SCHEMBL1148409

SCHEMBL1148409

O=[N+]([O-])c1cccc(S(=O)(=O)Br)c1

nearest known ligand 0.72

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.72
GAA P10253 1/20 0.72
HTT P42858 1/20 0.72
CA2 P00918 3/20 0.68
CA5A P35218 1/20 0.68
MMP2 P08253 2/20 0.62
CA1 P00915 1/20 0.62
MMP1 P03956 1/20 0.62
MMP9 P14780 1/20 0.62
MMP8 P22894 1/20 0.62
MMP13 P45452 1/20 0.62
MEN1 O00255 2/20 0.60
LMNA P02545 2/20 0.59
TSHR P16473 1/20 0.59
F2 P00734 2/20 0.57
PRSS1 P07477 2/20 0.57
PRSS2 P07478 2/20 0.57
PRSS3 P35030 2/20 0.57
ALDH1A1 P00352 3/20 0.55
CYP19A1 P11511 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9580710 0.84 KMT2A (1.00) KMT2AGAAHTTCA2CA5A
Dinitrophenylene SCHEMBL27624439 0.84 TSHR (0.77) KMT2AGAAHTTCA2CA5A
SCHEMBL205255 0.82 KMT2A (0.75) KMT2AGAAHTTCA2CA5A
SCHEMBL10515655 0.81 KMT2A (0.72) KMT2AGAAHTTCA2CA5A
SCHEMBL5899427 0.81 KMT2A (0.72) KMT2AGAAHTTCA2CA5A
Potassium Ion SCHEMBL10474224 0.81 KMT2A (0.72) KMT2AGAAHTTCA2CA5A
SCHEMBL6400928 0.81 CA2 (1.00) KMT2AGAAHTTCA2CA5A
SCHEMBL189037 0.81 CA2 (1.00) KMT2AGAAHTTCA2CA5A
SCHEMBL33351 0.81 KMT2A (0.72) KMT2AGAAHTTCA2CA5A
SCHEMBL9471995 0.81 KMT2A (0.72) KMT2AGAAHTTCA2CA5A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113527680-B Polymer, photosensitive resin composition, pattern forming method, cured film, and electronic component 信越化学工业株式会社 2023-04-28 CN disclosed
EP-3896521-B1 POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT SHINETSU CHEMICAL CO (JP) 2022-12-14 EP disclosed
US-11333975-B2 Polymer, photosensitive resin composition, patterning method, method of forming cured film, interlayer insulating film, surface protective film, and electronic component INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2022-05-17 US disclosed
CN-113527680-A Polymer, photosensitive resin composition, pattern forming method, cured film, and electronic component 信越化学工业株式会社 2021-10-22 CN disclosed
EP-3896521-A1 POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT Shin-Etsu Chemical Co., Ltd. (JP) 2021-10-20 EP disclosed
US-20210317268-A1 POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-14 US disclosed
US-8481744-B2 Process for producing anthranilamide compound ISHIHARA SANGYO KAISHA, LTD. (JP) 2013-07-09 US disclosed
EP-2264021-B1 PROCESS FOR PRODUCING AN ANTHRANILAMIDE COMPOUND ISHIHARA SANGYO KAISHA (JP) 2013-06-26 EP disclosed
US-20110034696-A1 PROCESS FOR PRODUCING ANTHRANILAMIDE COMPOUND ISHIHARA SANGYO KAISHA, LTD. (JP) 2011-02-10 US disclosed
EP-2264021-A1 PROCESS FOR PRODUCING AN ANTHRANILAMIDE COMPOUND ISHIHARA SANGYO KAISHA, LTD. (JP) 2010-12-22 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110034696-A1 PROCESS FOR PRODUCING ANTHRANILAMIDE COMPOUND SQOR, NOX5, NOX3 KMT2A 773/4885GAA 3032/4885HTT 4724/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.