Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.32 |
| ▸ | HSD11B2 | P80365 | 2/20 | 0.32 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29791378 | 0.82 | APLNR (0.30) | — | |
| SCHEMBL1088728 | 0.75 | THRB (0.35) | EPHX2THRBCYP2C9GAAHSD11B1 | |
| SCHEMBL700514 | 0.74 | ALDH1A1 (0.36) | LMNAHSD11B1HSD11B2ALDH1A1HTT | |
| SCHEMBL702570 | 0.73 | — | — | |
| SCHEMBL26881004 | 0.72 | MEN1 (0.33) | GAAHSD11B1HSD11B2MEN1KMT2A | |
| SCHEMBL26881003 | 0.72 | MEN1 (0.33) | GAAHSD11B1HSD11B2MEN1KMT2A | |
| SCHEMBL26881005 | 0.72 | MEN1 (0.33) | GAAHSD11B1HSD11B2MEN1KMT2A | |
| SCHEMBL59961 | 0.72 | CYP2C9 (0.36) | EPHX2THRBCYP2C9GAAHSD11B1 | |
| SCHEMBL28441342 | 0.72 | HSD11B1 (0.30) | HSD11B1 | |
| SCHEMBL74823 | 0.71 | THRB (0.35) | EPHX2THRBCYP2C9GAAHSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230393469-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2023-12-07 | — | — | US | disclosed |
| US-9200098-B2 | Radiation-sensitive composition and compound | JSR CORPORATION (JP) | 2015-12-01 | — | — | US | disclosed |
| US-20150241779-A1 | REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES | OSAKA UNIVERSITY (JP) | 2015-08-27 | — | — | US | disclosed |
| WO-2015125495-A1 | Reagent for Enhancing Generation of Chemical Species | TOYO GOSEI CO., LTD. (JP) | 2015-08-27 | — | — | WO | disclosed |
| US-9029067-B2 | Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same | JSR CORPORATION (JP) | 2015-05-12 | — | — | US | disclosed |
| US-8968980-B2 | Radiation-sensitive resin composition and compound | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-20150004547-A1 | RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD FOR FORMATION OF RESIST PATTERN BY USING THE SAME | JSR CORPORATION (JP) | 2015-01-01 | — | — | US | disclosed |
| US-20140363773-A1 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2014-12-11 | — | — | US | disclosed |
| US-8877429-B2 | Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same | JSR CORPORATION (JP) | 2014-11-04 | — | — | US | disclosed |
| US-8802348-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-08-12 | — | — | US | disclosed |
| US-20090274977-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2009-11-05 | — | — | US | disclosed |
| EP-2100870-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | JSR Corporation (JP) | 2009-09-16 | — | — | EP | disclosed |
| EP-1961739-A1 | NOVEL COMPOUND, POLYMER, AND RESIN COMPOSITION | JSR Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |
| EP-1953595-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-08-06 | — | — | EP | disclosed |
| CN-1189792-C | Photoresist composition containing cycloolefine polymer with lactone part | IBM (US) | 2005-02-16 | — | — | CN | disclosed |
| CN-1322967-A | Photoresist composition containing cycloolefine polymer with lactone part | IBM (US) | 2001-11-21 | — | — | CN | disclosed |
| EP-0249139-B2 | Resist compositions and use | MICROSI INC (US) | 1998-03-11 | — | — | EP | disclosed |
| US-5362607-A | Photo-patternable in absence of moisture; treating substrate with positive resist composition, baking, irradiating resist in patterned way, heating, developing; resist of water-soluble phenolic resin, tertiary butyl compound, aryl onium salt | MICROSI, INC. (US) | 1994-11-08 | — | — | US | disclosed |
| US-5310619-A | Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable | MICROSI, INC. (US) | 1994-05-10 | — | — | US | disclosed |
| EP-0249139-A2 | Resist compositions and use | MicroSi, Inc. (a Delaware corporation) (US) | 1987-12-16 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230393469-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER, AND COMPOUND | RER1, RAD51, RFT1 | LMNA 3566/4885EPHX2 678/4885THRB 2743/4885 |
| US-20090274977-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | RAD51, SLC11A2, XRCC6 | LMNA 528/4885EPHX2 3619/4885THRB 3996/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.