SCHEMBL1270652

SCHEMBL1270652

c1ccc(C([SiH2]C[SiH2]C(c2ccccc2)c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.42

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 3/20 0.42
HTR2A P28223 2/20 0.42
DPP4 P27487 2/20 0.39
TSHR P16473 2/20 0.39
F2 P00734 1/20 0.39
HRH1 P35367 2/20 0.39
MTOR P42345 1/20 0.39
RAB9A P51151 1/20 0.39
GRM7 Q14831 1/20 0.39
LMNA P02545 1/20 0.37
CYP3A4 P08684 1/20 0.37
ALOX15 P16050 1/20 0.37
KDM4E B2RXH2 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
CYP2D6 P10635 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2118480 0.79 TAAR1 (0.39) TAAR1HTR2ADPP4TSHRF2
SCHEMBL9339406 0.79 TAAR1 (0.50) TAAR1HTR2ADPP4TSHRF2
SCHEMBL1645203 0.79 TSHR (0.42) TAAR1HTR2ADPP4TSHRF2
SCHEMBL7935090 0.79 LMNA (0.39) TAAR1HTR2ADPP4TSHRF2
SCHEMBL3454935 0.75 TRPA1 (0.38) TAAR1HTR2AHRH1MTORRAB9A
SCHEMBL14954674 0.74 CYP2C19 (0.41) TAAR1HTR2ATSHRHRH1MTOR
SCHEMBL8470916 0.74 SRC (0.43) LMNAL3MBTL1CYP2D6
SCHEMBL4774509 0.73 DPP4 (0.45) TAAR1HTR2ADPP4TSHRF2
SCHEMBL4194601 0.72 HDAC3 (0.35) TAAR1HTR2ADPP4HRH1MTOR
SCHEMBL4660217 0.72 ALDH1A1 (0.40) TAAR1HTR2AHRH1LMNAKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110042789-A1 MATERIAL FOR CHEMICAL VAPOR DEPOSITION, SILICON-CONTAINING INSULATING FILM AND METHOD FOR PRODUCTION OF THE SILICON-CONTAINING INSULATING FILM JSR CORPORATION (JP) 2011-02-24 US disclosed
EP-2264219-A1 MATERIAL FOR CHEMICAL VAPOR DEPOSITION, SILICON-CONTAINING INSULATING FILM AND PROCESS FOR PRODUCTION THEREOF JSR Corporation (JP) 2010-12-22 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110042789-A1 MATERIAL FOR CHEMICAL VAPOR DEPOSITION, SILICON-CONTAINING INSULATING FILM AND METHOD FOR PRODUCTION OF THE SILICON-CONTAINING INSULATING FILM SAT1, SUV39H2, SUV39H1 TAAR1 588/4885HTR2A 4069/4885DPP4 4444/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.