Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.32 |
| ▸ | PDE4A | P27815 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2050017 | 0.82 | — | — | |
| SCHEMBL3493347 | 0.80 | LMNA (0.59) | LMNAL3MBTL1TDP1ALDH1A1KDM4E | |
| SCHEMBL75409 | 0.79 | LMNA (0.47) | LMNAL3MBTL1TDP1ALDH1A1KDM4E | |
| SCHEMBL6310074 | 0.73 | — | — | |
| SCHEMBL15635306 | 0.73 | — | — | |
| SCHEMBL2050718 | 0.73 | — | — | |
| SCHEMBL8581852 | 0.73 | — | — | |
| E968 SCHEMBL121807 | 0.71 | — | — | |
| E968 SCHEMBL10427336 | 0.71 | — | — | |
| E968 SCHEMBL2723809 | 0.71 | LMNA (0.67) | LMNAL3MBTL1TDP1ALDH1A1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12588450-B2 | Post-CMP cleaning liquid comprising a substituted benzene anticorrosive agent, chelant, and amine compound | FUJIFILM CORPORATION (JP) | 2026-03-24 | — | — | US | disclosed |
| US-20250377594-A1 | RESIST COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2025-12-11 | — | — | US | disclosed |
| US-12480072-B2 | Cleaning fluid and cleaning method | FUJIFILM CORPORATION (JP) | 2025-11-25 | — | — | US | disclosed |
| US-20250321482-A1 | RESIST COMPOSITION, DRY FILM RESIST, METHOD FOR PRODUCING DRY FILM RESIST, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PLATED OBJECT | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2025-10-16 | — | — | US | disclosed |
| US-20250278022-A1 | COMPOUND, POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-09-04 | — | — | US | disclosed |
| US-20250231484-A1 | RESIST COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2025-07-17 | — | — | US | disclosed |
| US-12264275-B2 | Treatment liquid | FUJIFILM CORPORATION (JP) | 2025-04-01 | — | — | US | disclosed |
| US-12247300-B2 | Cleaning solution and cleaning method | FUJIFILM CORPORATION (JP) | 2025-03-11 | — | — | US | disclosed |
| US-20250019623-A1 | CLEANING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | FUJIFILM CORPORATION (JP) | 2025-01-16 | — | — | US | disclosed |
| US-20250019836-A1 | TREATMENT LIQUID, TREATMENT METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2025-01-16 | — | — | US | disclosed |
| US-20070243494-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | YOKOI SHIGERU | 2007-10-18 | — | — | US | disclosed |
| EP-1818722-A1 | CHEMICAL AMPLIFICATION PHOTORESIST COMPOSITION, PHOTORESIST LAYER LAMINATE, METHOD FOR PRODUCING PHOTORESIST COMPOSITION, METHOD FOR PRODUCING PHOTORESIST PATTERN AND METHOD FOR PRODUCING CONNECTING TERMINAL | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-08-15 | — | — | EP | disclosed |
| US-20070134185-A1 | Use of dithiols in a hair-perming composition | L'OREAL S.A. (FR) | 2007-06-14 | — | — | US | disclosed |
| US-20070003859-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | YOKOI SHIGERU | 2007-01-04 | — | — | US | disclosed |
| EP-1680077-A2 | USE OF DITHIOLS IN A HAIR-PERMING COMPOSITION | L'OREAL (FR) | 2006-07-19 | — | — | EP | disclosed |
| US-20060035176-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | YOKOI SHIGERU | 2006-02-16 | — | — | US | disclosed |
| US-20050002886-A1 | Dithiols comprising at least one amide functional group and their use in transforming the shape of the hair | L'OREAL S.A. (FR) | 2005-01-06 | — | — | US | disclosed |
| WO-2004098488-A2 | USE OF DITHIOLS IN A HAIR-PERMING COMPOSITION | L'OREAL (FR) | 2004-11-18 | — | — | WO | disclosed |
| EP-1475076-A1 | Amidic dithiols and their use in changing the hair form | L'OREAL (FR) | 2004-11-10 | — | — | EP | disclosed |
| US-20030099908-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-05-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070134185-A1 | Use of dithiols in a hair-perming composition | DSG1, DSC1, DUS2 | LMNA 2739/4885L3MBTL1 3362/4885TDP1 1080/4885 |
| US-20250278022-A1 | COMPOUND, POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | ABCC1, SLC11A2, RER1 | LMNA 2700/4885L3MBTL1 4362/4885TDP1 3763/4885 |
| US-20050002886-A1 | Dithiols comprising at least one amide functional group and their use in transforming the shape of the hair | TST, KRT18, DLAT | LMNA 4162/4885L3MBTL1 3494/4885TDP1 1486/4885 |
| US-12588450-B2 | Post-CMP cleaning liquid comprising a substituted benzene anticorrosive agent, chelant, and amine compound | SSRP1, H1-5, AOC1 | LMNA 1164/4885L3MBTL1 3972/4885TDP1 740/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.