SCHEMBL13027225

SCHEMBL13027225

CO[Si](Cc1c(C)ccc(C)c1C)(OC)OC

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
▸ CYP1A2 P05177 1/20 0.31
▸ CYP2A6 P11509 1/20 0.31
▸ TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13027238 0.84 TSHR (0.33) TSHR
SCHEMBL13027242 0.84 MAPT (0.33) TSHR
SCHEMBL13027226 0.80 TAAR1 (0.36) CYP1A2CYP2A6TSHR
SCHEMBL13027245 0.79 ADRA2A (0.31) —
SCHEMBL13027297 0.79 MEN1 (0.31) —
SCHEMBL13027381 0.79 NOS2 (0.32) —
SCHEMBL13027223 0.77 ALDH1A1 (0.31) —
SCHEMBL13027249 0.72 ALDH1A1 (0.32) —
SCHEMBL13027251 0.72 CA12 (0.38) CYP1A2
SCHEMBL13027268 0.71 PDCD1 (0.34) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8697330-B2 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-15 — — US disclosed
US-20100285407-A1 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-11 — — US disclosed
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