SCHEMBL1203909

SCHEMBL1203909

CN(C)[SiH](Cc1ccccc1)N(C)C

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.48
ALDH1A1 P00352 1/20 0.48
AOC3 Q16853 3/20 0.44
TAAR1 Q96RJ0 1/20 0.44
TP53 P04637 1/20 0.42
CALM1 P0DP23 1/20 0.39
SIGMAR1 Q99720 2/20 0.39
CARM1 Q86X55 1/20 0.39
PRMT6 Q96LA8 1/20 0.39
PRMT8 Q9NR22 1/20 0.39
NPC1 O15118 2/20 0.38
RAB9A P51151 2/20 0.38
ADRA2B P18089 1/20 0.38
ADRA2C P18825 1/20 0.38
SLC6A2 P23975 1/20 0.38
HTR2A P28223 1/20 0.38
SLC6A4 P31645 1/20 0.38
ADRA1A P35348 1/20 0.38
OPRK1 P41145 1/20 0.38
SLC6A3 Q01959 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8777933 0.78 TSHR (0.46) TSHRALDH1A1AOC3TAAR1TP53
SCHEMBL11101426 0.76 TP53 (0.44) TSHRALDH1A1AOC3TAAR1TP53
SCHEMBL2102729 0.73 SIGMAR1 (0.53) AOC3TAAR1SIGMAR1SLC6A2SLC6A4
SCHEMBL703318 0.70 TP53 (0.48) TSHRALDH1A1TAAR1TP53CALM1
SCHEMBL476128 0.70 TP53 (0.48) TSHRALDH1A1TAAR1TP53CALM1
SCHEMBL6960735 0.70 TP53 (0.48) TSHRALDH1A1TAAR1TP53CALM1
SCHEMBL41196 0.69 CALM1 (0.50) TSHRALDH1A1TAAR1TP53CALM1
Fluoride SCHEMBL28075257 0.69 TP53 (0.46) TSHRALDH1A1TAAR1TP53CALM1
SCHEMBL9422248 0.67 CALM1 (0.47) TSHRALDH1A1TAAR1TP53CALM1
SCHEMBL14764823 0.67 CYP1A2 (0.36) CALM1OPRK1MAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 86 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4724526-A1 CONDENSATION CURE SILICONE ADHESIVE Momentive Performance Materials Inc. (US) 2026-04-15 EP disclosed
US-20250098186-A1 INTEGRATED CIRCUIT DEVICES AND METHODS OF MANUFACTURING THE SAME SAMSUNG ELECTRONICS CO LTD (KR) 2025-03-20 US disclosed
US-12199137-B2 Integrated circuit devices and methods of manufacturing the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2025-01-14 US disclosed
WO-2024253958-A1 CONDENSATION CURE SILICONE ADHESIVE MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2024-12-12 WO disclosed
US-20240409796-A1 CONDENSATION CURE SILICONE ADHESIVE MOMENTIVE PERFORMANCE MATERIALS INC. 2024-12-12 US disclosed
EP-3032296-B1 OPTICAL MEMBER AND METHOD FOR MANUFACTURING OPTICAL MEMBER CANON KK (JP) 2024-08-28 EP disclosed
EP-3743464-B1 ORGANIC-INORGANIC AEROGEL COMPOSITES, METHODS AND USES THEREOF BRONX CREATIVE&DESIGN CENTRE PTE LTD (SG) 2024-03-06 EP disclosed
US-20230250250-A1 Organic-inorganic Aerogel Composites, Methods and Uses Thereof BRONX CREATIVE & DESIGN CENTRE PTE LTD (SG) 2023-08-10 US disclosed
US-20220416010-A1 INTEGRATED CIRCUIT DEVICES AND METHODS OF MANUFACTURING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2022-12-29 US disclosed
CN-115528172-A Integrated circuit device and method of manufacturing the same 三星电子株式会社 2022-12-27 CN disclosed
US-20050277058-A1 Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed
US-20050274692-A1 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed
US-20050277755-A1 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed
US-20050192708-A1 Method for selecting formulations to treat electrical cables NOVINIUM, INC. (US) 2005-09-01 US disclosed
US-20050189130-A1 Method for treating electrical cable at sustained elevated pressure NOVINIUM, INC. (US) 2005-09-01 US disclosed
WO-2004103326-A1 PERSONAL CARE APPLICATIONS OF EMULSIONS CONTAINING ELASTOMERIC SILANES AND SILOXANES WITH NITROGEN ATOMS DOW CORNING CORPORATION (US) 2004-12-02 WO disclosed
WO-2004104013-A1 METHOD OF PREPARING EMULSIONS CONTAINING ELASTOMERIC SILANES AND SILOXANES HAVING QUATERNARY AMMONIUM GROUPS DOW CORNING CORPORATION (US) 2004-12-02 WO disclosed
US-6787603-B2 REACTING EPOXIDE OR HALOHYDRIN DERIVATIZED NITROGEN ONIUM COMPOUND WITH AN AMINO FUNCTIONALIZED POLYSILOXANE IN WATER CONTAINING SURFACTANT DOW CORNING CORPORATION 2004-09-07 US disclosed
EP-1426398-A1 Method of making emulsion containing quaternary ammonium functional silanes and siloxanes DOW CORNING CORPORATION (US) 2004-06-09 EP disclosed
US-20040102570-A1 METHOD OF MAKING EMULSION CONTAINING QUATERNARY AMMONIUM FUNCTIONAL SILANES AND SILOXANES DOW SILICONES CORPORATION 2004-05-27 US disclosed