SCHEMBL12256166

SCHEMBL12256166

O=C(OC12CC3CC(CC(O)(C3)C1)C2)C(F)F

nearest known ligand 0.38

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
PKM P14618 1/20 0.38
ALDH1A1 P00352 2/20 0.37
LMNA P02545 1/20 0.37
HSD11B1 P28845 2/20 0.36
DPP4 P27487 7/20 0.36
L3MBTL1 Q9Y468 1/20 0.33
CYP17A1 P05093 1/20 0.33
CYP19A1 P11511 1/20 0.33
DPP8 Q6V1X1 1/20 0.32
DPP9 Q86TI2 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12705073 0.87 CYP17A1 (0.36) PKMALDH1A1LMNAHSD11B1DPP4
SCHEMBL12705353 0.85 ALDH1A1 (0.40) PKMALDH1A1LMNAHSD11B1DPP4
SCHEMBL12256169 0.85 DPP4 (0.33) DPP4
SCHEMBL14389481 0.83 CYP17A1 (0.38) PKMALDH1A1HSD11B1DPP4L3MBTL1
SCHEMBL9925262 0.83 CYP17A1 (0.38) PKMALDH1A1HSD11B1DPP4L3MBTL1
SCHEMBL14802969 0.83 ALDH1A1 (0.34) PKMALDH1A1LMNAHSD11B1DPP4
SCHEMBL12256168 0.82 CYP19A1 (0.43) ALDH1A1L3MBTL1CYP17A1CYP19A1NPSR1
SCHEMBL23417222 0.81 DPP4 (0.40) PKMALDH1A1DPP4L3MBTL1CYP17A1
SCHEMBL18469143 0.81 CYP17A1 (0.36) PKMALDH1A1HSD11B1DPP4L3MBTL1
SCHEMBL12897861 0.81 CYP17A1 (0.36) PKMALDH1A1HSD11B1DPP4L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8709704-B2 Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method FUJIFILM CORPORATION (JP) 2014-04-29 US disclosed
US-20120322007-A1 PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2012-12-20 US disclosed
US-20110229832-A1 PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT AND RINSING SOLUTION FOR USE IN THE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2011-09-22 US disclosed
US-20110091808-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-04-21 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110091808-A1 PHOTORESIST COMPOSITION ASIC1, ASIC3, SUN2 PKM 2968/4885ALDH1A1 2111/4885LMNA 3534/4885
US-20110229832-A1 PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT AND RINSING SOLUTION FOR USE IN THE PATTERN FORMING METHOD RER1, RARA, RARG PKM 4533/4885ALDH1A1 1783/4885LMNA 3661/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.