SCHEMBL12867787

SCHEMBL12867787

C=C(C)C(=O)OC1(C23CC4CC(CC(C4)C2)C3)CCCC1

nearest known ligand 0.35

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
SCN1A P35498 1/20 0.32
SCN2A Q99250 1/20 0.32
SCN3A Q9NY46 1/20 0.32
ITGB1 P05556 1/20 0.30
ITGA4 P13612 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12809041 0.86 ALDH1A1 (0.31) ALDH1A1
SCHEMBL12857269 0.84 ALDH1A1 (0.34) ALDH1A1
SCHEMBL12857270 0.82 ALDH1A1 (0.32) ALDH1A1
SCHEMBL17056241 0.81
SCHEMBL12808951 0.80
SCHEMBL12808871 0.80
SCHEMBL7922183 0.79 ALDH1A1 (0.41) ALDH1A1
SCHEMBL14665523 0.77 CNR2 (0.38)
SCHEMBL45476 0.75 NAAA (0.40) ALDH1A1SCN1ASCN2ASCN3A
SCHEMBL12857195 0.75 ALDH1A1 (0.34) ALDH1A1L3MBTL1SCN1ASCN2ASCN3A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119798526-A Photoresist precursor composition, related product and photoresist pattern forming method 上海彤程电子材料有限公司 2025-04-11 CN claimed
CN-119798526-A Photoresist precursor composition, related product and photoresist pattern forming method 上海彤程电子材料有限公司 2025-04-11 CN disclosed
US-10719014-B2 Photoresists comprising amide component ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2020-07-21 US disclosed
EP-2293143-B1 Novel photoresist compositions ROHM & HAAS ELECT MAT (US) 2015-09-02 EP disclosed
US-20140120469-A1 THERMAL ACID GENERATORS FOR USE IN PHOTORESIST ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-05-01 US disclosed
US-20110039206-A1 NOVEL RESINS AND PHOTORESIST COMPOSITIONS COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-02-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10719014-B2 Photoresists comprising amide component ASPH, ALAD, SUN2 ALDH1A1 823/4885L3MBTL1 4187/4885SCN1A 4520/4885
US-20110039206-A1 NOVEL RESINS AND PHOTORESIST COMPOSITIONS COMPRISING SAME PUF60, CAD, RARA ALDH1A1 2478/4885L3MBTL1 3701/4885SCN1A 4633/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.