Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.57 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.55 |
| ▸ | CA1 | P00915 | 3/20 | 0.47 |
| ▸ | CA2 | P00918 | 3/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.46 |
| ▸ | NCEH1 | Q6PIU2 | 1/20 | 0.44 |
| ▸ | HPRT1 | P00492 | 1/20 | 0.44 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.43 |
| ▸ | CRHBP | P24387 | 1/20 | 0.43 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.42 |
| ▸ | HNF4A | P41235 | 2/20 | 0.41 |
| ▸ | S100A4 | P26447 | 1/20 | 0.41 |
| ▸ | VCAM1 | P19320 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.38 |
| ▸ | MYB | P10242 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8561764 | 0.79 | CYP3A4 (0.59) | TSHRCYP3A4CA1CA2ALDH1A1 | |
| SCHEMBL11738139 | 0.78 | NCOA3 (0.44) | TSHRVCAM1TDP1POLB | |
| SCHEMBL3237039 | 0.75 | ALDH1A1 (0.46) | TSHRCYP3A4CA1CA2ALDH1A1 | |
| SCHEMBL187452 | 0.74 | TSHR (0.65) | TSHRCYP3A4ALDH1A1NCEH1HPRT1 | |
| SCHEMBL17987525 | 0.73 | TSHR (0.62) | TSHRCYP3A4ALDH1A1NCEH1HPRT1 | |
| SCHEMBL3071816 | 0.73 | TSHR (0.62) | TSHRCYP3A4ALDH1A1NCEH1HPRT1 | |
| SCHEMBL767775 | 0.73 | TSHR (0.62) | TSHRCYP3A4ALDH1A1NCEH1HPRT1 | |
| SCHEMBL7936527 | 0.73 | TSHR (0.62) | TSHRCYP3A4ALDH1A1NCEH1HPRT1 | |
| SCHEMBL2026504 | 0.73 | TSHR (0.62) | TSHRCYP3A4ALDH1A1NCEH1HPRT1 | |
| SCHEMBL1710125 | 0.73 | TSHR (1.00) | TSHRCYP3A4ALDH1A1NCEH1HPRT1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10741768-B2 | Organic light-emitting diode with high efficiency | SFC CO., LTD. (KR) | 2020-08-11 | — | — | US | disclosed |
| US-8062429-B2 | Methods of cleaning semiconductor devices at the back end of line using amidoxime compositions | EKC TECHNOLOGY, INC. (US) | 2011-11-22 | — | — | US | disclosed |
| US-20100105595-A1 | COMPOSITION COMPRISING CHELATING AGENTS CONTAINING AMIDOXIME COMPOUNDS | EKC TECHNOLOGY, INC. | 2010-04-29 | — | — | US | disclosed |
| US-20100043823-A1 | METHODS OF CLEANING SEMICONDUCTOR DEVICES AT THE BACK END OF LINE USING AMIDOXIME COMOSITIONS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2010-02-25 | — | — | US | disclosed |
| WO-2009085072-A1 | COMPOSITION COMPRISING CHELATING AGENTS CONTAINING AMIDOXIME COMPOUNDS | EKC TECHNOLOGY, INC (US) | 2009-07-09 | — | — | WO | disclosed |
| US-20090137191-A1 | COPPER CMP POLISHING PAD CLEANING COMPOSITION COMPRISING OF AMIDOXIME COMPOUNDS | EKC TECHNOLOGY, INC. | 2009-05-28 | — | — | US | disclosed |
| US-20090133716-A1 | METHODS OF POST CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING USING AMIDOXIME COMPOSITIONS | EKC TECHNOLOGY, INC. | 2009-05-28 | — | — | US | disclosed |
| US-20090130849-A1 | CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING COMPOSITION COMPRISING AMIDOXIME COMPOUNDS AND ASSOCIATED METHOD FOR USE | EKC TECHNOLOGY, INC. | 2009-05-21 | — | — | US | disclosed |
| WO-2009058274-A1 | CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING COMPOSITION COMPRISING AMIDOXIME COMPOUNDS AND ASSOCIATED METHOD FOR USE | EKC TECHNOLOGY, INC. (US) | 2009-05-07 | — | — | WO | disclosed |
| WO-2009058272-A1 | COPPER CMP POLISHING PAD CLEANING COMPOSITION COMPRISING OF AMIDOXIME COMPOUNDS | EKC TECHNOLOGY, INC. (US) | 2009-05-07 | — | — | WO | disclosed |
| WO-2009058278-A1 | METHODS OF CLEANING SEMICONDUCTOR DEVICES AT THE BACK END OF LINE USING AMIDOXIME COMPOSITIONS | EKC TECHNOLOGY, INC (US) | 2009-05-07 | — | — | WO | disclosed |
| WO-2009058288-A1 | AMIDOXIME COMPOUNDS AS CHELATING AGENTS IN SEMICONDUCTOR PROCESSES | EKC TECHNOLOGY, INC. (US) | 2009-05-07 | — | — | WO | disclosed |
| WO-2009058275-A1 | METHODS OF POST CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING USING AMIDOXIME COMPOSITIONS | EKC TECHNOLOGY, INC. (US) | 2009-05-07 | — | — | WO | disclosed |
| US-20090107520-A1 | AMIDOXIME COMPOUNDS AS CHELATING AGENTS IN SEMICONDUCTOR PROCESSES | EKC TECHNOLOGY, INC. | 2009-04-30 | — | — | US | disclosed |
| US-5545744-A | Cyano naphthalene compounds | AGOURON PHARMACEUTICALS, INC. (US) | 1996-08-13 | — | — | US | disclosed |
| US-5498727-A | Preparation of benzindole compounds from naphthalene compounds | AGOURON PHARMACEUTICALS, INC. (US) | 1996-03-12 | — | — | US | disclosed |
| WO-1996002502-A1 | PREPARATION OF BENZINDOLE COMPOUNDS FROM NAPHTHALENE COMPOUNDS | AGOURON PHARMACEUTICALS, INC. (US) | 1996-02-01 | — | — | WO | disclosed |
| US-4703102-A | HEAT AND CHEMICAL RESISTANCE, MELT PROCESSABILITY | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1987-10-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10741768-B2 | Organic light-emitting diode with high efficiency | ALDH1A2, CYBA, LPO | TSHR 2521/4885CYP3A4 1033/4885CA1 3920/4885 |
| US-20090137191-A1 | COPPER CMP POLISHING PAD CLEANING COMPOSITION COMPRISING OF AMIDOXIME COMPOUNDS | PADI2, PADI4, PADI3 | TSHR 2828/4885CYP3A4 4301/4885CA1 952/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.