Known targets — ChEMBL curated mechanism
ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 known ✓ | P00915 | 1/20 | 0.32 |
| ▸ | CA2 known ✓ | P00918 | 1/20 | 0.32 |
| ▸ | CA4 known ✓ | P22748 | 1/20 | 0.32 |
| ▸ | CA7 | P43166 | 1/20 | 0.32 |
| ▸ | CA9 | Q16790 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | TP53 | P04637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5835317 | 0.82 | CA1 (0.31) | CA1CA2CA4CA7CA9 | |
| SCHEMBL1270907 | 0.81 | CA1 (0.30) | CA1CA2CA4CA7CA9 | |
| SCHEMBL28533349 | 0.75 | TP53 (0.42) | ALDH1A1TP53 | |
| SCHEMBL26976755 | 0.72 | ALDH1A1 (0.47) | ALDH1A1LMNATP53 | |
| SCHEMBL1308988 | 0.72 | ALDH1A1 (0.47) | ALDH1A1LMNATP53 | |
| SCHEMBL14295114 | 0.71 | ALDH1A1 (0.35) | ALDH1A1LMNA | |
| SCHEMBL31697972 | 0.71 | ALDH1A1 (0.35) | ALDH1A1LMNA | |
| SCHEMBL10711382 | 0.70 | KDM4E (0.35) | CA1CA2CA9ALDH1A1LMNA | |
| Glycerin SCHEMBL1712541 | 0.70 | TP53 (0.58) | ALDH1A1LMNATP53 | |
| Glycerin SCHEMBL1712543 | 0.70 | TP53 (0.58) | ALDH1A1LMNATP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12588450-B2 | Post-CMP cleaning liquid comprising a substituted benzene anticorrosive agent, chelant, and amine compound | FUJIFILM CORPORATION (JP) | 2026-03-24 | — | — | US | disclosed |
| US-12480072-B2 | Cleaning fluid and cleaning method | FUJIFILM CORPORATION (JP) | 2025-11-25 | — | — | US | disclosed |
| US-20250278022-A1 | COMPOUND, POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-09-04 | — | — | US | disclosed |
| US-12374540-B2 | Post-CMP semiconductor cleaning composition comprising an amine/alkanolamine mixture | FUJIFILM CORPORATION (JP) | 2025-07-29 | — | — | US | disclosed |
| CN-112198220-B | Gas sensor and method of sensing a gas phase analyte | 杜邦电子材料国际有限责任公司 | 2025-05-09 | — | — | CN | disclosed |
| US-12264275-B2 | Treatment liquid | FUJIFILM CORPORATION (JP) | 2025-04-01 | — | — | US | disclosed |
| US-12247300-B2 | Cleaning solution and cleaning method | FUJIFILM CORPORATION (JP) | 2025-03-11 | — | — | US | disclosed |
| US-20250019836-A1 | TREATMENT LIQUID, TREATMENT METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2025-01-16 | — | — | US | disclosed |
| US-20250019623-A1 | CLEANING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | FUJIFILM CORPORATION (JP) | 2025-01-16 | — | — | US | disclosed |
| US-12187984-B2 | Treatment liquid and method for treating object to be treated | FUJIFILM CORPORATION (JP) | 2025-01-07 | — | — | US | disclosed |
| EP-2202579-A2 | Chemically amplified photoresist composition, photoresist laminated product, manufacturing method for photoresist composition, manufacturing method for photoresist pattern, and manufacturing method for connection element | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2010-06-30 | — | — | EP | disclosed |
| US-20100112495-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | YOKOI SHIGERU | 2010-05-06 | — | — | US | disclosed |
| US-20080241758-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | YOKOI SHIGERU | 2008-10-02 | — | — | US | disclosed |
| US-20070275320-A1 | Chemically Amplified Photorestist Composition, Laminated Product, and Connection Element | HITACHI CONSTRUCTION MACHINERY CO., LTD. (JP) | 2007-11-29 | — | — | US | disclosed |
| US-20070243494-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | YOKOI SHIGERU | 2007-10-18 | — | — | US | disclosed |
| EP-1818722-A1 | CHEMICAL AMPLIFICATION PHOTORESIST COMPOSITION, PHOTORESIST LAYER LAMINATE, METHOD FOR PRODUCING PHOTORESIST COMPOSITION, METHOD FOR PRODUCING PHOTORESIST PATTERN AND METHOD FOR PRODUCING CONNECTING TERMINAL | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-08-15 | — | — | EP | disclosed |
| US-20070003859-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | YOKOI SHIGERU | 2007-01-04 | — | — | US | disclosed |
| US-20060035176-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | YOKOI SHIGERU | 2006-02-16 | — | — | US | disclosed |
| US-20050106492-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | YOKOI SHIGERU (JP) | 2005-05-19 | — | — | US | disclosed |
| US-20030099908-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-05-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250278022-A1 | COMPOUND, POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | ABCC1, SLC11A2, RER1 | CA1 4470/4885CA2 4680/4885CA4 3520/4885 |
| US-12588450-B2 | Post-CMP cleaning liquid comprising a substituted benzene anticorrosive agent, chelant, and amine compound | SSRP1, H1-5, AOC1 | CA1 446/4885CA2 1217/4885CA4 1542/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.