Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PEPD | P12955 | 1/20 | 0.32 |
| ▸ | TAAR1 | Q96RJ0 | 2/20 | 0.31 |
| ▸ | TP53 | P04637 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20013706 | 0.87 | EPHX1 (0.33) | — | |
| SCHEMBL21504751 | 0.85 | CHRM2 (0.33) | — | |
| SCHEMBL16020232 | 0.83 | PEPD (0.30) | PEPDTAAR1 | |
| SCHEMBL13079561 | 0.82 | SMN1; SMN2 (0.31) | SMN1; SMN2 | |
| SCHEMBL13079562 | 0.81 | HDAC8 (0.32) | SMN1; SMN2 | |
| SCHEMBL19961456 | 0.81 | HDAC8 (0.32) | SMN1; SMN2 | |
| SCHEMBL19961458 | 0.81 | HDAC8 (0.32) | SMN1; SMN2 | |
| SCHEMBL19961457 | 0.81 | HDAC8 (0.32) | SMN1; SMN2 | |
| SCHEMBL19961459 | 0.81 | HDAC8 (0.32) | SMN1; SMN2 | |
| SCHEMBL19961449 | 0.81 | HDAC8 (0.32) | SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-19 | — | — | US | disclosed |
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-19 | — | — | US | disclosed |
| US-20230280651-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-07 | — | — | US | disclosed |
| US-11693314-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-04 | — | — | US | disclosed |
| US-20230205083-A1 | SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-29 | — | — | US | disclosed |
| US-20230205083-A1 | SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-29 | — | — | US | disclosed |
| US-11579526-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-02-14 | — | — | US | disclosed |
| US-20220236643-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-07-28 | — | — | US | disclosed |
| US-11340527-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-05-24 | — | — | US | disclosed |
| US-20220127225-A1 | ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-04-28 | — | — | US | disclosed |
| US-20180088464-A1 | SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-29 | — | — | US | disclosed |
| US-20170184967-A1 | RESIST COMPOSITION, PATTERN FORMING PROCESS, POLYMER, AND MONOMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| US-9519213-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-13 | — | — | US | disclosed |
| US-9122155-B2 | Sulfonium salt, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-09-01 | — | — | US | disclosed |
| US-9122155-B2 | Sulfonium salt, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-09-01 | — | — | US | disclosed |
| US-8956803-B2 | Sulfonium salt, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-17 | — | — | US | disclosed |
| US-8956803-B2 | Sulfonium salt, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-17 | — | — | US | disclosed |
| US-20140255843-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-11 | — | — | US | disclosed |
| US-8283104-B2 | Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-09 | — | — | US | disclosed |
| US-20100209827-A1 | NOVEL SULFONATE AND ITS DERIVATIVE, PHOTOSENSITIVE ACID GENERATOR, AND RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-08-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (9 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230205083-A1 | SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS | SLC6A9, SLC6A5, REN | PEPD 2212/4885TAAR1 2532/4885TP53 4795/4885 |
| US-20180088464-A1 | SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS | LSM14A, PAG1, EWSR1 | PEPD 3533/4885TAAR1 2401/4885TP53 2629/4885 |
| US-20220127225-A1 | ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | CACNA1F, SLC6A5, IDUA | PEPD 2663/4885TAAR1 3743/4885TP53 4265/4885 |
| US-11340527-B2 | Resist composition and patterning process | EIF2B1, EIF2B5, WDR1 | PEPD 4449/4885TAAR1 3359/4885TP53 3533/4885 |
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | IDUA, SLC6A5, SLC6A9 | PEPD 2209/4885TAAR1 2492/4885TP53 4838/4885 |
| US-20170184967-A1 | RESIST COMPOSITION, PATTERN FORMING PROCESS, POLYMER, AND MONOMER | EEF1D, EEF1G, RPL14 | PEPD 3867/4885TAAR1 4844/4885TP53 2164/4885 |
| US-20100209827-A1 | NOVEL SULFONATE AND ITS DERIVATIVE, PHOTOSENSITIVE ACID GENERATOR, AND RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME | DAP3, MRPS23, ASIC3 | PEPD 4641/4885TAAR1 2262/4885TP53 3589/4885 |
| US-20230280651-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | EIF2B1, EIF2B5, EIF2B3 | PEPD 4270/4885TAAR1 3688/4885TP53 3464/4885 |
| US-11693314-B2 | Resist composition and patterning process | EIF2B1, EIF2B5, EIF2B3 | PEPD 4270/4885TAAR1 3688/4885TP53 3464/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.