SCHEMBL135567

SCHEMBL135567

CC(C)(C)OC(=O)n1cnc2ccccc21

nearest known ligand 0.52

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.52
SMN1; SMN2 Q16637 3/20 0.51
ALDH1A1 P00352 2/20 0.49
KDM4E B2RXH2 1/20 0.49
MEN1 O00255 1/20 0.49
NPC1 O15118 1/20 0.47
MAPT P10636 1/20 0.47
HPGD P15428 1/20 0.47
RAB9A P51151 1/20 0.47
HSD17B10 Q99714 1/20 0.47
ASAH1 Q13510 5/20 0.47
HTT P42858 1/20 0.47
LMNA P02545 1/20 0.46
STAT6 P42226 1/20 0.46
DNMT3A Q9Y6K1 1/20 0.45
BCHE P06276 1/20 0.44
FDPS P14324 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
FGFR1 P11362 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1847242 0.85 ALDH1A1 (0.49) KMT2ASMN1; SMN2ALDH1A1KDM4EMEN1
SCHEMBL4819554 0.82 GABRG2 (0.49) KMT2ASMN1; SMN2ALDH1A1KDM4EMEN1
SCHEMBL9791225 0.82 KMT2A (0.60) KMT2ASMN1; SMN2ALDH1A1MEN1NPC1
SCHEMBL30955930 0.81 FGFR1 (0.44) KMT2ASMN1; SMN2ALDH1A1KDM4EMAPT
SCHEMBL4816124 0.81 GABRG2 (0.47) KMT2ASMN1; SMN2ALDH1A1KDM4EMEN1
SCHEMBL832377 0.81 GABRG2 (0.44) KMT2ASMN1; SMN2MEN1NPC1HPGD
SCHEMBL7479053 0.81 HTR6 (0.44) KMT2AALDH1A1KDM4EMEN1BCHE
SCHEMBL832385 0.81 BRD4 (0.40) KMT2AMEN1ASAH1HTTLMNA
SCHEMBL1455275 0.81 HTR6 (0.47) KMT2AMEN1HPGDBCHEFGFR1
SCHEMBL482833 0.80 NR1H2 (0.43) KMT2ASMN1; SMN2ALDH1A1KDM4EMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 999 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2026100524-A1 RADIATION-SENSITIVE COMPOSITION, PATTERN FORMING METHOD, ONIUM SALT COMPOUND, AND POLYMER JSR株式会社 2026-05-15 WO disclosed
WO-2026100259-A1 RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND COMPOUND JSR株式会社 2026-05-15 WO disclosed
WO-2026100258-A1 RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND COMPOUND JSR株式会社 2026-05-15 WO disclosed
WO-2026100282-A1 RADIATION-SENSITIVE COMPOSITION, PATTERN FORMING METHOD, POLYMER, AND ONIUM SALT JSR株式会社 2026-05-15 WO disclosed
WO-2026100281-A1 RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, RADIATION-SENSITIVE ACID GENERATOR, AND COMPOUND JSR株式会社 2026-05-15 WO disclosed
US-20260079396-A1 RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND JSR CORPORATION (JP) 2026-03-19 US disclosed
US-20260063994-A1 RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND JSR CORPORATION (JP) 2026-03-05 US disclosed
US-12517429-B2 Radiation-sensitive resin composition and method for forming pattern JSR CORPORATION (JP) 2026-01-06 US disclosed
US-20250377590-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN JSR CORPORATION (JP) 2025-12-11 US disclosed
EP-4660703-A2 METAL-CONTAINING FILM PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2025-12-10 EP disclosed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 US disclosed
US-20020012872-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-31 US disclosed
US-20020009668-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-24 US disclosed
US-20020009667-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-24 US disclosed
EP-1164434-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-19 EP disclosed
EP-1164433-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-19 EP disclosed
EP-1162506-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-12 EP disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed
EP-1085379-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-03-21 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260079396-A1 RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND SRMS, RAD1, SLC11A2 KMT2A 1087/4885SMN1; SMN2 1721/4885ALDH1A1 3009/4885
US-20260063994-A1 RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND RAD1, RPA1, RAD51 KMT2A 3294/4885SMN1; SMN2 3206/4885ALDH1A1 274/4885
US-20250377590-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN RER1, RAD51, RFC2 KMT2A 1322/4885SMN1; SMN2 3227/4885ALDH1A1 625/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.