Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRNB2 | P17787 | 1/20 | 0.40 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.40 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetramethylammonium Ion SCHEMBL4007649 | 0.95 | CHRNB2 (0.36) | CHRNB2CHRNA7CHRNA4 | |
| Tetramethylammonium Ion SCHEMBL30957273 | 0.82 | CHRNB2 (0.33) | CHRNB2CHRNA7CHRNA4 | |
| Tetramethylammonium Ion SCHEMBL1760425 | 0.82 | CHRNB2 (0.33) | CHRNB2CHRNA7CHRNA4 | |
| Tetramethylammonium Ion SCHEMBL27460675 | 0.78 | CHRNB2 (0.50) | CHRNB2CHRNA7CHRNA4 | |
| Tetramethylammonium Ion SCHEMBL136727 | 0.78 | CHRNB2 (0.50) | CHRNB2CHRNA7CHRNA4 | |
| Hydrogen Sulfide SCHEMBL23466954 | 0.78 | — | — | |
| SCHEMBL6845203 | 0.76 | — | — | |
| Tetramethylammonium Ion SCHEMBL4809976 | 0.76 | — | — | |
| Tetramethylammonium Ion SCHEMBL2003451 | 0.74 | CHRNB2 (0.44) | CHRNB2CHRNA7CHRNA4 | |
| SCHEMBL6928245 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1187 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12595413-B2 | Silicon nitride etching compositions and method | ENTEGRIS, INC. (US) | 2026-04-07 | — | — | US | claimed |
| US-20250179360-A1 | SILICON NITRIDE ETCHING LIQUID COMPOSITION | KANTO KAGAKU KABUSHlKI KAISHA (JP) | 2025-06-05 | — | — | US | claimed |
| US-20250171658-A1 | Stable Chemical Mechanical Planarization Polishing Compositions And Methods For High Rate Silicon Oxide Removal | VERSUM MATERIALS US, LLC | 2025-05-29 | — | — | US | claimed |
| CN-119818893-A | Layered double hydroxide reinforced silica gel foam extinguishing agent and preparation method thereof | 应急管理部四川消防研究所 | 2025-04-15 | — | — | CN | claimed |
| EP-4522702-A1 | SILICON NITRIDE ETCHING COMPOSITIONS AND METHOD | Entegris, Inc. (US) | 2025-03-19 | — | — | EP | claimed |
| CN-115832236-B | Lithium iron phosphate positive electrode material, preparation method thereof, positive electrode plate, lithium ion battery, battery module, battery pack and power utilization device | 宁德时代新能源科技股份有限公司 | 2025-02-21 | — | — | CN | claimed |
| CN-119452061-A | Silicon nitride etching composition and method | 恩特格里斯公司 | 2025-02-14 | — | — | CN | claimed |
| EP-4493632-A1 | STABLE CHEMICAL MECHANICAL PLANARIZATION POLISHING COMPOSITIONS AND METHODS FOR HIGH RATE SILICON OXIDE REMOVAL | Versum Materials US, LLC (US) | 2025-01-22 | — | — | EP | claimed |
| CN-116288305-B | Chromium-free high-temperature anti-oxidation passivating agent for electrolytic copper foil | 武汉奥克特种化学有限公司 | 2025-01-07 | — | — | CN | claimed |
| CN-118422518-B | Printing paper coating for digital ink jet and preparation method thereof | 江苏佳饰家新材料集团股份有限公司 | 2025-01-03 | — | — | CN | claimed |
| US-5334368-A | Synthesis of mesoporous oxide | MOBIL OIL CORP. (US) | 1994-08-02 | — | — | US | claimed |
| US-5310715-A | Crystallization; swelling with quaternary ammonium compound | MOBIL OIL CORP. (US) | 1994-05-10 | — | — | US | claimed |
| EP-0184506-B1 | PROCESS FOR THE PREPARATION OF ALUMINA-BASED CATALYST SUPPORTS WITH IMPROVED DURABILITY | RHONE-POULENC CHIMIE (FR) | 1988-03-30 | — | — | EP | claimed |
| US-4628023-A | REDUCED EXPOSURE, SILICON WAFERS | SHIPLEY COMPANY INC. (US) | 1986-12-09 | — | — | US | claimed |
| EP-0062733-B1 | METAL ION-FREE PHOTORESIST DEVELOPER COMPOSITION | SHIPLEY COMPANY INC. (US) | 1986-01-02 | — | — | EP | claimed |
| EP-0062733-A1 | Metal ion-free photoresist developer composition | SHIPLEY COMPANY INC. (US) | 1982-10-20 | — | — | EP | claimed |
| US-4189414-A | QUATERNARY AMMONIUM SILICATE | KOWA CHEMICAL INDUSTRY LTD. (JP) | 1980-02-19 | — | — | US | claimed |
| US-4059553-A | OR HYDROXIDES OF MG, CA, CHROMIUM, MANGANESE, AND ZN AND QUATERNARY AMMONIUM SILICATES USEFUL FOR BUILDING MATERIALS | KIKUSUI KAGAKU KOGYO KABUSHIKI KAISHA (JA) | 1977-11-22 | — | — | US | claimed |
| US-3993548-A | QUATERNARY AMMONIUM SILICATES AS CHELATING AGENTS FOR METAL IMPURITIES | OXY METAL INDUSTRIES CORPORATION (US) | 1976-11-23 | — | — | US | claimed |
| US-3968302-A | Mold release composition containing tungsten disulfide | BALL BROTHERS RESEARCH CORPORATION (US) | 1976-07-06 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12595413-B2 | Silicon nitride etching compositions and method | NOS1, NOS2, NOS3 | CHRNB2 528/4885CHRNA7 797/4885CHRNA4 723/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.