SCHEMBL12098028

SCHEMBL12098028

Oc1ccc(Cc2c3ccccc3c(-c3ccc(O)cc3)c3ccccc23)cc1

nearest known ligand 0.54

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
▸ PTPN1 P18031 7/20 0.54
▸ ESR1 P03372 5/20 0.46
▸ ESR2 Q92731 5/20 0.46
▸ KEAP1 Q14145 1/20 0.44
▸ ACP1 P24666 7/20 0.42
▸ MMP3 P08254 1/20 0.40
▸ BCL2L1 Q07817 1/20 0.40
▸ NPC1 O15118 1/20 0.39
▸ RAB9A P51151 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3186379 0.88 ESR1 (0.59) PTPN1ESR1ESR2KEAP1ACP1
SCHEMBL12097825 0.82 PTPN1 (0.40) PTPN1ACP1
SCHEMBL5705575 0.82 ESR1 (0.57) PTPN1ESR1ESR2MMP3BCL2L1
SCHEMBL30692092 0.82 ESR1 (0.57) PTPN1ESR1ESR2MMP3BCL2L1
SCHEMBL16000739 0.80 MMP3 (0.62) PTPN1ESR1ESR2MMP3BCL2L1
SCHEMBL30633884 0.78 MMP3 (0.67) PTPN1ESR1ESR2MMP3BCL2L1
SCHEMBL27979824 0.78 MMP3 (0.67) PTPN1ESR1ESR2MMP3BCL2L1
SCHEMBL13825919 0.76 MMP3 (0.71) PTPN1ESR1ESR2MMP3BCL2L1
SCHEMBL27951333 0.75 ESR1 (0.55) PTPN1ESR1ESR2MMP3BCL2L1
SCHEMBL16271331 0.73 THRB (0.48) PTPN1ESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118878804-A Resin, resin precursor composition, coating liquid composition, electrophotographic photoreceptor, molded article, electronic device, and method for producing electrophotographic photoreceptor 出光兴产株式会社 2024-11-01 — — CN claimed
CN-115397886-B Resin, resin precursor composition, coating liquid composition, electrophotographic photoreceptor, molded article, electronic device, and method for producing electrophotographic photoreceptor 出光兴产株式会社 2024-09-03 — — CN claimed
EP-4685185-A1 CURABLE RESIN COMPOSITION, CURED PRODUCT, LAMINATE, AND CURABLE COMPOUND DIC Corporation (JP) 2026-01-28 — — EP disclosed
US-20260015458-A1 POLYCARBONATE RESIN COMPOSITION MITSUBISHI CHEMICAL CORPORATION (JP) 2026-01-15 — — US disclosed
EP-4640743-A1 ELECTRONIC BOARD MATERIAL, RESIN, AND METHOD FOR PRODUCING RESIN Idemitsu Kosan Co.,Ltd. (JP) 2025-10-29 — — EP disclosed
EP-4640741-A1 ELECTRONIC SUBSTRATE MATERIAL, RESIN AND METHOD FOR PRODUCING RESIN Idemitsu Kosan Co.,Ltd. (JP) 2025-10-29 — — EP disclosed
EP-4640742-A1 ELECTRONIC SUBSTRATE MATERIAL, RESIN, AND METHOD FOR MANUFACTURING RESIN Idemitsu Kosan Co.,Ltd. (JP) 2025-10-29 — — EP disclosed
US-20250320180-A1 HYDROXYL GROUP-CONTAINING COMPOUND, CURABLE RESIN COMPOSITION, CURED PRODUCT, AND LAYERED PRODUCT DIC CORPORATION (JP) 2025-10-16 — — US disclosed
US-20250277081-A1 GLYCIDYL ETHER GROUP-CONTAINING COMPOUND, CURABLE RESIN COMPOSITION, CURED OBJECT, AND LAMINATE DIC CORPORATION (JP) 2025-09-04 — — US disclosed
EP-4585594-A1 GLYCIDYL GROUP-CONTAINING COMPOUND, CURABLE RESIN COMPOSITION, CURED PRODUCT AND MULTILAYER BODY DIC Corporation (JP) 2025-07-16 — — EP disclosed
EP-4527834-A1 GLYCIDYL ETHER GROUP-CONTAINING COMPOUND, CURABLE RESIN COMPOSITION, CURED OBJECT, AND LAMINATE DIC Corporation (JP) 2025-03-26 — — EP disclosed
