Known targets — ChEMBL curated mechanism
AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA
The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | CA1 | P00915 | 2/20 | 0.36 |
| ▸ | CES2 | O00748 | 3/20 | 0.34 |
| ▸ | CES1 | P23141 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Potassium Ion SCHEMBL7099159 | 1.00 | CA2 (0.38) | CA2CA1CES2CES1 | |
| Potassium Ion SCHEMBL7095514 | 1.00 | CA2 (0.38) | CA2CA1CES2CES1 | |
| Potassium Ion SCHEMBL7099526 | 1.00 | CA2 (0.38) | CA2CA1CES2CES1 | |
| Potassium Ion SCHEMBL29407602 | 1.00 | CA2 (0.38) | CA2CA1CES2CES1 | |
| Potassium Ion SCHEMBL7096230 | 1.00 | CA2 (0.38) | CA2CA1CES2CES1 | |
| Potassium Ion SCHEMBL7096242 | 1.00 | CA2 (0.38) | CA2CA1CES2CES1 | |
| Potassium Ion SCHEMBL7097763 | 1.00 | CA2 (0.38) | CA2CA1CES2CES1 | |
| Potassium Ion SCHEMBL1311260 | 1.00 | CA2 (0.38) | CA2CA1CES2CES1 | |
| Potassium Ion SCHEMBL7094806 | 1.00 | CA2 (0.38) | CA2CA1CES2CES1 | |
| Potassium Ion SCHEMBL7100047 | 1.00 | CA2 (0.38) | CA2CA1CES2CES1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110274844-A1 | AGENT FOR THE TREATMENT OF TOP-COAT PAINT FILMS TO IMPART STAIN RESISTANCE AND A METHOD FOR THE TREATMENT OF TOP-COAT PAINT FILMS TO IMPART STAIN-RESISTANCE | BASF COATINGS JAPAN LTD. (JP) | 2011-11-10 | — | — | US | claimed |
| JP-6321713-A | — | — | None | — | — | JP | disclosed |
| CN-118541135-A | Composition for conditioning keratin fibres | 莱雅公司 | 2024-08-23 | — | — | CN | disclosed |
| CN-114075349-A | Modifier for polyolefin agricultural film, master batch, polyolefin agricultural film, and laminated film | 竹本油脂株式会社 | 2022-02-22 | — | — | CN | disclosed |
| WO-2020137359-A1 | KIT FOR CLEANING AGENT AND METHOD FOR PREPARING CLEANING AGENT | 富士フイルムエレクトロニクスマテリアルズ株式会社 | 2020-07-02 | — | — | WO | disclosed |
| US-9803161-B2 | Cleaning agent for semiconductor substrates and method for processing semiconductor substrate surface | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2017-10-31 | — | — | US | disclosed |
| US-20150140820-A1 | CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2015-05-21 | — | — | US | disclosed |
| EP-2843689-A1 | CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE | Wako Pure Chemical Industries, Ltd. (JP) | 2015-03-04 | — | — | EP | disclosed |
| US-20110274844-A1 | AGENT FOR THE TREATMENT OF TOP-COAT PAINT FILMS TO IMPART STAIN RESISTANCE AND A METHOD FOR THE TREATMENT OF TOP-COAT PAINT FILMS TO IMPART STAIN-RESISTANCE | BASF COATINGS JAPAN LTD. (JP) | 2011-11-10 | — | — | US | disclosed |
| EP-0964036-B1 | Water-based ball-point pen ink composition | PILOT INK CO LTD (JP) | 2003-08-27 | — | — | EP | disclosed |
| EP-0688798-B2 | MALEIMIDE COPOLYMER AND RESIN COMPOSITION CONTAINING THE SAME | MITSUBISHI RAYON CO (JP) | 2003-08-27 | — | — | EP | disclosed |
| US-6412937-B1 | MIXTURE OF NONAQUEOUS SOLVVENT AND SURFACTANTS | FUJI PHOTO FILM CO. LTD. (JP) | 2002-07-02 | — | — | US | disclosed |
| US-6261352-B1 | BETAINE, SULFO ESTER | THE PILOT INK CO., LTD. (JP) | 2001-07-17 | — | — | US | disclosed |
| EP-0964036-A2 | Water-based ball-point pen ink composition | THE PILOT INK CO., LTD. (JP) | 1999-12-15 | — | — | EP | disclosed |
| EP-0688798-B1 | MALEIMIDE COPOLYMER AND RESIN COMPOSITION CONTAINING THE SAME | MITSUBISHI RAYON CO (JP) | 1999-08-18 | — | — | EP | disclosed |
| EP-0688798-A1 | MALEIMIDE COPOLYMER AND RESIN COMPOSITION CONTAINING THE SAME | MITSUBISHI RAYON CO., LTD. (JP) | 1995-12-27 | — | — | EP | disclosed |
| JP-H06321713-A | SUSPENSION-LIKE HERBICIDAL COMPOSITION FOR PADDY FIELD | MITSUBISHI PETROCHEM CO LTD | 1994-11-22 | — | — | JP | disclosed |
| EP-0382142-B1 | Material for forming image | SONY CORP (JP) | 1993-12-08 | — | — | EP | disclosed |
| US-5116714-A | IMAGE FORMING MATERIAL WITH DEVELOPER AND PHOTOSENSITIVE BASE ON WHICH AN ELECTROSTATIC LATENT IMAGE IS FORMED | SONY CORPORATION (JP) | 1992-05-26 | — | — | US | disclosed |
| EP-0382142-A2 | Material for forming image | SONY CORPORATION (JP) | 1990-08-16 | — | — | EP | disclosed |