SCHEMBL11921085

SCHEMBL11921085

CCCC[S+](CCCC)c1ccc2c(c1)c1ccccc1n2CC(F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 2/20 0.39
▸ HPGD P15428 2/20 0.39
▸ KDM4E B2RXH2 1/20 0.39
▸ MEN1 O00255 1/20 0.39
▸ MAPT P10636 1/20 0.39
▸ MAPK1 P28482 1/20 0.39
▸ HTT P42858 1/20 0.39
▸ HBB P68871 1/20 0.39
▸ KMT2A Q03164 1/20 0.39
▸ HSD17B10 Q99714 1/20 0.39
▸ TDP1 Q9NUW8 1/20 0.39
▸ RORA P35398 7/20 0.39
▸ RORC P51449 7/20 0.39
▸ RORB Q92753 7/20 0.39
▸ CNR2 P34972 6/20 0.39
▸ NPY5R Q15761 1/20 0.39
▸ PGR P06401 7/20 0.38
▸ DRD3 P35462 1/20 0.36
▸ PSEN1 P49768 1/20 0.36
▸ PSEN2 P49810 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11921071 0.85 MAPT (0.54) ALDH1A1HPGDKDM4EMEN1MAPT
SCHEMBL11921089 0.80 PSEN1 (0.41) ALDH1A1HPGDKDM4EMEN1MAPT
SCHEMBL23148499 0.74 CYP1A2 (0.56) ALDH1A1KDM4ERORARORCRORB
SCHEMBL11921097 0.73 LMNA (0.40) ALDH1A1HPGDKDM4EMEN1MAPT
SCHEMBL11921103 0.70 KDM4E (0.51) ALDH1A1HPGDKDM4EMEN1MAPT
SCHEMBL13049599 0.69 NPY5R (0.41) ALDH1A1HPGDKDM4EMEN1MAPT
SCHEMBL23318288 0.69 KMT2A (0.44) ALDH1A1HPGDKDM4EMEN1MAPT
SCHEMBL11921082 0.66 NPC1 (0.44) ALDH1A1HPGDKDM4EMEN1MAPT
SCHEMBL11921078 0.66 GPR3 (0.42) ALDH1A1HPGDKDM4EMAPTTDP1
SCHEMBL11921083 0.65 RORA (0.41) ALDH1A1HPGDKDM4EMEN1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8846293-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition FUJIFILM CORPORATION (JP) 2014-09-30 — — US disclosed
US-20120251948-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION FUJIFILM CORPORATION (JP) 2012-10-04 — — US disclosed
US-20120207978-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION FUJIFILM CORPORATION (JP) 2012-08-16 — — US disclosed
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