SCHEMBL13554307

SCHEMBL13554307

C=C(CC(=O)Oc1ccc2cc(C)ccc2c1)C(=O)OC1(CC)CCCC1

nearest known ligand 0.36

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.36
L3MBTL1 Q9Y468 2/20 0.36
NPC1 O15118 1/20 0.36
GAA P10253 5/20 0.33
GLA P06280 3/20 0.33
KDM4E B2RXH2 2/20 0.33
MAPT P10636 2/20 0.33
ACHE P22303 1/20 0.33
ALDH1A1 P00352 3/20 0.32
KMT2A Q03164 1/20 0.32
P2RX7 Q99572 1/20 0.32
RAPGEF3 O95398 1/20 0.31
F2 P00734 1/20 0.31
F10 P00742 1/20 0.31
PLG P00747 1/20 0.31
PRSS1 P07477 1/20 0.31
HPGD P15428 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13554308 0.98 NPC1 (0.34) TDP1L3MBTL1NPC1GAAGLA
SCHEMBL13554291 0.91 LMNA (0.37) TDP1L3MBTL1NPC1GAAKDM4E
SCHEMBL16638660 0.86 MEN1 (0.34) L3MBTL1GAAGLAKDM4EMAPT
SCHEMBL13555222 0.85 MEN1 (0.33) L3MBTL1GAAGLAKDM4EMAPT
SCHEMBL13555201 0.80 RXRA (0.34) L3MBTL1MAPTALDH1A1KMT2A
SCHEMBL18940871 0.76 NPSR1 (0.30)
SCHEMBL13554292 0.76 CTDSP1 (0.38) KDM4EMAPTALDH1A1KMT2A
SCHEMBL1402155 0.75 KDM4E (0.31) KDM4E
SCHEMBL13554363 0.75 NPSR1 (0.33) GAA
SCHEMBL13554290 0.75 LMNA (0.34) L3MBTL1NPC1GAAGLAKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9005874-B2 Compound, polymeric compound, acid generator, resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-04-14 US disclosed
US-20120270155-A1 COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2012-10-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120270155-A1 COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN ASIC1, FGFR1, FGF1 TDP1 4100/4885L3MBTL1 3278/4885NPC1 4413/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.