Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 3/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.39 |
| ▸ | ELANE | P08246 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.36 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | IRAK4 | Q9NWZ3 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | CA1 | P00915 | 2/20 | 0.34 |
| ▸ | CA2 | P00918 | 2/20 | 0.34 |
| ▸ | CA9 | Q16790 | 2/20 | 0.34 |
| ▸ | CFTR | P13569 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | CA12 | O43570 | 1/20 | 0.34 |
| ▸ | CA7 | P43166 | 1/20 | 0.34 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4737878 | 0.93 | ALOX15 (0.43) | TSHRALOX15LMNAALDH1A1CA1 | |
| SCHEMBL220621 | 0.89 | CA2 (0.41) | MAPTNPSR1ELANEKMT2ATSHR | |
| SCHEMBL22129807 | 0.89 | KDM4E (0.39) | MAPTNPSR1ELANEKMT2ATSHR | |
| SCHEMBL1524133 | 0.87 | TSHR (0.39) | MAPTNPSR1KMT2ATSHRPOLB | |
| SCHEMBL8174194 | 0.87 | CA2 (0.39) | MAPTNPSR1ELANEKMT2ATSHR | |
| SCHEMBL11177188 | 0.87 | MAPT (0.34) | MAPTNPSR1ELANEKMT2ATSHR | |
| Isophthalic Acid SCHEMBL31245588 | 0.84 | RXRA (0.43) | MAPTKMT2AALOX15POLBCA1 | |
| SCHEMBL11216809 | 0.80 | TDP1 (0.40) | MAPTTSHRALOX15POLBLMNA | |
| SCHEMBL1348416 | 0.80 | KMT2A (0.33) | MAPTNPSR1ELANEKMT2APOLB | |
| SCHEMBL21258125 | 0.80 | PDK1 (0.40) | MAPTNPSR1ELANETSHRPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0090627-B1 | METHOD FOR PRODUCING A PLASTIC LENS | NIPPON OIL AND FATS COMPANY, LIMITED (JP) | 1987-05-13 | — | — | EP | claimed |
| WO-2024162168-A1 | FLUID HOSE | 住友理工株式会社 | 2024-08-08 | — | — | WO | disclosed |
| WO-2024069725-A1 | RUBBER COMPOSITION AND RUBBER PRODUCT USING SAME, AND HOSE | 住友理工株式会社 | 2024-04-04 | — | — | WO | disclosed |
| CN-106660953-B | High heat resistant monomers and methods of use thereof | 沙特基础工业全球技术有限公司 | 2020-07-28 | — | — | CN | disclosed |
| US-9778564-B2 | Imprint material | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-10-03 | — | — | US | disclosed |
| US-9533467-B2 | Imprint material having low mold release property | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-01-03 | — | — | US | disclosed |
| US-20160068674-A1 | IMPRINT MATERIAL | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-03-10 | — | — | US | disclosed |
| US-20150321445-A1 | IMPRINT MATERIAL HAVING LOW MOLD RELEASE PROPERTY | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-11-12 | — | — | US | disclosed |
| US-8658342-B2 | Photosensitive composition including photopolymerizable polymer having fluorene skeleton | NISSAN CHEMICALS INDUSTRIES, LTD. (JP) | 2014-02-25 | — | — | US | disclosed |
| US-20120129102-A1 | PHOTOSENSITIVE COMPOSITION INCLUDING PHOTOPOLYMERIZABLE POLYMER HAVING FLUORENE SKELETON | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-05-24 | — | — | US | disclosed |
| US-8063245-B2 | Phosphazene compound, photosensitive resin composition and use thereof | KANEKA CORPORATION (JP) | 2011-11-22 | — | — | US | disclosed |
| US-20100218984-A1 | PHOTOSENSITIVE DRY FILM RESIST, PRINTED WIRING BOARD MAKING USE OF THE SAME, AND PROCESS FOR PRODUCING PRINTED WIRING BOARD | KANEKA CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| WO-2008075799-A1 | TONER AND METHOD OF PREPARING THE SAME | CHEIL INDUSTRIES INC. (KR) | 2008-06-26 | — | — | WO | disclosed |
| WO-2008075804-A1 | TONER AND METHOD OF PREPARING THE SAME | CHEIL INDUSTRIES INC. (KR) | 2008-06-26 | — | — | WO | disclosed |
| US-20060199920-A1 | Photosensitive resin composition capable of being developed with aqueous developer and photosensitive dry film resist, and use thereof | KANEKA CORPORATION (JP) | 2006-09-07 | — | — | US | disclosed |
| US-20060142542-A1 | Phosphazene compound, photosensitive resin composition and use thereof | KANEKA CORPORATION (JP) | 2006-06-29 | — | — | US | disclosed |
| US-5948866-A | BLEND CONTAINING ADDITION POLYMER | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1999-09-07 | — | — | US | disclosed |
| US-4939069-A | Photopolymerizable composition | NIPPON PAINT CO., LTD. (JP) | 1990-07-03 | — | — | US | disclosed |