Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DGKA | P23743 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.36 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.36 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | BLM | P54132 | 1/20 | 0.35 |
| ▸ | HTR2C | P28335 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | NAAA | Q02083 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.32 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.32 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.32 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.32 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.32 |
| ▸ | MGLL | Q99685 | 1/20 | 0.32 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28496017 | 0.89 | DGKA (0.53) | DGKAALDH1A1DNM1MAPTHTR2C | |
| SCHEMBL28616620 | 0.86 | DGKA (0.48) | DGKAALDH1A1ADRA2AADRA1ADNM1 | |
| SCHEMBL29258497 | 0.86 | DGKA (0.65) | DGKAALDH1A1DNM1MAPTHTR2C | |
| SCHEMBL136377 | 0.84 | NAAA (0.45) | DGKAALDH1A1ADRA2AADRA1ADNM1 | |
| SCHEMBL28138197 | 0.83 | ADRA2A (0.39) | DGKAALDH1A1ADRA2AADRA1AMAPT | |
| SCHEMBL8340130 | 0.82 | DGKA (0.47) | DGKAALDH1A1ADRA2AADRA1ADNM1 | |
| SCHEMBL31618873 | 0.80 | DGKA (0.52) | DGKAALDH1A1DNM1MAPTHTR2C | |
| SCHEMBL1645011 | 0.80 | TDP1 (0.32) | DGKAALDH1A1TSHRTDP1NAAA | |
| SCHEMBL19333212 | 0.80 | ADRA2A (0.34) | ALDH1A1ADRA2AADRA1AMAPTBLM | |
| SCHEMBL15161835 | 0.79 | NAAA (0.35) | DGKAALDH1A1ADRA2AADRA1ADNM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 717 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8475998-B2 | Compound synthesis method, microarray, acid-transfer composition, and biochip composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-07-02 | — | — | US | claimed |
| US-6379860-B1 | RESIN OBTAINED BY REACTION OF ALKALI-SOLUBLE RESIN HAVING PHENOLIC HYDROXYL GROUPS WITH ENOL ETHER DECOMPOSES IN ACID TO INCREASE SOLUBILITY; HEAT RESISTANCE, SENSITIVIY, RESOLUTION; GENERATES ACID UPON ACTINIC RADIATION EXPOSURE | FUJI PHOTO FILM CO., LTD. (JP) | 2002-04-30 | — | — | US | claimed |
| EP-0260994-B1 | PROCESS FOR PRODUCING INTEGRATED CIRCUIT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-07-15 | — | — | EP | claimed |
| EP-0260994-A2 | Process for producing integrated circuit | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1988-03-23 | — | — | EP | claimed |
| WO-2026105630-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 日産化学株式会社 | 2026-05-21 | — | — | WO | disclosed |
| WO-2026105628-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 日産化学株式会社 | 2026-05-21 | — | — | WO | disclosed |
| US-20260118765-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4715465-A1 | MULTILAYER BODY, METHOD FOR PRODUCING MULTILAYER BODY, AND PHOTOSENSITIVE SURFACE MODIFIER | Nissan Chemical Corporation (JP) | 2026-03-25 | — | — | EP | disclosed |
| US-12585188-B2 | Composition for forming resist underlying film | NISSAN CHEMICAL CORPORATION (JP) | 2026-03-24 | — | — | US | disclosed |
| CN-121586750-A | Composition for forming silicon-containing underlayer film for directional self-assembly | 日产化学株式会社 | 2026-02-27 | — | — | CN | disclosed |
| EP-4692943-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | Nissan Chemical Corporation (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-0554101-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-08-04 | — | — | EP | disclosed |
| EP-0523957-A1 | Radiation-sensitive composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-01-20 | — | — | EP | disclosed |
| EP-0517923-A1 | METHOD OF FORMING MINUTE RESIST PATTERN | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-12-16 | — | — | EP | disclosed |
| EP-0260994-B1 | PROCESS FOR PRODUCING INTEGRATED CIRCUIT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-07-15 | — | — | EP | disclosed |
| US-5110706-A | Photoresists for highly reflective substrates | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-05-05 | — | — | US | disclosed |
| EP-0428398-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-05-22 | — | — | EP | disclosed |
| EP-0365318-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1990-04-25 | — | — | EP | disclosed |
| EP-0260994-A2 | Process for producing integrated circuit | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1988-03-23 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118765-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | ASH2L, ASIC1, RPA1 | DGKA 818/4885ALDH1A1 1704/4885ADRA2A 286/4885 |
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | SRSF1, MACF1, SRPK1 | DGKA 1511/4885ALDH1A1 3642/4885ADRA2A 4262/4885 |
| US-12585188-B2 | Composition for forming resist underlying film | SRR, SMC1A, ASH2L | DGKA 2205/4885ALDH1A1 1320/4885ADRA2A 1545/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.