SCHEMBL13027381

SCHEMBL13027381

CO[Si](CCc1c(C)ccc(C)c1C)(OC)OC

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
▸ NOS2 P35228 1/20 0.32
▸ POLB P06746 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13027426 0.87 KDM4E (0.32) POLB
SCHEMBL13027405 0.87 ALDH1A1 (0.32) POLB
SCHEMBL13027413 0.82 — —
SCHEMBL13027382 0.82 PDCD1LG2 (0.31) —
SCHEMBL13027385 0.82 TAAR1 (0.34) —
SCHEMBL15672346 0.81 NOS2 (0.33) NOS2
SCHEMBL13027423 0.79 AOC3 (0.33) POLB
SCHEMBL13027225 0.79 CYP1A2 (0.31) —
SCHEMBL13027492 0.78 — —
SCHEMBL13027395 0.77 P2RX7 (0.37) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8697330-B2 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-15 — — US disclosed
US-20100285407-A1 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-11 — — US disclosed
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