Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 3/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.37 |
| ▸ | GLA | P06280 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL136082 | 0.81 | EPHX2 (0.38) | HSD11B1LMNAALDH1A1SMN1; SMN2MAPT | |
| SCHEMBL135696 | 0.78 | KMT2A (0.44) | HSD11B1LMNAALDH1A1SMN1; SMN2MAPT | |
| SCHEMBL23111400 | 0.77 | HSD11B1 (0.41) | HSD11B1LMNAALDH1A1SMN1; SMN2GLA | |
| SCHEMBL1981153 | 0.77 | HSD11B1 (0.41) | HSD11B1LMNAALDH1A1SMN1; SMN2GLA | |
| SCHEMBL7457564 | 0.76 | HSD11B1 (0.38) | HSD11B1LMNAALDH1A1SMN1; SMN2MAPT | |
| SCHEMBL7457569 | 0.76 | HSD11B1 (0.38) | HSD11B1LMNAALDH1A1SMN1; SMN2MAPT | |
| SCHEMBL1072478 | 0.73 | ALDH1A1 (0.50) | HSD11B1LMNAALDH1A1GLATSHR | |
| SCHEMBL16415960 | 0.73 | HSD11B1 (0.39) | HSD11B1LMNAALDH1A1SMN1; SMN2GLA | |
| SCHEMBL677939 | 0.73 | ALDH1A1 (0.42) | HSD11B1LMNAALDH1A1SMN1; SMN2MAPT | |
| SCHEMBL40512 | 0.73 | ALDH1A1 (0.42) | HSD11B1LMNAALDH1A1SMN1; SMN2MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 211 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12030970-B2 | Curable composition and stereolithographic resin composition comprising same | KURARAY CO., LTD. (JP) | 2024-07-09 | — | — | US | disclosed |
| EP-3900693-B1 | USE OF A RESIN COMPOSITION | KURARAY NORITAKE DENTAL INC (JP) | 2024-03-20 | — | — | EP | disclosed |
| US-11814454-B2 | Curable composition, and resin composition for stereolithography prepared therefrom | KURARAY CO., LTD. (JP) | 2023-11-14 | — | — | US | disclosed |
| EP-4268792-A1 | ADHESIVE COMPOSITION FOR PHOTOFABRICATION ARTICLES | Kuraray Noritake Dental Inc. (JP) | 2023-11-01 | — | — | EP | disclosed |
| WO-2023190931-A1 | RESIN COMPOSITION FOR STEREOLITHOGRAPHY | クラレノリタケデンタル株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023182514-A1 | ADHESIVE COMPOSITION FOR STEREOLITHOGRAPHIC ARTICLE AND NON-STEREOLITHOGRAPHIC ARTICLE | クラレノリタケデンタル株式会社 | 2023-09-28 | — | — | WO | disclosed |
| CN-116669679-A | Adhesive composition for photo-molded article | 可乐丽则武齿科株式会社 | 2023-08-29 | — | — | CN | disclosed |
| WO-2023042913-A1 | METHOD FOR PRODUCING DENTURE | クラレノリタケデンタル株式会社 | 2023-03-23 | — | — | WO | disclosed |
| WO-2023042912-A1 | METHOD FOR MANUFACTURING INTRAORAL APPLIANCE EQUIPPED WITH COATING, AND INTRAORAL APPLIANCE EQUIPPED WITH COATING | クラレノリタケデンタル株式会社 | 2023-03-23 | — | — | WO | disclosed |
| WO-2023042915-A1 | STEREOLITHOGRAPHY PLATE DENTURE MANUFACTURING KIT, AND METHOD FOR MANUFACTURING PLATE DENTURE | クラレノリタケデンタル株式会社 | 2023-03-23 | — | — | WO | disclosed |
| EP-2060600-A1 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-05-20 | — | — | EP | disclosed |
| US-20090104563-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-04-23 | — | — | US | disclosed |
| CN-101408728-A | Resist composition, method of forming resist pattern, novel compound and method of producing the same | TOKYO OHKA KOGYO CO LTD (JP) | 2009-04-15 | — | — | CN | disclosed |
| US-20090068591-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-03-12 | — | — | US | disclosed |
| US-20080311522-A1 | Comprising base component which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component which generates acid upon irradiation | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-12-18 | — | — | US | disclosed |
| US-7423102-B2 | Star polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-09-09 | — | — | US | disclosed |
| US-7192684-B2 | Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
| US-20060014913-A1 | Star polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-01-19 | — | — | US | disclosed |
| CN-1721992-A | Star polymer | SUMITOMO CHEMICAL CO | 2006-01-18 | — | — | CN | disclosed |
| US-20040067436-A1 | Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-04-08 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11814454-B2 | Curable composition, and resin composition for stereolithography prepared therefrom | WASF2, COPE, ARCN1 | HSD11B1 4250/4885LMNA 2226/4885ALDH1A1 2089/4885 |
| US-20080311522-A1 | Comprising base component which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component which generates acid upon irradiation | GNG2, ACAD9, SCO2 | HSD11B1 1796/4885LMNA 960/4885ALDH1A1 1184/4885 |
| US-12030970-B2 | Curable composition and stereolithographic resin composition comprising same | ARL1, ASH2L, VCL | HSD11B1 4415/4885LMNA 2664/4885ALDH1A1 1097/4885 |
| US-20090068591-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, AND ACID GENERATOR | RER1, C1R, ABCC1 | HSD11B1 186/4885LMNA 1612/4885ALDH1A1 516/4885 |
| US-20090104563-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | RER1, ABCC1, GLRA1 | HSD11B1 552/4885LMNA 1566/4885ALDH1A1 895/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.