Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 2/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | BLM | P54132 | 1/20 | 0.33 |
| ▸ | WRN | Q14191 | 1/20 | 0.33 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.33 |
| ▸ | DGKA | P23743 | 1/20 | 0.32 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.30 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.30 |
| ▸ | MGAM | O43451 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15161835 | 0.85 | NAAA (0.35) | NAAAALDH1A1GAACYP1A2DGKA | |
| SCHEMBL134437 | 0.84 | DGKA (0.42) | NAAAALDH1A1TSHRTDP1BLM | |
| SCHEMBL19350278 | 0.83 | NAAA (0.45) | NAAAALDH1A1GAAHTTKDM4E | |
| SCHEMBL19333212 | 0.83 | ADRA2A (0.34) | ALDH1A1TSHRTDP1CYP2C19BLM | |
| SCHEMBL1645979 | 0.82 | CA2 (0.36) | ALDH1A1TSHRTDP1 | |
| SCHEMBL28616620 | 0.82 | DGKA (0.48) | ALDH1A1TSHRTDP1CYP1A2BLM | |
| SCHEMBL5442909 | 0.82 | NAAA (0.44) | NAAAALDH1A1GAAHTTKDM4E | |
| SCHEMBL10853793 | 0.82 | CYP2C19 (0.48) | ALDH1A1TSHRTDP1CYP2C19 | |
| SCHEMBL1645932 | 0.81 | ALDH1A1 (0.34) | ALDH1A1TSHRTDP1GAAMGAM | |
| SCHEMBL28496017 | 0.81 | DGKA (0.53) | NAAAALDH1A1TSHRTDP1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2125 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114995058-B | Resin precursor composition, polyimide resin film containing resin precursor composition and application of polyimide resin film | 吉林奥来德光电材料股份有限公司 | 2025-05-06 | — | — | CN | claimed |
| CN-116969953-A | Diphenyl pyrrolo-pyrrole-dione derivative, pigment composition and application thereof | 山东凯瑞尔光电科技有限公司 | 2023-10-31 | — | — | CN | claimed |
| CN-116969952-A | Diphenyl pyrrolo-pyrrole-dione derivative and pigment composition thereof | 山东凯瑞尔光电科技有限公司 | 2023-10-31 | — | — | CN | claimed |
| CN-115010924-B | Photosensitive polyimide resin composition, polyimide resin film containing photosensitive polyimide resin composition and application of photosensitive polyimide resin composition | 吉林奥来德光电材料股份有限公司 | 2023-10-13 | — | — | CN | claimed |
| CN-115010924-A | Photosensitive polyimide resin composition, polyimide resin film containing same and application of polyimide resin film | 吉林奥来德光电材料股份有限公司 | 2022-09-06 | — | — | CN | claimed |
| CN-114995058-A | Resin precursor composition, polyimide resin film containing resin precursor composition and application of polyimide resin film | 吉林奥来德光电材料股份有限公司 | 2022-09-02 | — | — | CN | claimed |
| CN-114836033-A | Resin precursor composition, resin film thereof, preparation method and application | 吉林奥来德光电材料股份有限公司 | 2022-08-02 | — | — | CN | claimed |
| CN-114621437-A | Compound for preparing photosensitive resin film, preparation method and application thereof | 吉林奥来德光电材料股份有限公司 | 2022-06-14 | — | — | CN | claimed |
| CN-114539524-A | Photosensitive resin precursor polymer, photosensitive resin composition paste and use thereof | 吉林奥来德光电材料股份有限公司 | 2022-05-27 | — | — | CN | claimed |
| US-8475998-B2 | Compound synthesis method, microarray, acid-transfer composition, and biochip composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-07-02 | — | — | US | claimed |
| CN-101617272-A | Photosensitive resin composition for black matrix, black matrix prepared from the same, and liquid crystal display including the black matrix | LG CHEMICAL LTD | 2009-12-30 | — | — | CN | claimed |
| CN-101573663-A | Black matrix high sensitive photoresist composition for liquid crystal display and black matrix prepared by using the same | LG CHEMICAL LTD (KR) | 2009-11-04 | — | — | CN | claimed |
| CN-100541327-C | Liquid crystal display cells layer at random light resistance composition | MINGDE INTERNAT WAREHOUSING & (CN) | 2009-09-16 | — | — | CN | claimed |
| US-7270939-B2 | Photoresist composition for LCD light diffuse reflecting film | EVERLIGHT USA, INC. (US) | 2007-09-18 | — | — | US | claimed |
| US-20060177764-A1 | Positive-tone photosensitivity resin composition | EVERLIGHT USA, INC. (US) | 2006-08-10 | — | — | US | claimed |
| CN-1815367-A | Positive photoresistive agent composition and its use | MINGDE INTERNAT STORAGE TRADE (CN) | 2006-08-09 | — | — | CN | claimed |
| US-20050260523-A1 | Photoresist composition for LCD light diffuse reflecting film | EVERLIGHT USA, INC. (US) | 2005-11-24 | — | — | US | claimed |
| CN-1700094-A | Liquid crystal display element random layer optical resistance composition | MINGDE INTERNAT WAREHOUSING & (CN) | 2005-11-23 | — | — | CN | claimed |
| EP-0260994-B1 | PROCESS FOR PRODUCING INTEGRATED CIRCUIT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-07-15 | — | — | EP | claimed |
| EP-0260994-A2 | Process for producing integrated circuit | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1988-03-23 | — | — | EP | claimed |