EP-4130097-A1 RESIN, RESIN PRECURSOR COMPOSITION, COATING COMPOSITION, ELECTROPHOTOGRAPHIC PHOTORECEPTOR, MOLDED ARTICLE, ELECTRONIC DEVICE, AND ELECTROPHOTOGRAPHIC PHOTORECEPTOR PRODUCTION METHOD Idemitsu Kosan Co., Ltd (JP) 2023-02-08 — — EP disclosed
CN-115397886-A Resin, resin precursor composition, coating liquid composition, electrophotographic photoreceptor, molded article, electronic device, and method for producing electrophotographic photoreceptor 出光兴产株式会社 2022-11-25 — — CN disclosed
US-11366389-B2 Allyloxy derivative, resist underlayer forming composition using the same, and method of manufacturing resist underlayer and semiconductor device using the same MERCK PATENT GMBH (DE) 2022-06-21 — — US disclosed
US-20210181636-A1 ALLYLOXY DERIVATIVE, RESIST UNDERLAYER FORMING COMPOSITION USING THE SAME, AND METHOD OF MANUFACTURING RESIST UNDERLAYER AND SEMICONDUCTOR DEVICE USING THE SAME MERCK PATENT GMBH (DE) 2021-06-17 — — US disclosed
US-20150228994-A1 POLYELECTROLYTE FILM KURARAY CO., LTD. (JP) 2015-08-13 — — US disclosed
EP-2889940-A1 POLYELECTROLYTE FILM Kuraray Co., Ltd. (JP) 2015-07-01 — — EP disclosed
CN-104584297-A polymer electrolyte membrane KURARAY CO 2015-04-29 — — CN disclosed
US-8895632-B2 Anthracene derivative, compound obtained therefrom, composition, cured product, and process for producing same ASAHI ORGANIC CHEMICALS INDUSTRY CO., LTD. (JP) 2014-11-25 — — US disclosed
US-20120232240-A1 ANTHRACENE DERIVATIVE, COMPOUND OBTAINED THEREFROM, COMPOSITION,CURED PRODUCT, AND PROCESS FOR PRODUCING SAME ASAHI ORGANIC CHEMICALS INDUSTRY CO., LTD. (JP) 2012-09-13 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11366389-B2 Allyloxy derivative, resist underlayer forming composition using the same, and method of manufacturing resist underlayer and semiconductor device using the same ALKBH1, ALKBH2, OR10J3 PTPN1 2522/4885ESR1 1701/4885ESR2 1818/4885
US-20250320180-A1 HYDROXYL GROUP-CONTAINING COMPOUND, CURABLE RESIN COMPOSITION, CURED PRODUCT, AND LAYERED PRODUCT RAD51, SEM1, GFER PTPN1 4836/4885ESR1 1003/4885ESR2 996/4885
US-20210181636-A1 ALLYLOXY DERIVATIVE, RESIST UNDERLAYER FORMING COMPOSITION USING THE SAME, AND METHOD OF MANUFACTURING RESIST UNDERLAYER AND SEMICONDUCTOR DEVICE USING THE SAME ALKBH1, ALKBH2, OR10J3 PTPN1 2522/4885ESR1 1701/4885ESR2 1818/4885
US-20260015458-A1 POLYCARBONATE RESIN COMPOSITION CAD, DCTN3, DCTN1 PTPN1 4148/4885ESR1 483/4885ESR2 892/4885
US-20120232240-A1 ANTHRACENE DERIVATIVE, COMPOUND OBTAINED THEREFROM, COMPOSITION,CURED PRODUCT, AND PROCESS FOR PRODUCING SAME AHR, CYP1A1, CYP2F1 PTPN1 2951/4885ESR1 455/4885ESR2 438/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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