYMERIZATION OF ISOCYANATE GROUP-CONTAINING, ETHYLENICALLY UNSATURATED CARBOXYLATE COMPOUNDS, AND PROCESS FOR PRODUCING THE COMPOUNDS SHOWA DENKO K.K. (JP) 2011-06-09 US disclosed
EP-2325166-A1 METHOD FOR INHIBITING POLYMERIZATION OF ETHYLENICALLY UNSATURATED CARBOXYLIC ACID ESTER COMPOUND CONTAINING ISOCYANATE GROUP AND METHOD FOR PRODUCING ETHYLENICALLY UNSATURATED CARBOXYLIC ACID ESTER COMPOUND CONTAINING ISOCYANATE GROUP Showa Denko K.K. (JP) 2011-05-25 EP disclosed
EP-1812381-B1 ETHYLENICALLY UNSATURATED GROUP-CONTAINING ISOCYANATE COMPOUND AND PROCESS FOR PRODUCING THE SAME, AND REACTIVE MONOMER, REACTIVE (METH)ACRYLATE POLYMER AND ITS USE SHOWA DENKO KK (JP) 2011-02-16 EP disclosed
US-20100197876-A1 PHOTOCURABLE COMPOUND SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-08-05 US disclosed
US-20100099827-A1 POLYMERIZABLE MONOMER COMPOSITION AND METHOD FOR PREVENTING POLYMERIZATION SHOWA DENKO K.K. (JP) 2010-04-22 US disclosed
US-7579066-B2 Ethylenically unsaturated group-containing isocyanate compound and process for producing the same, and reactive monomer, reactive (meth) acrylate polymer and its use SHOWA DENKO K.K. (JP) 2009-08-25 US disclosed
US-20080132597-A1 Ethylenically Unsaturated Group-Containing Isocyanate Compound and Process for Producing the Same, and Reactive Monomer, Reactive (Meth) Acrylate Polymer and its Use RESONAC CORPORATION (JP) 2008-06-05 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110137066-A1 PROCESS OF INHIBITING POLYMERIZATION OF ISOCYANATE GROUP-CONTAINING, ETHYLENICALLY UNSATURATED CARBOXYLATE COMPOUNDS, AND PROCESS FOR PRODUCING THE COMPOUNDS ALKBH3, OGDH, IDH2 TSHR 4884/4885THRB 4839/4885ALDH1A1 189/4885
US-20080132597-A1 Ethylenically Unsaturated Group-Containing Isocyanate Compound and Process for Producing the Same, and Reactive Monomer, Reactive (Meth) Acrylate Polymer and its Use ACAD9, ELOVL6, ELOVL5 TSHR 4731/4885THRB 4474/4885ALDH1A1 119/4885
US-20260044080-A1 COPOLYMER, PHOTOSENSITIVE RESIN COMPOSITION, RESIN CURED FILM, AND IMAGE DISPLAY ELEMENT KDM2B, KDM1A, KDM3A TSHR 4567/4885THRB 2263/4885ALDH1A1 166/4885
US-20120264963-A1 PHOTOCURABLE COMPOUND ACR, UMPS, UGT1A1 TSHR 4329/4885THRB 3780/4885ALDH1A1 14/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.