SCHEMBL13555201

SCHEMBL13555201

C=C(CC(=O)Oc1ccc(S(=O)(=O)O)cc1)C(=O)OC1(CC)CCCC1

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RXRA P19793 1/20 0.34
RXRB P28702 1/20 0.34
RXRG P48443 1/20 0.34
KMT2A Q03164 4/20 0.33
MMP9 P14780 7/20 0.32
MMP1 P03956 6/20 0.32
MMP13 P45452 6/20 0.32
MAPT P10636 2/20 0.31
ALDH1A1 P00352 1/20 0.31
LMNA P02545 1/20 0.31
HTT P42858 1/20 0.31
HSD17B10 Q99714 1/20 0.31
ADAM17 P78536 3/20 0.31
MMP2 P08253 3/20 0.31
MMP8 P22894 2/20 0.31
POLB P06746 1/20 0.31
PKM P14618 1/20 0.31
MMP14 P50281 1/20 0.31
MMP3 P08254 2/20 0.31
MMP7 P09237 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16638660 0.91 MEN1 (0.34) RXRARXRBRXRGKMT2AMMP1
SCHEMBL13555222 0.89 MEN1 (0.33) RXRARXRBRXRGKMT2AMMP9
SCHEMBL13554291 0.86 LMNA (0.37) KMT2AMAPTALDH1A1LMNAHTT
SCHEMBL13555159 0.83 CA1 (0.36) MMP9MMP1MMP13MAPTALDH1A1
SCHEMBL13554307 0.80 TDP1 (0.36) KMT2AMAPTALDH1A1L3MBTL1
SCHEMBL13554309 0.79 CASP6 (0.33) ALDH1A1
SCHEMBL13554308 0.78 NPC1 (0.34) KMT2AMAPTALDH1A1HTTL3MBTL1
SCHEMBL13555221 0.78
SCHEMBL13555210 0.77 ALDH1A1 (0.33) KMT2AALDH1A1LMNAHTTL3MBTL1
SCHEMBL13554301 0.77 TTR (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9005874-B2 Compound, polymeric compound, acid generator, resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-04-14 US disclosed
US-20120270155-A1 COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2012-10-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120270155-A1 COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN ASIC1, FGFR1, FGF1 RXRA 1617/4885RXRB 2189/4885RXRG 1254/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.