Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethane SCHEMBL28205575 | 0.98 | NAAA (0.31) | NAAA | |
| SCHEMBL5917758 | 0.87 | THRB (0.37) | NAAANPSR1 | |
| SCHEMBL454650 | 0.85 | THRB (0.30) | — | |
| SCHEMBL2184378 | 0.81 | HSD17B10 (0.35) | NAAANPSR1 | |
| SCHEMBL13719221 | 0.81 | EPHX2 (0.31) | NPSR1 | |
| SCHEMBL5917760 | 0.81 | THRB (0.45) | NAAANPSR1 | |
| SCHEMBL5917763 | 0.81 | THRB (0.45) | NAAANPSR1 | |
| SCHEMBL4333995 | 0.81 | — | — | |
| SCHEMBL134073 | 0.80 | ALDH1A1 (0.31) | — | |
| SCHEMBL29618128 | 0.80 | TSHR (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 575 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112175133-B | Acrylic resin and preparation method and application thereof | 宁波南大光电材料有限公司 | 2022-08-19 | — | — | CN | claimed |
| CN-114380937-A | Adamantane-containing photosensitive resin for black matrix photoresist, preparation method thereof, resin composition and application method thereof | 江苏博砚电子科技有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-110770282-A | Curable silicone composition, and application and use thereof | 莫门蒂夫性能材料股份有限公司 | 2020-02-07 | — | — | CN | claimed |
| US-9983477-B2 | Polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-05-29 | — | — | US | claimed |
| US-9640396-B2 | Spin-on spacer materials for double- and triple-patterning lithography | BREWER SCIENCE INC. (US) | 2017-05-02 | — | — | US | claimed |
| EP-2527380-B1 | Photosensitive compositions | ROHM & HAAS ELECT MAT (US) | 2013-12-18 | — | — | EP | claimed |
| US-8507176-B2 | Photosensitive compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2013-08-13 | — | — | US | claimed |
| EP-2341089-B1 | Photosensitive compositions | ROHM & HAAS ELECT MAT (US) | 2013-02-13 | — | — | EP | claimed |
| EP-2374145-A2 | SPIN-ON SPACER MATERIALS FOR DOUBLE- AND TRIPLE-PATTERNING LITHOGRAPHY | Brewer Science, Inc. (US) | 2011-10-12 | — | — | EP | claimed |
| US-20110236823-A1 | NOVEL POLYMERS AND PHOTORESIST COMPOSITIONS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-09-29 | — | — | US | claimed |
| US-6841331-B2 | Polymers, processes for polymer synthesis and photoresist compositions | SHIPLEY COMPANY, L.L.C. (US) | 2005-01-11 | — | — | US | claimed |
| US-20040076906-A1 | Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same | SHIPLEY COMPANY, L.L.C. | 2004-04-22 | — | — | US | claimed |
| US-6692888-B1 | TERPOLYMER OF SUCH AS 2-METHYLADAMANTANYL METHACRYLATE, METHACRYLONITRILE AND ALPHA-BUTYROLACTONE METHACRYLATE; SHORT WAVELENGTH IMAGING; PLASMA ETCHANT RESISTANCE | SHIPLEY COMPANY, L.L.C. | 2004-02-17 | — | — | US | claimed |
| US-20030235777-A1 | Mixing resin obtained by polymerizing 1-vinyl-3-esterphenyl compound with one or more monomers and treating the polymer to provide meta-hydroxyphenyl repeat units with photoactive component | SHIPLEY COMPANY, L.L.C. | 2003-12-25 | — | — | US | claimed |
| US-20030215742-A1 | Novel copolymers and photoresist compositions comprising same | BARCLAY GEORGE G (US) | 2003-11-20 | — | — | US | claimed |
| US-20030139613-A1 | Process for preparing acrylate compound | TOSOH CORPORATION | 2003-07-24 | — | — | US | claimed |
| US-20030027075-A1 | Novel polymers, processes for polymer synthesis and photoresist compositions | SHIPLEY COMPANY, L.L.C. | 2003-02-06 | — | — | US | claimed |
| WO-2002069040-A1 | NOVEL POLYMERS, PROCESSES FOR POLYMER SYNTHESIS AND PHOTORESIST COMPOSITIONS | SHIPLEY COMPANY, LLC (US) | 2002-09-06 | — | — | WO | claimed |
| EP-1128213-A2 | Photoresist compositions comprising novel copolymers | Shipley Company LLC (US) | 2001-08-29 | — | — | EP | claimed |
| EP-1091249-A1 | Copolymers having nitride and alicyclic leaving groups and photoresist compositions comprising same | Shipley Company LLC (US) | 2001-04-11 | — | — | EP | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030139613-A1 | Process for preparing acrylate compound | AFF1, AFF4, RER1 | NAAA 750/4885NPSR1 3231/4885 |
| US-20030215742-A1 | Novel copolymers and photoresist compositions comprising same | LCP1, PUF60, MACF1 | NAAA 2207/4885NPSR1 2765/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.