SCHEMBL13683035

SCHEMBL13683035

CCC(C)c1cccc(OCOc2cccc3ccc(OC)cc23)c1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ABCB11 O95342 1/20 0.42
SLC6A2 P23975 1/20 0.42
SLC6A4 P31645 1/20 0.42
CYP2D6 P10635 1/20 0.39
HTR2A P28223 3/20 0.39
MTNR1A P48039 3/20 0.38
NQO2 P16083 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
CASR P41180 1/20 0.38
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
MTNR1B P49286 2/20 0.38
CYP1A2 P05177 1/20 0.38
CYP3A4 P08684 1/20 0.38
CYP2C9 P11712 1/20 0.38
CYP2C19 P33261 1/20 0.38
RECQL P46063 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
KDM4E B2RXH2 1/20 0.38
ALDH1A1 P00352 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL825351 0.87 KCNA3 (0.44) SLC6A2SLC6A4CYP2D6HTR2AKMT2A
SCHEMBL825592 0.86 HDAC4 (0.39) NPSR1MEN1KMT2ACYP1A2CYP3A4
SCHEMBL13683030 0.84 ALDH1A1 (0.41) ABCB11SLC6A2SLC6A4HTR2AMTNR1A
SCHEMBL11992976 0.78 CASR (0.51) ABCB11CASRMEN1KMT2AL3MBTL1
SCHEMBL2632814 0.78 CASR (0.51) ABCB11CASRMEN1KMT2AL3MBTL1
SCHEMBL10192231 0.78 CASR (0.51) ABCB11CASRMEN1KMT2AL3MBTL1
SCHEMBL14162717 0.78 CASR (0.51) ABCB11CASRMEN1KMT2AL3MBTL1
SCHEMBL825487 0.77 ALDH1A1 (0.48) ABCB11MTNR1ANPSR1MEN1KMT2A
SCHEMBL27489770 0.77 HTR2A (0.49) CYP2D6HTR2AMTNR1ANQO2MTNR1B
SCHEMBL825531 0.76 KCNA3 (0.47) SLC6A2SLC6A4CYP2D6HTR2ACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed