Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.35 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | HPGD | P15428 | 2/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.30 |
| ▸ | ELANE | P08246 | 1/20 | 0.30 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | PKM | P14618 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1315203 | 0.87 | TSHR (0.35) | ESR1ESR2MAPTALDH1A1SMN1; SMN2 | |
| SCHEMBL10317669 | 0.85 | KCNH2 (0.38) | MAPTALDH1A1CYP19A1 | |
| SCHEMBL10319410 | 0.84 | KCNH2 (0.41) | TP53ALDH1A1CYP19A1PKMSMN1; SMN2 | |
| SCHEMBL10319475 | 0.84 | KCNH2 (0.41) | TP53ALDH1A1CYP19A1PKMSMN1; SMN2 | |
| SCHEMBL9618192 | 0.84 | KCNH2 (0.41) | TP53ALDH1A1CYP19A1PKMSMN1; SMN2 | |
| SCHEMBL10319034 | 0.84 | KCNH2 (0.41) | TP53ALDH1A1CYP19A1PKMSMN1; SMN2 | |
| SCHEMBL1314830 | 0.84 | KCNH2 (0.41) | TP53ALDH1A1CYP19A1PKMSMN1; SMN2 | |
| SCHEMBL2273904 | 0.81 | ESR1 (0.38) | ESR1ESR2TP53MAPTKDM4E | |
| SCHEMBL707143 | 0.79 | TP53 (0.35) | ESR1ESR2TP53KDM4EALDH1A1 | |
| SCHEMBL704073 | 0.79 | TP53 (0.35) | ESR1ESR2TP53KDM4EALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9919300-B2 | 1-hexene production process | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-03-20 | — | — | US | disclosed |
| EP-2484685-B1 | TRANSITION METAL COMPLEX, PREPARATION METHOD FOR SAID TRANSITION METAL COMPLEX, TRIMERIZATION CATALYST, PREPARATION METHOD FOR 1-HEXENE, PREPARATION METHOD FOR ETHYLENE POLYMER, SUBSTITUTED CYCLOPENTADIENE COMPOUND, AND PREPARATION METHOD FOR SAID SUBSTITUTED CYCLOPENTADIENE COMPOUND | SUMITOMO CHEMICAL CO (JP) | 2017-11-01 | — | — | EP | disclosed |
| US-20170036200-A1 | 1-HEXENE PRODUCTION PROCESS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-09 | — | — | US | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-20150105237-A1 | CATALYTIC COMPONENT FOR TRIMERIZATION AND TRIMERIZATION CATALYST | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-04-16 | — | — | US | disclosed |
| US-20150105572-A1 | TRANSITION METAL COMPLEX | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-04-16 | — | — | US | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| EP-2691357-A1 | METHOD FOR PRODUCING 1-HEXENE | Sumitomo Chemical Company Limited (JP) | 2014-02-05 | — | — | EP | disclosed |
| US-20140012056-A1 | METHOD FOR PRODUCING 1-HEXENE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-01-09 | — | — | US | disclosed |
| WO-2012133937-A1 | METHOD FOR PRODUCING 1-HEXENE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-04 | — | — | WO | disclosed |
| US-8008521-B2 | Processes for the production of tri-organo-monoalkoxysilanes and process for the production of tri-organo-monochlorosilanes | HOKKO CHEMICAL INDUSTRY CO., LTD. (JP) | 2011-08-30 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| US-20090082585-A1 | PROCESSES FOR THE PRODUCTION OF TRI-ORGANO-MONOALKOXYSILANES AND PROCESS FOR THE PRODUCTION OF TRI-ORGANO-MONOCHLOROSILANES | BANNOU TADASHI | 2009-03-26 | — | — | US | disclosed |
| US-7459577-B2 | Reacting a chlorosilane with grignard reagent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-12-02 | — | — | US | disclosed |
| US-20050070730-A1 | Production processes for triorganomonoalkoxysilanes and triorganomonochlorosilanes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-31 | — | — | US | disclosed |
| EP-0282294-B1 | Vinylsilylalkoxy arylbenzotriazole compounds and UV absorbing compositions made therefrom | IOLAB CORP (US) | 1993-12-01 | — | — | EP | disclosed |
| US-5100762-A | Radiation-sensitive polymer and radiation-sensitive composition containing the same | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1992-03-31 | — | — | US | disclosed |
| US-4803254-A | Vinylsilylalkoxy arylbenzotriazole compounds and UV absorbing compositions made therefrom | IOLAB CORPORATION (US) | 1989-02-07 | — | — | US | disclosed |
| EP-0282294-A2 | Vinylsilylalkoxy arylbenzotriazole compounds and UV absorbing compositions made therefrom | IOLAB CORPORATION (US) | 1988-09-14 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170036200-A1 | 1-HEXENE PRODUCTION PROCESS | AP1M1, HK1, CYC1 | ESR1 84/4885ESR2 207/4885TP53 4506/4885 |
| US-20140012056-A1 | METHOD FOR PRODUCING 1-HEXENE | AP2A1, AP1M1, ME1 | ESR1 452/4885ESR2 641/4885TP53 3815/4885 |
| US-20150105572-A1 | TRANSITION METAL COMPLEX | AP1M1, AP3M1, EMC1 | ESR1 30/4885ESR2 216/4885TP53 3995/4885 |
| US-20150105237-A1 | CATALYTIC COMPONENT FOR TRIMERIZATION AND TRIMERIZATION CATALYST | AP1M1, AMY1A, AP3M1 | ESR1 66/4885ESR2 300/4885TP53 4366/4885 |
| US-20090082585-A1 | PROCESSES FOR THE PRODUCTION OF TRI-ORGANO-MONOALKOXYSILANES AND PROCESS FOR THE PRODUCTION OF TRI-ORGANO-MONOCHLOROSILANES | MLX, HAX1, RPS4X | ESR1 1234/4885ESR2 1238/4885TP53 4315/4885 |
| US-20050070730-A1 | Production processes for triorganomonoalkoxysilanes and triorganomonochlorosilanes | MLX, HAX1, GRIA3 | ESR1 768/4885ESR2 707/4885TP53 4548/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.