SCHEMBL11921089

SCHEMBL11921089

CCCC[S+](CCCC)c1ccc2c(c1)c1ccccc1n2CC#N

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PSEN1 P49768 1/20 0.41
▸ PSEN2 P49810 1/20 0.41
▸ APH1B Q8WW43 1/20 0.41
▸ NCSTN Q92542 1/20 0.41
▸ APH1A Q96BI3 1/20 0.41
▸ PSENEN Q9NZ42 1/20 0.41
▸ ALDH1A1 P00352 5/20 0.39
▸ HPGD P15428 4/20 0.39
▸ KDM4E B2RXH2 3/20 0.39
▸ MAPT P10636 2/20 0.39
▸ HSD17B10 Q99714 2/20 0.39
▸ MEN1 O00255 1/20 0.39
▸ MAPK1 P28482 1/20 0.39
▸ HTT P42858 1/20 0.39
▸ HBB P68871 1/20 0.39
▸ KMT2A Q03164 1/20 0.39
▸ TDP1 Q9NUW8 1/20 0.39
▸ CNR2 P34972 6/20 0.39
▸ RORC P51449 6/20 0.38
▸ PGR P06401 3/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11921071 0.85 MAPT (0.54) ALDH1A1HPGDKDM4EMAPTHSD17B10
SCHEMBL11921085 0.80 ALDH1A1 (0.39) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL8758392 0.74 ALDH1A1 (0.59) ALDH1A1HPGDKDM4EHSD17B10MEN1
SCHEMBL11921097 0.73 LMNA (0.40) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL11921103 0.70 KDM4E (0.51) ALDH1A1HPGDKDM4EMAPTHSD17B10
Biphenyl SCHEMBL28953669 0.68 ALDH1A1 (0.53) ALDH1A1HPGDKDM4EHSD17B10MEN1
SCHEMBL11921078 0.66 GPR3 (0.42) ALDH1A1HPGDKDM4EMAPTTDP1
SCHEMBL11921082 0.66 NPC1 (0.44) ALDH1A1HPGDKDM4EMAPTMEN1
SCHEMBL14689815 0.65 MAPT (0.50) ALDH1A1MAPTMEN1MAPK1HTT
SCHEMBL11921090 0.65 ALDH1A1 (0.41) ALDH1A1HPGDKDM4EMAPTHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8846293-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition FUJIFILM CORPORATION (JP) 2014-09-30 — — US disclosed
US-20120251948-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION FUJIFILM CORPORATION (JP) 2012-10-04 — — US disclosed
US-20120207978-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION FUJIFILM CORPORATION (JP) 2012-08-16 — — US disclosed
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