SCHEMBL11976384

SCHEMBL11976384

C=C(C)C(=O)OC1C2OC(=O)C3C2OC1C3C(=O)O

nearest known ligand 0.31

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
GPX4 P36969 1/20 0.31
KDM4E B2RXH2 1/20 0.31
NPC1 O15118 1/20 0.31
POLB P06746 1/20 0.31
MAPT P10636 1/20 0.31
PKM P14618 1/20 0.31
HTT P42858 1/20 0.31
RECQL P46063 1/20 0.31
RAB9A P51151 1/20 0.31
ATM Q13315 1/20 0.31
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11964235 0.89 GPX4 (0.31) GPX4KDM4ENPC1POLBMAPT
SCHEMBL16372800 0.87 KDM4E (0.34) GPX4KDM4ENPC1POLBMAPT
SCHEMBL92239 0.87 KDM4E (0.34) GPX4KDM4ENPC1POLBMAPT
SCHEMBL11964231 0.87 ALDH1A1 (0.30)
SCHEMBL12130212 0.86
SCHEMBL12130215 0.86
SCHEMBL12130167 0.85 THRB (0.30)
SCHEMBL74443 0.83 KDM4E (0.32) GPX4KDM4ENPC1POLBMAPT
SCHEMBL12130221 0.83
SCHEMBL12130217 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11801333-B2 Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-31 US disclosed
US-11786160-B2 Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-17 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-10222696-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-03-05 US disclosed
US-10023752-B2 Conductive material and substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-07-17 US disclosed
US-20180193632-A1 BIOMEDICAL ELECTRODE COMPOSITION, BIOMEDICAL ELECTRODE AND METHOD FOR MANUFACTURING THE BIOMEDICAL ELECTRODE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-07-12 US disclosed
US-20180197653-A1 POLYMERIZABLE MONOMER, POLYMER COMPOUND, BIOLOGICAL ELECTRODE COMPOSITION, BIOLOGICAL ELECTRODE, AND METHOD FOR PRODUCING BIOLOGICAL ELECTRODE SHIH-ETSU CHEMICAL CO., LTD. (JP) 2018-07-12 US disclosed
US-20180168470-A1 BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING BIO-ELECTRODE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-21 US disclosed
US-9958776-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-01 US disclosed
US-9958776-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-01 US disclosed
US-9164383-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-10-20 US disclosed
US-9164383-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-10-20 US disclosed
US-20130029270-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-01-31 US disclosed
US-20130029270-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-01-31 US disclosed
US-20120208127-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-16 US disclosed
US-20120208127-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-16 US disclosed
US-8062831-B2 Carboxyl-containing lactone compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-11-22 US disclosed
US-8062831-B2 Carboxyl-containing lactone compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-11-22 US disclosed
US-20090274984-A1 CARBOXYL-CONTAINING LACTONE COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-05 US disclosed
US-20090274984-A1 CARBOXYL-CONTAINING LACTONE COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-05 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180193632-A1 BIOMEDICAL ELECTRODE COMPOSITION, BIOMEDICAL ELECTRODE AND METHOD FOR MANUFACTURING THE BIOMEDICAL ELECTRODE KCNN2, KCNN1, HCN4 GPX4 3584/4885KDM4E 512/4885NPC1 4803/4885
US-20090274984-A1 CARBOXYL-CONTAINING LACTONE COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS WDR1, EGLN1, RER1 GPX4 4183/4885KDM4E 115/4885NPC1 4443/4885
US-10222696-B2 Resist composition and patterning process SLC11A2, GRN, PGF GPX4 2314/4885KDM4E 1896/4885NPC1 4647/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.