Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
| ▸ | CA4 | P22748 | 1/20 | 0.30 |
| ▸ | CA7 | P43166 | 1/20 | 0.30 |
| ▸ | CA9 | Q16790 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5835317 | 0.98 | CA1 (0.31) | CA1CA2CA4CA7CA9 | |
| SCHEMBL1270905 | 0.81 | CA1 (0.32) | CA1CA2CA4CA7CA9 | |
| SCHEMBL31697972 | 0.72 | ALDH1A1 (0.35) | — | |
| SCHEMBL14295114 | 0.72 | ALDH1A1 (0.35) | — | |
| SCHEMBL6113148 | 0.71 | LMNA (0.42) | — | |
| SCHEMBL10993958 | 0.71 | — | — | |
| SCHEMBL27658493 | 0.71 | SLC22A6 (0.42) | CA1CA2CA9 | |
| SCHEMBL890790 | 0.71 | LMNA (0.53) | — | |
| SCHEMBL9013820 | 0.69 | TDP1 (0.45) | CA1CA2CA4CA7CA9 | |
| SCHEMBL743651 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12588450-B2 | Post-CMP cleaning liquid comprising a substituted benzene anticorrosive agent, chelant, and amine compound | FUJIFILM CORPORATION (JP) | 2026-03-24 | — | — | US | disclosed |
| US-12480072-B2 | Cleaning fluid and cleaning method | FUJIFILM CORPORATION (JP) | 2025-11-25 | — | — | US | disclosed |
| US-20250278022-A1 | COMPOUND, POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-09-04 | — | — | US | disclosed |
| US-12374540-B2 | Post-CMP semiconductor cleaning composition comprising an amine/alkanolamine mixture | FUJIFILM CORPORATION (JP) | 2025-07-29 | — | — | US | disclosed |
| US-12264275-B2 | Treatment liquid | FUJIFILM CORPORATION (JP) | 2025-04-01 | — | — | US | disclosed |
| US-12247300-B2 | Cleaning solution and cleaning method | FUJIFILM CORPORATION (JP) | 2025-03-11 | — | — | US | disclosed |
| US-20250019836-A1 | TREATMENT LIQUID, TREATMENT METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2025-01-16 | — | — | US | disclosed |
| US-20250019623-A1 | CLEANING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | FUJIFILM CORPORATION (JP) | 2025-01-16 | — | — | US | disclosed |
| US-12187984-B2 | Treatment liquid and method for treating object to be treated | FUJIFILM CORPORATION (JP) | 2025-01-07 | — | — | US | disclosed |
| US-12164229-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-12-10 | — | — | US | disclosed |
| EP-2202579-A2 | Chemically amplified photoresist composition, photoresist laminated product, manufacturing method for photoresist composition, manufacturing method for photoresist pattern, and manufacturing method for connection element | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2010-06-30 | — | — | EP | disclosed |
| US-20100112495-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | YOKOI SHIGERU | 2010-05-06 | — | — | US | disclosed |
| US-20080241758-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | YOKOI SHIGERU | 2008-10-02 | — | — | US | disclosed |
| US-20070275320-A1 | Chemically Amplified Photorestist Composition, Laminated Product, and Connection Element | HITACHI CONSTRUCTION MACHINERY CO., LTD. (JP) | 2007-11-29 | — | — | US | disclosed |
| US-20070243494-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | YOKOI SHIGERU | 2007-10-18 | — | — | US | disclosed |
| EP-1818722-A1 | CHEMICAL AMPLIFICATION PHOTORESIST COMPOSITION, PHOTORESIST LAYER LAMINATE, METHOD FOR PRODUCING PHOTORESIST COMPOSITION, METHOD FOR PRODUCING PHOTORESIST PATTERN AND METHOD FOR PRODUCING CONNECTING TERMINAL | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-08-15 | — | — | EP | disclosed |
| US-20070003859-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | YOKOI SHIGERU | 2007-01-04 | — | — | US | disclosed |
| US-20060035176-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | YOKOI SHIGERU | 2006-02-16 | — | — | US | disclosed |
| US-20050106492-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | YOKOI SHIGERU (JP) | 2005-05-19 | — | — | US | disclosed |
| US-20030099908-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-05-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12164229-B2 | Resist composition and method for producing resist pattern | HACL2, ACAD10, HSD17B10 | CA1 3854/4885CA2 3794/4885CA4 2709/4885 |
| US-20250278022-A1 | COMPOUND, POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | ABCC1, SLC11A2, RER1 | CA1 4470/4885CA2 4680/4885CA4 3520/4885 |
| US-12588450-B2 | Post-CMP cleaning liquid comprising a substituted benzene anticorrosive agent, chelant, and amine compound | SSRP1, H1-5, AOC1 | CA1 446/4885CA2 1217/4885CA4 1542/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.