Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC18A3 | Q16572 | 3/20 | 0.44 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.39 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12015482 | 0.98 | SLC18A3 (0.43) | SLC18A3OPRM1OPRK1MEN1ALDH1A1 | |
| SCHEMBL12015481 | 0.88 | SLC18A3 (0.40) | SLC18A3OPRM1OPRK1ALDH1A1 | |
| SCHEMBL13174350 | 0.88 | SLC18A3 (0.40) | SLC18A3OPRM1OPRK1ALDH1A1CHRM3 | |
| SCHEMBL12017269 | 0.81 | SLC18A3 (0.39) | SLC18A3OPRM1OPRK1MEN1ALDH1A1 | |
| SCHEMBL12017270 | 0.80 | SLC18A3 (0.38) | SLC18A3OPRM1OPRK1MEN1ALDH1A1 | |
| SCHEMBL28014789 | 0.77 | SLC18A3 (0.46) | SLC18A3OPRM1OPRK1MEN1ALDH1A1 | |
| SCHEMBL685770 | 0.75 | NPY1R (0.39) | ALDH1A1 | |
| SCHEMBL28014791 | 0.74 | SLC18A3 (0.43) | SLC18A3OPRM1OPRK1MEN1ALDH1A1 | |
| SCHEMBL685771 | 0.71 | NPY1R (0.36) | ALDH1A1 | |
| SCHEMBL12015488 | 0.71 | TDP1 (0.36) | SLC18A3OPRM1OPRK1MEN1CYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9176378-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-11-03 | — | — | US | disclosed |
| US-8921028-B2 | Salt, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-12-30 | — | — | US | disclosed |
| US-8735047-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-05-27 | — | — | US | disclosed |
| US-8574812-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-11-05 | — | — | US | disclosed |
| US-8460851-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-06-11 | — | — | US | disclosed |
| US-20130022919-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20120258404-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-11 | — | — | US | disclosed |
| US-20120231392-A1 | SALT, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-09-13 | — | — | US | disclosed |
| US-20120219906-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20110171576-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-14 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120231392-A1 | SALT, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, RCOR3, REN | SLC18A3 3552/4885OPRM1 3897/4885OPRK1 3615/4885 |
| US-20110171576-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | CLIC1, SLC10A6, APOL1 | SLC18A3 2876/4885OPRM1 265/4885OPRK1 841/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.