Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2A6 | P11509 | 5/20 | 0.60 |
| ▸ | CYP1A2 | P05177 | 4/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.50 |
| ▸ | TSHR | P16473 | 2/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.48 |
| ▸ | HPRT1 | P00492 | 1/20 | 0.46 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.42 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 3/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | APEX1 | P27695 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2199292 | 0.80 | CYP2A6 (0.43) | CYP2A6CYP1A2ALDH1A1HSD17B10TSHR | |
| SCHEMBL5673224 | 0.75 | CYP2A6 (0.65) | CYP2A6CYP1A2ALDH1A1HSD17B10TSHR | |
| 1,2-Naphthoquinone SCHEMBL2146624 | 0.75 | ALDH1A1 (0.55) | CYP2A6CYP1A2ALDH1A1HSD17B10TSHR | |
| SCHEMBL449348 | 0.75 | CYP2A6 (1.00) | CYP2A6CYP1A2ALDH1A1HSD17B10TSHR | |
| SCHEMBL7478320 | 0.74 | CYP2A6 (0.58) | CYP2A6CYP1A2ALDH1A1HSD17B10TSHR | |
| Ammonia Solution, Strong SCHEMBL11476794 | 0.73 | CYP2A6 (0.95) | CYP2A6CYP1A2ALDH1A1HSD17B10TSHR | |
| SCHEMBL5610395 | 0.73 | CYP2A6 (0.45) | CYP2A6CYP1A2ALDH1A1HSD17B10TSHR | |
| SCHEMBL7483792 | 0.71 | CYP2A6 (0.60) | CYP2A6CYP1A2ALDH1A1HSD17B10TSHR | |
| SCHEMBL1402510 | 0.71 | TSHR (0.60) | CYP2A6CYP1A2ALDH1A1HSD17B10TSHR | |
| SCHEMBL4630201 | 0.71 | ALDH1A1 (0.52) | CYP2A6CYP1A2ALDH1A1HSD17B10TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 142 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10745372-B2 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-08-18 | — | — | US | claimed |
| US-4246172-A | FOR DYEING TEXTILES SUCH AS POLYACRYLONITRILE, AND ACID MODIFIED POLYESTERS AND POLYAMIDES | BAYER AKTIENGESELLSCHAFT (DE) | 1981-01-20 | — | — | US | claimed |
| US-4039539-A | 1,2,4-Triazole-azo-aniline cationic dyestuffs | BAYER AKTIENGESELLSCHAFT (DT) | 1977-08-02 | — | — | US | claimed |
| EP-2123695-B1 | METAL THIETANE COMPOUND, POLYMERIZABLE COMPOSITION COMPRISING THE COMPOUND, RESIN, AND USE OF THE RESIN | MITSUI CHEMICALS INC (JP) | 2021-06-23 | — | — | EP | disclosed |
| EP-2841429-B1 | TETRAZOLINONE COMPOUNDS AND ITS USE AS PESTICIDES | SUMITOMO CHEMICAL CO (JP) | 2020-10-21 | — | — | EP | disclosed |
| US-10745372-B2 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-08-18 | — | — | US | disclosed |
| US-10451967-B2 | Acid- and radical-generating agent and method for generating acid and radical | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-22 | — | — | US | disclosed |
| US-20180029968-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND PURIFICATION METHOD OF COMPOUND OR RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-02-01 | — | — | US | disclosed |
| EP-3257835-A1 | COMPOUND, RESIN, LITHOGRAPHY UNDERLAYER FILM FORMING MATERIAL, LITHOGRAPHY UNDERLAYER FILM FORMING COMPOSITION, LITHOGRAPHY UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, METHOD FOR FORMING CIRCUIT PATTERN, AND METHOD FOR PURIFYING COMPOUND OR RESIN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2017-12-20 | — | — | EP | disclosed |
| US-20170349564-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND PURIFICATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-12-07 | — | — | US | disclosed |
| EP-3239141-A1 | COMPOUND, RESIN, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD AND PURIFICATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2017-11-01 | — | — | EP | disclosed |
| EP-0520146-A1 | Process for preparing a thermoplastic resin composition | MITSUBISHI CHEMICAL CORPORATION (JP) | 1992-12-30 | — | — | EP | disclosed |
| US-5159008-A | High viscosity polyphenylene ether, low viscosity polyphenylen ether, polyamide unsaturated polar compound, and mineral filles and-or glass fibers | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1992-10-27 | — | — | US | disclosed |
| US-5091473-A | Polyamide, polyphenylene ether, block polymer, unsaturated acid or anhydride dispension, hydrogenated impact strength, rigidity, heat resistance | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1992-02-25 | — | — | US | disclosed |
| EP-0454156-A2 | Thermoplastic resin composition | MITSUBISHI CHEMICAL CORPORATION (JP) | 1991-10-30 | — | — | EP | disclosed |
| US-5026787-A | Blends of polyphenylene ether, polyamides, unsaturated compounds | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1991-06-25 | — | — | US | disclosed |
| US-5001181-A | polyamide blends with dispersed particles of polyphenylene ether which contain dispersed filler particles; strength, flexibility, solvent resistance | MITSUBISHI PETROCHEMICAL COMPANY, LTD. (JP) | 1991-03-19 | — | — | US | disclosed |
| EP-0381056-A2 | Impact resistant thermoplastic resin composition | MITSUBISHI CHEMICAL CORPORATION (JP) | 1990-08-08 | — | — | EP | disclosed |
| EP-0357065-A2 | Resin composition | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1990-03-07 | — | — | EP | disclosed |
| US-4701565-A | REACTING ALCOHOL WITH ORGANIC SULFONYL HALIDE TO FORM SULFONATE, REACTING SULFONATE WITH A PHENOL | FUJI PHOTO FILM CO., LTD. (JP) | 1987-10-20 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10451967-B2 | Acid- and radical-generating agent and method for generating acid and radical | CBR1, HAO2, CBR3 | CYP2A6 375/4885CYP1A2 360/4885ALDH1A1 151/4885 |
| US-20170349564-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND PURIFICATION METHOD | ASH2L, MLLT1, FRG1 | CYP2A6 1906/4885CYP1A2 1815/4885ALDH1A1 1912/4885 |
| US-20180029968-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND PURIFICATION METHOD OF COMPOUND OR RESIN | PRMT9, ARGLU1, MLLT1 | CYP2A6 2371/4885CYP1A2 1768/4885ALDH1A1 1309/4885 |
| US-10745372-B2 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method | ASH2L, MLLT1, FRG1 | CYP2A6 1906/4885CYP1A2 1815/4885ALDH1A1 1912/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.