Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN2 | P17706 | 2/20 | 0.68 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.68 |
| ▸ | PTPN5 | P54829 | 2/20 | 0.68 |
| ▸ | NPC1 | O15118 | 10/20 | 0.66 |
| ▸ | RAB9A | P51151 | 8/20 | 0.64 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.64 |
| ▸ | MAPT | P10636 | 6/20 | 0.64 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.64 |
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.64 |
| ▸ | LMNA | P02545 | 2/20 | 0.64 |
| ▸ | MEN1 | O00255 | 2/20 | 0.63 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.63 |
| ▸ | ATM | Q13315 | 1/20 | 0.63 |
| ▸ | HPGD | P15428 | 4/20 | 0.62 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.62 |
| ▸ | USP2 | O75604 | 1/20 | 0.60 |
| ▸ | GAA | P10253 | 1/20 | 0.60 |
| ▸ | TSHR | P16473 | 1/20 | 0.60 |
| ▸ | STAT3 | P40763 | 1/20 | 0.60 |
| ▸ | TP53 | P04637 | 3/20 | 0.58 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10047629 | 0.94 | PTPN2 (0.62) | PTPN2PTPN1PTPN5NPC1RAB9A | |
| SCHEMBL11337898 | 0.87 | MAPT (0.74) | PTPN2PTPN1PTPN5NPC1RAB9A | |
| SCHEMBL24295253 | 0.86 | NPC1 (0.67) | PTPN2PTPN1PTPN5NPC1RAB9A | |
| SCHEMBL31170 | 0.86 | NPC1 (0.81) | PTPN2PTPN1PTPN5NPC1RAB9A | |
| Methane SCHEMBL29265168 | 0.84 | NPC1 (0.79) | PTPN2PTPN1PTPN5NPC1RAB9A | |
| SCHEMBL31476 | 0.84 | NPC1 (0.79) | PTPN2PTPN1PTPN5NPC1RAB9A | |
| SCHEMBL9114869 | 0.83 | NPC1 (0.63) | PTPN2PTPN1PTPN5NPC1RAB9A | |
| SCHEMBL13049179 | 0.83 | NPC1 (0.63) | PTPN2PTPN1PTPN5NPC1RAB9A | |
| SCHEMBL3365960 | 0.83 | NPC1 (0.63) | PTPN2PTPN1PTPN5NPC1RAB9A | |
| SCHEMBL12639220 | 0.83 | NPC1 (0.68) | PTPN2PTPN1PTPN5NPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2012108689-A2 | NOVEL COMPOUND HAVING SKIN-WHITENING, ANTI-OXIDIZING AND PPAR ACTIVITIES AND MEDICAL USE THEREFOR | 부산대학교 산학협력단 (KR) | 2012-08-16 | — | — | WO | claimed |
| US-20230038825-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR MANUFACTURING PHOTOMASK, AND METHOD FOR MANUFACTURING PHOTOMASK | FUJIFILM CORPORATION (JP) | 2023-02-09 | — | — | US | disclosed |
| WO-2023008346-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | 富士フイルム株式会社 | 2023-02-02 | — | — | WO | disclosed |
| CN-109265409-B | Synthesis method of 2-substituted benzoxazole, 2-substituted benzothiazole and derivatives thereof | 重庆医科大学 | 2022-09-02 | — | — | CN | disclosed |
| US-20220206386-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2022-06-30 | — | — | US | disclosed |
| CN-112250779-B | Photochromic microspheres, preparation method and application | 深圳市裕同包装科技股份有限公司 | 2022-06-10 | — | — | CN | disclosed |
| US-20210165325-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND | FUJIFILM CORPORATION (JP) | 2021-06-03 | — | — | US | disclosed |
| WO-2021065450-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | 富士フイルム株式会社 | 2021-04-08 | — | — | WO | disclosed |
| US-20200183279-A1 | PHOTOSENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJI FILM CORPORATION (JP) | 2020-06-11 | — | — | US | disclosed |
| WO-2020045534-A1 | ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND | 富士フイルム株式会社 | 2020-03-05 | — | — | WO | disclosed |
| EP-1521798-A1 | SUNSCREENS | DSM IP Assets B.V. (NL) | 2005-04-13 | — | — | EP | disclosed |
| US-20040242615-A1 | Utilities of olefin derivatives | SHIONOGI & CO., LTD. (JP) | 2004-12-02 | — | — | US | disclosed |
| WO-2004007592-A1 | SUNSCREENS | DSM IP ASSETS B.V. (NL) | 2004-01-22 | — | — | WO | disclosed |
| EP-0623115-A4 | NUCLEOPHILIC DISPLACEMENT METHOD FOR SYNTHESIS OF NON-RIGID PBZ POLYMERS. | DOW CHEMICAL CO (US) | 1995-01-11 | — | — | EP | disclosed |
| EP-0623115-A1 | NUCLEOPHILIC DISPLACEMENT METHOD FOR SYNTHESIS OF NON-RIGID PBZ POLYMERS | THE DOW CHEMICAL COMPANY (US) | 1994-11-09 | — | — | EP | disclosed |
| WO-1993014071-A1 | NUCLEOPHILIC DISPLACEMENT METHOD FOR SYNTHESIS OF NON-RIGID PBZ POLYMERS | THE DOW CHEMICAL COMPANY (US) | 1993-07-22 | — | — | WO | disclosed |
| US-5216110-A | Monomers useful in nucleophilic displacement synthesis of polybenzazole polymers | THE DOW CHEMICAL COMPANY (US) | 1993-06-01 | — | — | US | disclosed |
| US-5194562-A | Nucleophilic displacement method for synthesis of non-rigid PBZ polymers | THE DOW CHEMICAL COMPANY (US) | 1993-03-16 | — | — | US | disclosed |
| US-5104960-A | Nucleophilic displacement method for synthesis of non-rigid PBZ polymers | THE DOW CHEMICAL COMPANY (US) | 1992-04-14 | — | — | US | disclosed |
| EP-0479161-A1 | Synthesis of heterocyclic compounds | EASTMAN CHEMICAL COMPANY (US) | 1992-04-08 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040242615-A1 | Utilities of olefin derivatives | APOL1, NR1H2, APOB | PTPN2 2694/4885PTPN1 2551/4885PTPN5 3015/4885 |
| US-20200183279-A1 | PHOTOSENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | EED, RER1, CFD | PTPN2 4083/4885PTPN1 4149/4885PTPN5 4201/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.