SCHEMBL11921097

SCHEMBL11921097

CCCC[S+](CCCC)c1ccc2c(c1)c1ccccc1n2C(=O)C(C)C

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 3/20 0.40
▸ MAPT P10636 2/20 0.40
▸ CNR2 P34972 5/20 0.40
▸ HTR7 P34969 4/20 0.39
▸ ALDH1A1 P00352 2/20 0.38
▸ HPGD P15428 2/20 0.38
▸ OXER1 Q8TDS5 1/20 0.38
▸ KDM4E B2RXH2 2/20 0.38
▸ POLB P06746 1/20 0.37
▸ NPC1 O15118 2/20 0.37
▸ CNR1 P21554 1/20 0.36
▸ MEN1 O00255 1/20 0.36
▸ KMT2A Q03164 1/20 0.36
▸ SMN1; SMN2 Q16637 1/20 0.36
▸ PSEN1 P49768 1/20 0.36
▸ PSEN2 P49810 1/20 0.36
▸ APH1B Q8WW43 1/20 0.36
▸ NCSTN Q92542 1/20 0.36
▸ APH1A Q96BI3 1/20 0.36
▸ PSENEN Q9NZ42 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11921071 0.78 MAPT (0.54) LMNAMAPTCNR2ALDH1A1HPGD
SCHEMBL11921089 0.73 PSEN1 (0.41) MAPTCNR2ALDH1A1HPGDKDM4E
SCHEMBL11921085 0.73 ALDH1A1 (0.39) MAPTCNR2ALDH1A1HPGDKDM4E
SCHEMBL11921108 0.69 ALDH1A1 (0.38) MAPTCNR2ALDH1A1HPGDKDM4E
SCHEMBL13325029 0.67 POLB (0.53) LMNAMAPTHTR7ALDH1A1HPGD
SCHEMBL11921099 0.67 POLB (0.40) LMNAMAPTALDH1A1HPGDKDM4E
SCHEMBL2483599 0.66 KDM4E (0.54) LMNAMAPTALDH1A1HPGDKDM4E
SCHEMBL10148088 0.65 POLB (0.41) LMNAMAPTALDH1A1HPGDKDM4E
SCHEMBL9397309 0.65 HTR7 (0.61) HTR7PSEN1PSEN2APH1BNCSTN
SCHEMBL11921078 0.65 GPR3 (0.42) LMNAMAPTALDH1A1HPGDKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8846293-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition FUJIFILM CORPORATION (JP) 2014-09-30 — — US disclosed
US-20120251948-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION FUJIFILM CORPORATION (JP) 2012-10-04 — — US disclosed
US-20120207978-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION FUJIFILM CORPORATION (JP) 2012-08-16 — — US disclosed
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