Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS2 | P35354 | 2/20 | 0.33 |
| ▸ | HK2 | P52789 | 1/20 | 0.33 |
| ▸ | PDE4B | Q07343 | 2/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.30 |
| ▸ | CRHBP | P24387 | 1/20 | 0.30 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9359481 | 0.79 | LMNA (0.33) | PTGS2PDE4BCRHBPCRHR2MAPT | |
| SCHEMBL6569636 | 0.71 | ALDH1A1 (0.40) | PTGS2PDE4BKMT2ANPC1MAPT | |
| SCHEMBL210321 | 0.69 | BACE1 (0.50) | PDE4BKMT2AMEN1GAAMAPT | |
| Benzene SCHEMBL28277789 | 0.69 | BACE1 (0.50) | PDE4BKMT2AMEN1GAAMAPT | |
| Benzene SCHEMBL28133344 | 0.69 | BACE1 (0.50) | PDE4BKMT2AMEN1GAAMAPT | |
| SCHEMBL28296080 | 0.67 | BACE1 (0.48) | PDE4BKMT2AMEN1GAAMAPT | |
| SCHEMBL11726616 | 0.67 | BACE1 (0.41) | PTGS2HK2PDE4BKMT2AMEN1 | |
| SCHEMBL9467973 | 0.66 | HSD17B3 (0.50) | PTGS2MAPT | |
| SCHEMBL28503247 | 0.65 | PDCD1 (0.35) | MAPT | |
| Naphthalene SCHEMBL28134279 | 0.64 | BACE1 (0.45) | PDE4BKMT2AMEN1GAAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4140606-A | Process for preparing a polymerizable (meth) acrylate oligomer | SHOWA DENKO K.K. (JP) | 1979-02-20 | — | — | US | disclosed |
| US-4010289-A | METHOD OF MANUFACTURING SYNTHETIC RESIN FILM HAVING HIGH WRITABILITY AND PRINTABILITY | SHOWA DENKO KABUSHIKI KAISHA (JA) | 1977-03-01 | — | — | US | disclosed |