Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSPA5 | P11021 | 1/20 | 0.59 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.56 |
| ▸ | TSHR | P16473 | 1/20 | 0.56 |
| ▸ | GPR35 | Q9HC97 | 2/20 | 0.52 |
| ▸ | SNCA | P37840 | 1/20 | 0.52 |
| ▸ | HPGD | P15428 | 1/20 | 0.51 |
| ▸ | AR | P10275 | 1/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.46 |
| ▸ | CTSB | P07858 | 1/20 | 0.46 |
| ▸ | NPC1 | O15118 | 2/20 | 0.44 |
| ▸ | RAB9A | P51151 | 2/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.44 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.44 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.44 |
| ▸ | KCNMA1 | Q12791 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL301933 | 0.88 | ALDH1A1 (0.69) | ALDH1A1TSHRGPR35HPGDAR | |
| SCHEMBL20817208 | 0.88 | GPR35 (0.53) | HSPA5ALDH1A1TSHRGPR35SNCA | |
| SCHEMBL28181536 | 0.87 | ALDH1A1 (0.58) | HSPA5ALDH1A1TSHRGPR35HPGD | |
| Ammonia Solution, Strong SCHEMBL10338964 | 0.86 | ALDH1A1 (0.67) | ALDH1A1TSHRGPR35HPGDAR | |
| SCHEMBL20817180 | 0.86 | ALDH1A1 (0.53) | ALDH1A1TSHRGPR35SNCAHPGD | |
| SCHEMBL27279753 | 0.81 | ALDH1A1 (0.52) | HSPA5ALDH1A1TSHRGPR35SNCA | |
| SCHEMBL4993310 | 0.80 | SNCA (0.47) | HSPA5ALDH1A1TSHRGPR35SNCA | |
| SCHEMBL8141750 | 0.80 | CASP6 (0.50) | ALDH1A1TSHRGPR35SNCAHPGD | |
| SCHEMBL1246299 | 0.79 | KEAP1 (0.55) | ALDH1A1TSHRGPR35SNCAHPGD | |
| SCHEMBL4692660 | 0.78 | ALDH1A1 (0.56) | ALDH1A1TSHRHPGDARL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240329525-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-10-03 | — | — | US | disclosed |
| US-20240210827-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-06-27 | — | — | US | disclosed |
| CN-113820920-B | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2023-07-04 | — | — | CN | disclosed |
| CN-109153841-B | Resin composition | 东丽株式会社 | 2021-12-31 | — | — | CN | disclosed |
| CN-113820920-A | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2021-12-21 | — | — | CN | disclosed |
| CN-107850844-B | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2021-09-07 | — | — | CN | disclosed |
| US-10990008-B2 | Resin composition | TORAY INDUSTRIES, INC. (JP) | 2021-04-27 | — | — | US | disclosed |
| US-20200409263-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2020-12-31 | — | — | US | disclosed |
| US-10831101-B2 | Photosensitive resin composition, method for manufacturing cured relief pattern, and semiconductor apparatus | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2020-11-10 | — | — | US | disclosed |
| EP-2824695-B1 | PATTERN FORMING METHOD | FUJIFILM CORP (JP) | 2019-09-11 | — | — | EP | disclosed |
| US-20050266352-A1 | Forming a region in which a graft polymer, that directly bonds to a surface of a base material that includes a polyimide is generated in a pattern shape; imparting electroless plating catalyst or a precursor thereof and electroless plating so as to form a metallic film in the pattern shape | FUJI PHOTO FILM CO., LTD. | 2005-12-01 | — | — | US | disclosed |
| US-20050214693-A1 | Pattern forming method, graft pattern material, conductive pattern forming method and conductive pattern material | FUJI PHOTO FILM CO., LTD. | 2005-09-29 | — | — | US | disclosed |
| EP-1580595-A2 | Pattern forming method, graft pattern material, conductive pattern forming method and conductive pattern material | FUJI PHOTO FILM CO., LTD. (JP) | 2005-09-28 | — | — | EP | disclosed |
| WO-2005053368-A1 | METAL PATTERN FORMING METHOD, METAL PATTERN OBTAINED BY THE SAME, PRINTED WIRING BOARD, CONDUCTIVE FILM FORMING METHOD, AND CONDUCTIVE FILM OBTAINED BY THE SAME | FUJI PHOTO FILM CO., LTD. (JP) | 2005-06-09 | — | — | WO | disclosed |
| US-20050064108-A1 | Method of forming metal fine particle pattern and method of forming electroconductive pattern | FUJI PHOTO FILM CO., LTD. | 2005-03-24 | — | — | US | disclosed |
| EP-1508453-A2 | Method of forming metal fine particle pattern and method of forming electroconductive pattern | Fuji Photo Film Co., Ltd. (JP) | 2005-02-23 | — | — | EP | disclosed |
| EP-1475230-A2 | Image forming methods, pattern forming methods, pattern forming material and planographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2004-11-10 | — | — | EP | disclosed |
| US-20040209203-A1 | Pattern forming method, image forming method, fine particle adsorption pattern forming method, conductive pattern forming method, pattern forming material and planographic printing plate | FUJI PHOTO FILM CO., LTD. | 2004-10-21 | — | — | US | disclosed |
| US-20040067434-A1 | First forming a polymerization initiating layer, which is immobilized on a PET support by a crosslinking reaction, then bonding an acrylate monomer by irradiating; making a printing plate with pattern, photolithography | FUJI PHOTO FILM CO., LTD. | 2004-04-08 | — | — | US | disclosed |
| EP-1400544-A1 | A method of graft polymerization and variety of materials utilizing the same as well as producing method thereof | FUJI PHOTO FILM CO., LTD. (JP) | 2004-03-24 | — | — | EP | disclosed |