SCHEMBL12840948

SCHEMBL12840948

CCOC(=O)C(F)(C(F)(F)F)S(=O)(=O)O

nearest known ligand 0.38

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 1/20 0.38
CYP4A11 Q02928 1/20 0.38
KMT2A Q03164 3/20 0.38
HTT P42858 2/20 0.38
MEN1 O00255 2/20 0.38
TSHR P16473 2/20 0.38
NPSR1 Q6W5P4 2/20 0.37
POLB P06746 1/20 0.37
MAPT P10636 4/20 0.36
HIF1A Q16665 1/20 0.36
LMNA P02545 2/20 0.36
ALDH1A1 P00352 3/20 0.36
PKM P14618 3/20 0.35
KDM4E B2RXH2 1/20 0.35
MAPK1 P28482 1/20 0.35
HSD17B10 Q99714 1/20 0.34
THRB P10828 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12840941 0.89 SMN1; SMN2 (0.38) CYP4F2CYP4A11KMT2AHTTMEN1
SCHEMBL10134638 0.88 GAA (0.36) KMT2AHTTMEN1TSHRNPSR1
SCHEMBL2610388 0.79 ALDH1A1 (0.44) CYP4F2CYP4A11KMT2AHTTMEN1
SCHEMBL4360016 0.79 NAAA (0.44) TSHRNPSR1
SCHEMBL13131180 0.79
SCHEMBL14437402 0.78 TSHR (0.32) TSHRALDH1A1
SCHEMBL10134610 0.78 CA12 (0.32) TSHR
SCHEMBL15858345 0.78 CYP4F2 (0.39) CYP4F2CYP4A11KMT2AHTTMEN1
SCHEMBL2110889 0.78 ALDH1A1 (0.43) CYP4F2CYP4A11KMT2AHTTMEN1
SCHEMBL21135744 0.77 CYP4F2 (0.40) CYP4F2CYP4A11KMT2AHTTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8900790-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-12-02 US disclosed
US-8278023-B2 Salt and photoresist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-10-02 US disclosed
US-20110065040-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20100304292-A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME SUMITOMO CHEMICAL COMMPANY, LIMITED (JP) 2010-12-02 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110065040-A1 PHOTORESIST COMPOSITION C1R, P4HA1, C1S CYP4F2 1724/4885CYP4A11 344/4885KMT2A 807/4885
US-20100304292-A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME CRY1, CHRM1, C1S CYP4F2 1303/4885CYP4A11 73/4885KMT2A 2408/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.