Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PDCD1LG2 | Q9BQ51 | 2/20 | 0.31 |
| ▸ | CD274 | Q9NZQ7 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13027423 | 0.85 | AOC3 (0.33) | MEN1ALDH1A1KMT2A | |
| SCHEMBL13027409 | 0.85 | AGXT (0.33) | PDCD1LG2CD274ALDH1A1 | |
| SCHEMBL15672396 | 0.83 | MEN1 (0.46) | MEN1ALDH1A1TSHRKMT2A | |
| SCHEMBL13027395 | 0.83 | P2RX7 (0.37) | PDCD1LG2CD274MEN1ALDH1A1TSHR | |
| SCHEMBL13027381 | 0.82 | NOS2 (0.32) | — | |
| SCHEMBL15672347 | 0.81 | — | — | |
| SCHEMBL13027223 | 0.80 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL13027476 | 0.79 | AOC3 (0.37) | ALDH1A1 | |
| SCHEMBL13027519 | 0.79 | — | — | |
| SCHEMBL13027426 | 0.78 | KDM4E (0.32) | MEN1ALDH1A1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8697330-B2 | Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-04-15 | — | — | US | disclosed |
| US-20100285407-A1 | Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-11 | — | — | US | disclosed |