Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | MAPT | P10636 | 3/20 | 0.32 |
| ▸ | ACHE | P22303 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 2/20 | 0.31 |
| ▸ | POLB | P06746 | 2/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.30 |
| ▸ | ATM | Q13315 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | PKM | P14618 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15672394 | 0.89 | KMT2A (0.33) | KDM4EALDH1A1MAPTACHEMEN1 | |
| SCHEMBL13027381 | 0.87 | NOS2 (0.32) | POLB | |
| SCHEMBL15672383 | 0.87 | KDM4E (0.30) | KDM4EALDH1A1 | |
| SCHEMBL13027405 | 0.86 | ALDH1A1 (0.32) | KDM4EALDH1A1MAPTACHEMEN1 | |
| SCHEMBL13027536 | 0.84 | — | — | |
| SCHEMBL15672392 | 0.84 | ALDH1A1 (0.33) | KDM4EALDH1A1MAPTACHEMEN1 | |
| SCHEMBL13027242 | 0.84 | MAPT (0.33) | KDM4EALDH1A1MAPTACHEMEN1 | |
| SCHEMBL13027428 | 0.79 | CA12 (0.37) | KDM4EALDH1A1MAPTPOLBLMNA | |
| SCHEMBL13027382 | 0.78 | PDCD1LG2 (0.31) | ALDH1A1MEN1KMT2A | |
| SCHEMBL13027454 | 0.78 | AOC3 (0.38) | KDM4EALDH1A1MAPTSMN1; SMN2SLC6A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8697330-B2 | Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-04-15 | — | — | US | disclosed |
| US-20100285407-A1 | Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-11 | — | — | US | disclosed |