Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.41 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | POLB | P06746 | 2/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | APEX1 | P27695 | 1/20 | 0.37 |
| ▸ | RECQL | P46063 | 1/20 | 0.37 |
| ▸ | BLM | P54132 | 1/20 | 0.37 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13409254 | 1.00 | ALDH1A1 (0.41) | ALDH1A1KDM4EHSD17B10HPGDPOLB | |
| SCHEMBL3881811 | 0.78 | KDM4E (0.38) | ALDH1A1KDM4EHSD17B10HPGDPOLB | |
| SCHEMBL75458 | 0.76 | LMNA (0.41) | ALDH1A1KDM4EHSD17B10HPGDPOLB | |
| SCHEMBL22789979 | 0.76 | LMNA (0.41) | ALDH1A1KDM4EHSD17B10HPGDPOLB | |
| SCHEMBL3877540 | 0.75 | ALDH1A1 (0.37) | ALDH1A1KDM4EHSD17B10HPGDPOLB | |
| SCHEMBL3871321 | 0.72 | KDM4E (0.40) | ALDH1A1KDM4EHSD17B10HPGDPOLB | |
| SCHEMBL13867048 | 0.72 | KDM4E (0.40) | ALDH1A1KDM4EHSD17B10HPGDPOLB | |
| SCHEMBL3873295 | 0.72 | ALDH1A1 (0.37) | ALDH1A1KDM4EHSD17B10HPGDPOLB | |
| SCHEMBL15339882 | 0.72 | LMNA (0.45) | ALDH1A1KDM4EHSD17B10HPGDPOLB | |
| SCHEMBL9908400 | 0.71 | ALDH1A1 (0.43) | ALDH1A1KDM4EHSD17B10HPGDPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 195 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230314944-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230161255-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161255-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20210405528-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-12-30 | — | — | US | disclosed |
| US-10871711-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-12-22 | — | — | US | disclosed |
| US-20190094690-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-03-28 | — | — | US | disclosed |
| US-10222696-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-03-05 | — | — | US | disclosed |
| US-10007178-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-26 | — | — | US | disclosed |
| EP-1607413-A1 | A catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers | ROHM AND HAAS COMPANY (US) | 2005-12-21 | — | — | EP | disclosed |
| US-20050277569-A1 | Catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers | ROHM AND HAAS COMPANY | 2005-12-15 | — | — | US | disclosed |
| US-20050277749-A1 | Catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers | ROHM AND HAAS COMPANY | 2005-12-15 | — | — | US | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-20050043494-A1 | Catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers | ROHM AND HAAS COMPANY | 2005-02-24 | — | — | US | disclosed |
| EP-1508577-A1 | A catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers | ROHM AND HAAS COMPANY (US) | 2005-02-23 | — | — | EP | disclosed |
| EP-1148044-B1 | Ester compounds, polymers, resist compositions and patterning process | SHINETSU CHEMICAL CO (JP) | 2004-01-07 | — | — | EP | disclosed |
| US-6586157-B2 | Cycloalkyl-substituted cycloalkyl or cycloalkenyl acrylates; polymers that are sensitive to high energy radiation; patterning using electron beams or deep UV | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-07-01 | — | — | US | disclosed |
| US-20010044071-A1 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2001-11-22 | — | — | US | disclosed |
| EP-1148044-A1 | Ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-24 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10222696-B2 | Resist composition and patterning process | SLC11A2, GRN, PGF | ALDH1A1 4832/4885KDM4E 1896/4885HSD17B10 2895/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.