SCHEMBL825592

SCHEMBL825592

CCC(C)c1cccc(OCOc2cccc3ccc(O)cc23)c1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC4 P56524 1/20 0.39
HDAC2 Q92769 1/20 0.39
HDAC8 Q9BY41 1/20 0.39
CYSLTR1 Q9Y271 4/20 0.37
CYSLTR2 Q9NS75 3/20 0.37
TRPV1 Q8NER1 2/20 0.35
GPBAR1 Q8TDU6 3/20 0.35
MAPK1 P28482 2/20 0.35
TSHR P16473 2/20 0.35
KMT2A Q03164 2/20 0.35
TP53 P04637 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP3A4 P08684 1/20 0.35
CYP2C9 P11712 1/20 0.35
NFKB1 P19838 1/20 0.35
CYP2C19 P33261 1/20 0.35
HIF1A Q16665 1/20 0.35
MEN1 O00255 1/20 0.35
GMNN O75496 1/20 0.35
ALDH1A1 P00352 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL825351 0.87 KCNA3 (0.44) KMT2ACYP1A2ALDH1A1SMN1; SMN2
SCHEMBL13683035 0.86 ABCB11 (0.42) KMT2ACYP1A2CYP3A4CYP2C9CYP2C19
SCHEMBL825481 0.75 HDAC4 (0.45) HDAC4HDAC2HDAC8TSHRALDH1A1
SCHEMBL13683030 0.75 ALDH1A1 (0.41) TSHRKMT2ATP53HIF1AMEN1
SCHEMBL825531 0.74 KCNA3 (0.47) MAPK1TSHRTP53CYP1A2CYP2C9
SCHEMBL825545 0.73 ALDH1A1 (0.45) HDAC4HDAC2HDAC8TSHRKMT2A
SCHEMBL14118390 0.73 NPC1 (0.54) CYSLTR1CYSLTR2GPBAR1KMT2AMEN1
SCHEMBL19445358 0.72 HDAC4 (0.45) HDAC4HDAC2HDAC8TSHRKMT2A
SCHEMBL2740766 0.72 RAD52 (0.56) HDAC4HDAC2HDAC8CYP1A2CYP3A4
SCHEMBL86085 0.72 HSD17B10 (0.54) HDAC4HDAC2HDAC8TSHRCYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed