SCHEMBL13554308

SCHEMBL13554308

C=C(CC(=O)Oc1ccc2ccc(C)cc2c1)C(=O)OC1(CC)CCCC1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 2/20 0.34
TDP1 Q9NUW8 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
KMT2A Q03164 5/20 0.34
ESR1 P03372 1/20 0.34
MAPT P10636 3/20 0.33
MEN1 O00255 3/20 0.33
HTT P42858 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
KDM4E B2RXH2 2/20 0.32
GLA P06280 2/20 0.32
GAA P10253 2/20 0.32
RAPGEF3 O95398 1/20 0.32
CASP3 P42574 1/20 0.32
SENP8 Q96LD8 1/20 0.32
SENP7 Q9BQF6 1/20 0.32
SENP6 Q9GZR1 1/20 0.32
ACHE P22303 1/20 0.32
CYP2A6 P11509 1/20 0.32
OPRM1 P35372 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13554307 0.98 TDP1 (0.36) NPC1TDP1L3MBTL1KMT2AMAPT
SCHEMBL13554291 0.89 LMNA (0.37) NPC1TDP1L3MBTL1KMT2AMAPT
SCHEMBL13555222 0.87 MEN1 (0.33) L3MBTL1KMT2AMAPTMEN1HTT
SCHEMBL16638660 0.85 MEN1 (0.34) L3MBTL1KMT2AMAPTMEN1SMN1; SMN2
SCHEMBL13555201 0.78 RXRA (0.34) L3MBTL1KMT2AMAPTMEN1HTT
SCHEMBL13554290 0.75 LMNA (0.34) NPC1L3MBTL1KMT2AMAPTKDM4E
SCHEMBL18940871 0.75 NPSR1 (0.30)
SCHEMBL13554292 0.74 CTDSP1 (0.38) KMT2AMAPTSMN1; SMN2KDM4EOPRM1
SCHEMBL1402155 0.73 KDM4E (0.31) KDM4E
SCHEMBL13554363 0.73 NPSR1 (0.33) GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9005874-B2 Compound, polymeric compound, acid generator, resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-04-14 US disclosed
US-20120270155-A1 COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2012-10-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120270155-A1 COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN ASIC1, FGFR1, FGF1 NPC1 4413/4885TDP1 4100/4885L3MBTL1 3278/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.