Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.31 |
| ▸ | LMNA | P02545 | 2/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 2/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.30 |
| ▸ | SCN1A | P35498 | 1/20 | 0.30 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.30 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31115181 | 0.89 | HPGD (0.32) | ALDH1A1HSD11B1THRBHPGDTSHR | |
| SCHEMBL5917724 | 0.88 | ALDH1A1 (0.38) | ALDH1A1LMNATHRBHTTSMN1; SMN2 | |
| SCHEMBL547650 | 0.87 | ALDH1A1 (0.32) | ALDH1A1LMNATHRBHTTSMN1; SMN2 | |
| SCHEMBL28179068 | 0.83 | TSHR (0.33) | ALDH1A1LMNATHRBHTTSMN1; SMN2 | |
| SCHEMBL5917728 | 0.83 | THRB (0.41) | ALDH1A1LMNATHRBHTTSMN1; SMN2 | |
| SCHEMBL5917725 | 0.83 | THRB (0.41) | ALDH1A1LMNATHRBHTTSMN1; SMN2 | |
| SCHEMBL7711858 | 0.81 | ALDH1A1 (0.34) | ALDH1A1LMNASMN1; SMN2MEN1KMT2A | |
| SCHEMBL284284 | 0.80 | NAAA (0.32) | — | |
| SCHEMBL217041 | 0.79 | TSHR (0.32) | ALDH1A1LMNATSHRMEN1KMT2A | |
| SCHEMBL17322714 | 0.79 | ALDH1A1 (0.33) | ALDH1A1HSD11B1LMNASMN1; SMN2MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 61 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110177454-A1 | RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL | PANASONIC CORPORATION (JP) | 2011-07-21 | — | — | US | claimed |
| EP-4267708-B1 | THERMALLY RESPONSIVE BRUSH POLYMERS HAVING A COPOLYMER BACKBONE AND COPOLYMER ARMS | INFINEUM INT LTD (GB) | 2025-07-02 | — | — | EP | disclosed |
| US-12281203-B2 | Thermally responsive brush polymers having a copolymer backbone and copolymer arms | INFINEUM INTERNATIONAL LIMITED (GB) | 2025-04-22 | — | — | US | disclosed |
| CN-114539479-B | Sealing agent for organic EL display element, and organic EL display element | 积水化学工业株式会社 | 2025-01-17 | — | — | CN | disclosed |
| CN-112285998-B | Method for forming pattern using antireflective coating composition comprising photoacid generator | 罗门哈斯电子材料有限责任公司 | 2025-01-03 | — | — | CN | disclosed |
| US-20240309155-A1 | Thermally Responsive Brush Polymers Having a Copolymer Backbone and Copolymer Arms | INFINEUM INTERNATIONAL LIMITED (GB) | 2024-09-19 | — | — | US | disclosed |
| US-20240124632-A1 | Method for Producing Fluorine-Containing Polymer and Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-04-18 | — | — | US | disclosed |
| US-20240043593-A1 | Fluorine-Containing Polymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-02-08 | — | — | US | disclosed |
| EP-4267708-A1 | THERMALLY RESPONSIVE BRUSH POLYMERS HAVING A COPOLYMER BACKBONE AND COPOLYMER ARMS | Infineum International Limited (GB) | 2023-11-01 | — | — | EP | disclosed |
| CN-116848162-A | Fluorine-containing polymer | 中央硝子株式会社 | 2023-10-03 | — | — | CN | disclosed |
| US-7595141-B2 | Composition for coating over a photoresist pattern | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-09-29 | — | — | US | disclosed |
| EP-1815296-A1 | A COMPOSITION FOR COATING OVER A PHTORESIST PATTERN | AZ Electronic Materials USA Corp. (US) | 2007-08-08 | — | — | EP | disclosed |
| CN-1912745-A | Barrier coating compositions for photoresist and methods of forming photoresist patterns using the same | SAMSUNG ELECTRONICS CO LTD (KR) | 2007-02-14 | — | — | CN | disclosed |
| WO-2006046137-A1 | A COMPOSITION FOR COATING OVER A PHTORESIST PATTERN | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2006-05-04 | — | — | WO | disclosed |
| US-20060088788-A1 | Composition for coating over a photoresist pattern | MERCK PATENT GMBH (DE) | 2006-04-27 | — | — | US | disclosed |
| US-20060009583-A1 | Method of producing (meth) acrylic acid derivative polymer for resist | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-01-12 | — | — | US | disclosed |
| WO-2004050728-A2 | METHOD OF PRODUCING (METH) ACRYLIC ACID DERIVATIVE POLYMER FOR RESIST | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-06-17 | — | — | WO | disclosed |
| WO-2004041762-A1 | FLUORINE-CONTAINING VINYL ETHERS, THEIR POLYMERS, AND RESIST COMPOSITIONS USING SUCH POLYMERS | CENTRAL GLASS COMPANY, LIMITED (JP) | 2004-05-21 | — | — | WO | disclosed |
| US-6624257-B2 | Calculating protection ratio of a hydroxyl group of a polymer using a multiple regression calibration curve obtained by regression- analyzing main components of near infrared absorption spectra of a plurality of samples | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-09-23 | — | — | US | disclosed |
| US-20020052449-A1 | Method of quantifying protective ratio of hydroxyl groups of polymer compound | SUMITOMO CHEMICAL COMPANY, LIMITED | 2002-05-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240124632-A1 | Method for Producing Fluorine-Containing Polymer and Composition | PFAS, AFF2, AFF1 | ALDH1A1 865/4885HSD11B1 1754/4885LMNA 2606/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.